etching 中文意思是什麼

etching 解釋
n. 名詞 1. 蝕刻法;蝕刻(銅)版畫;蝕鏤術。
2. 蝕刻畫,蝕刻版,蝕刻版印刷品。

  1. Computer simulation of silicon anisotropic etching

    硅各向異性腐蝕的計算機模擬
  2. Plasma cyro - etching of high aspect ratio silicon crystal structures

    等離子體低溫刻蝕單晶硅高深寬比結構
  3. Etching of sapphire with inductively coupled plasma of cl2 bcl

    刻蝕藍寶石研究靠
  4. Abstract : the preparation of cuprous chloride from etching waste liquor of cupric chloride and crude copper powder was studied. the result showed that this method had many advantages, including simple process, easy operation and good quality of product, therefore it had remarkable economic and environmental benefits

    文摘:以氯化銅蝕刻液廢液、粗銅粉等為原料,在常溫下反應制備氯化亞銅,工藝簡單,操作簡便,產品質量好,具有顯著的經濟效益和環境效益。
  5. Microwave electron cyclotron resonance ( mwecr ) cvd is a newly developed technique for plasma processing and materials fabrication, such as plasma etching and films deposition

    本論文介紹了我們對ecr等離子體cvd系統的測試、 bn薄膜的制備和薄膜光學特性研究。
  6. Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching ( ecr - rie ) equipment to improve its property of weave

    摘要採用微波電子迴旋共振等離子體反應離子刻蝕( ecr - rie )裝置對氂牛毛纖維進行表面改性,從而改善氂牛毛的可紡性。
  7. The silicon plates are formed reverse four wimble array in koh solution by wet - etching technology. then the electrochemical etching experiments are done in three poles electrobath. and some technology questions such as heat oxygenation, light etching, wet etching and electrochemical etching have been analyzed. at the same time sample appearances are analyzed by scanning electron microscope. according to current burst model theory, the electrochemical deep holes etching mechanism are analyzed

    在三極電解槽中,進行了電化學深刻蝕的探索性實驗。對氧化、光刻、濕法刻蝕和電化學刻蝕中的工藝問題進行了初步的理論和實驗研究,同時,採用sem對實驗樣品進行了形貌分析,並採用電流突破模型對電化學深孔刻蝕機理進行了理論分析。
  8. No resolved etching was developed.

    並無可溶性浸蝕發生。
  9. Mary is very keen on etching.

    瑪麗很喜愛蝕刻藝術。
  10. The concern with etching beyond this point should be clear.

    刻蝕超越此值的後果應該是清楚的。
  11. Normally for bulk glass, etching increases the strength.

    對于塊狀玻璃,腐蝕通常都使強度提高。
  12. The weird figures of the etching haunted my fitful sleep.

    那幅版畫上鬼怪似的人物形象在我輾轉反側的半睡眠中忽隱忽現。
  13. One reasonable explanation is that etching removes and blunts microcracks.

    有一種合理的解釋是說腐蝕能夠去掉並鈍化微裂紋。
  14. Three potentials pertinent to various etching techniques are labeled in fig. 10.

    與各種蝕刻技術有關的三個電勢標出在圖10中。
  15. The relationship between capacitance and corrosion conditions in the enlargement of tunnels justifies the latter competition mechanism the varied etching conditions were implemented by enhancing the passivating characteristics and viscosity, changing the a13 + concentration, temperature of etchants and current pulsation. passivating acid in the etchant is conducive to the instant passivation of exposed areas on the foil surface, and hence sustains the balance of competition between aggressive anions and passivators, providing pit nucleatiori sites continuously

    通過侵蝕液中添加草酸、硫酸、乙二醇,改變侵蝕液al ~ ( 3 + )濃度和電流紋波等方法,研究了不同的侵蝕條件對隧道孔形貌和比容的影響,結果表明:草酸和硫酸既保護了鋁箔表面又促進了隧道孔孔壁的迅速鈍化,增加發孔密度。
  16. In this paper, the flow pattern defects ( fpds ) were revealed by secco etchant and their shape, distribution on wafer and tip structure were studied in details by optical microscope and atomic force microscope ( afm ). the relationship between etching time and the tip structure of fpds was also discussed. furthermore, by studying the effect of rapid thermal annealing ( rta ) on the density of fpds in ar, the annihilation mechanism of fpds was discussed in this paper

    本文將cz硅單晶片在secco腐蝕液中擇優腐蝕后,用光學顯微鏡和原子力顯微鏡對流動圖形缺陷( flowpatterndefects , fpds )在矽片中的形態、分佈及其端部的微觀結構進行了仔細地觀察和研究,並討論了腐蝕時間對fpds缺陷端部結構的影響;本文還通過研究ar氣氛下快速退火( rapidthermalannealing , rta )對fpds缺陷密度的影響,初步探討了fpds的消除機理。
  17. Influence of process parameters on the etching rate in inductively coupled plasma etcher

    等離子體刻蝕中工藝參數對刻蝕速率影響的研究
  18. The resolution of an etching process is a measure of the fidelity of pattern transfer.

    刻蝕工藝的解析度是圖形轉移保真度的量度。
  19. The composition and characteristic of liquid photo imageable etching resist ink is introduced briefly, and the perfect blueprint is also described in this paper

    綜述了液態光致抗蝕油墨的組成、特性及其誘人的發展前景。
  20. With the development of printed circuit board ( pcb ), liquid photo imageable etching resist ink has become the prime process technology of the fine line graph facture

    摘要隨著印製電路板( pcb )行業的飛速發展,液態光致抗蝕油墨已逐漸成為精細導線圖形製作的主要方法。
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