glow-discharge method 中文意思是什麼
glow-discharge method
解釋
輝光放電法-
Standard test method for trace metallic impurities in electronic grade titanium by high mass - resolution glow discharge mass spectrometer
使用高解析度發光質譜儀測試電子級鈦中痕量金屬雜質的標準試驗方法 -
Based on the theory of glow discharge, the angle distribution of electron and the recombination process are simulated by adopting monte carlo method. the doping process of n - type diamond film is investigated by this method for the first time. the results indicate : 1 ) the scattering angle of electrons near the substrate is mainly lange - angle, which is helpful to grow diamond film over a large area when glow discharge is kept ; 2 ) after considering the recombination process, the number of particles distribution is provided
主要結果如下: ( 1 )研究了電子在雪崩碰撞和分解電離后的角分佈情況,結果表明基片附近電子的散射以大角散射為主,在維持輝光放電的條件下,較高的偏壓和工作氣壓對金剛石的橫向連續成膜是有益的; ( 2 )考慮了低溫合成金剛石薄膜過程中電子與各種碎片粒子的復合過程,給出了不同的復合系數情況下的粒子數分佈,結果顯示各種碎片粒子的分佈隨復合系數的變化會出現粒子數分佈的漲落現象。 -
Dlc and a - sic : h films were prepared by the rf glow discharge and the reactive sputtering method respectively. there were two reasons that we chose y rays, ultraviolet ( uv ) photons, and neutrons as radiation sources. one is that y rays, uv photons and neutrons irradiation are serious at outer space and / or nucleus irradiation enviromentthe other is that the study on y rays irradiation on the films is a new and an important directioaotherwisejirnited reports have been made of the investigation on the uv photonsjieutrons irradiation influences on these films
本文分別採用射頻( 13 . 56mhz )等離子體cvd及射頻反應濺射方法制得了dlc及a - sic : h薄膜。文中主要選擇y射線、紫外光及中子作為輻照源有兩方面的原因:一方面,在外層空間, y射線及紫外光輻射十分嚴重,而在核輻射環境下y射線及中子輻射也不可忽視;另一方面, y射線輻照這兩種薄膜完全是一項開創性的工作,同時國內外對紫外光子、中子與這兩種薄膜作用的研究也很少。 -
Standard test method for trace metallic impurities in high purity copper by high - mass - resolution glow discharge mass spectrometer
使用高質量解析度輝光放電質譜儀測量高純度銅中痕量金屬雜質的標準試驗方法 -
Standard test method for trace metallic impurities in electronic grade aluminum - copper, aluminum - silicon, and aluminum - copper - silicon alloys by high - mass - reduction glow discharge mass spectrometer
用高質量減少輝光放電質譜儀測量電子級鋁銅鋁硅和鋁銅硅中微量金屬雜質的標準試驗方法 -
By means of resistance and capacitance coupled negative feedback method to control the plasma discharge development process and prevent the transition from glow discharge to spark discharge in a pin - to - plate static air plasma generator, a stable alternative current atmospheric glow discharge is produced successfully
在靜態大氣壓空氣針板等離子體發生器中,採用阻容耦合負反饋方法控制等離子體放電發展過程,成功地抑制了輝光放電向火花放電的過渡,產生了穩定的交流輝光放電。 -
The main results of this article are : ( 1 ) the software that is to simulate the transportation of ions in rf glow discharge, in which a simple method to determine the original states of the ions ( original velocities and positions ) is recommended
本論文的主要結果有: ( 1 )編寫了射頻輝光放電過程中入射離子的輸運模擬程序,並提出了一種簡單的決定離子初始狀態(位置、速度)的方法。 -
Standard test method for trace metallic impurities in electronic grade aluminum by high mass - resolution glow - discharge mass spectrometer
應用高質量分辯率輝光放電質譜計測定電子級鋁中微量金屬雜質的標準試驗方法 -
Through optimization of excitation parameters of the glow - discharge source and calculation of the sputtering rate of the certified reference materials, a method for the quantitative surface analysis of nc - si : h film was established
方法應用於實際摻雜納米硅薄膜樣品的分析,並將分析深度、剖析結果與表面形貌儀的結果進行了對照。
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