hall mobility 中文意思是什麼
hall mobility
解釋
堆爾遷移率-
Here the conductance, carrier concentration and hall mobility ect parameters of er doped cdte films have been given. using seto model, we calculate the grain - boundary barrier of er doped cdte films and analyze the varing dose influence on the grain - boundary resistance
討論了不同er離子注入量對硅基底上沉積的cdte薄膜結構和光電性能的影響，並具體給出了摻雜cdte多晶薄膜的電導、載流子濃度及遷移率等參數值。 -
Extrinsic semiconductor single crystals - measurement of hall mobility and hall coefficient
非本徵半導體單晶霍爾遷移率和霍爾系數測量方法 -
We measured the samples " electrical properties ( square resistance, square carrier concentration, carrier mobility and hall coefficient ) at room temperature by hall measurement. the experimental results revealed that all the samples are p - type, with increasing the annealing temperature, the carrier mobility increased and the square carrier concentration decreased. these changes in electrical properties are explained by a decrease in the number of mn acceptors because of the forming of mnas phase and the resuming of lattice defects during annealing
所有樣品均為p型導電類型；發現在650到850溫度范圍內，隨著退火溫度的升高，樣品的方塊載流子濃度呈下降趨勢，而載流子遷移率呈上升趨勢；這是由於在退火過程中，隨著退火溫度的升高，有更多的mn參與mnas相的形成，使得以替位受主形式存在的mn減少，並且晶格缺陷得到恢復所致。 -
The n type carrier was provided by interstitial zn atom, and zn / o ratio and crystalline quality of zno thin film effeted its hall mobility. when zno thin film was annealed in the ar ambience, p conduction type was founded in the zno thin film which grew in oxygen enrichment condition. this might be excess oxygen in zno thin film entered interstitial position of crystal lattice ( oi ), and p type carrier was from oi
在ar氣保護下，對富氧條件下生長的zno薄膜的退火后的霍爾測量中發現， zno薄膜呈現p型導電狀態，分析認為，這可能是由於富氧狀態下生長的zno薄膜中過量的o在ar氣保護下退火沒有逸出薄膜，反而進入了zno薄膜的間隙位置，成為正電中心，使zno薄膜呈現p型導電。 -
Pure cdte films have high electrical resistivity and are slightly p - type, due to the formation of cd vacancies in the cdte lattice acting as acceptor centers. the sheet resistivity of films are about 1010 ? / ?. the sheet hole concentration is 105 - 6 / cm2 and the hall mobility is about hundreds cm2 / v. s. the structural and electrical properties of cdte films doped te are markedly different from pure cdte films
，面載流子濃度約105 - 6 / cm2 ，載流子遷移率為幾百cm2 / v . s ；摻雜te元素后，薄膜衍射峰強增大，薄膜結構上出現了第二種相成分?六方結構的te ，由衍射峰強判斷該相比例較小，同時cdte薄膜的衍射峰向低角度偏移，晶格< wp = 5 >常數增大。 -
In 1982 professor tsui discovered the remarkable fractional quantum hall effect in his experimental studies of electrons in high - mobility semiconductor heterostructures placed in strong magnetic fields at very low temperatures. professor tsui and his co - workers found unanticipated plateaus in the hall conductivity, characterized by fractional quantum numbers, in contrast to the integral quantum hall effect discovered two years earlier
崔琦教授於一九八二年發現限制在平面上運動的電子系統在強磁場、極低溫的條件下，形成一種奇異的量子液體，它的準粒子元激發具有分數電荷，遂呈現所謂分數量子霍爾效應。 -
Secondly, we measured the electrical properties of the ion - implanted samples by hall method ( square carrier concentration, square resistance and carrier mobility ). after comparing and analyzing, we can know that the electrical properties were affected by the difference of mn dose, the implantation of c and the annealing temperature
其次，利用霍爾測試方法測量了每種離子注入樣品的電性質（方塊載流子濃度、方塊電阻及載流子遷移率） ，通過比較分析了解到mn元素注入劑量、 c元素的注入以及退火溫度的不同，都會對樣品的電性質產生影響。 -
The sheet resistivity dramatically decreases to 106 ? / ?. the sheet hole concentration increases about 109 / cm2 order of magnitude and the hall mobility increases too. te doping changes < wp = 7 > cdte thin films into good p - type semiconductor and improves electrical properties of the films
，面載流子濃度增大到109 / cm2的數量級，遷移率亦增大到104cm2 / v . s ，摻雜te元素改善了cdte薄膜的電學性質，使其變為良好的p型半導體。 -
Test methods for measuring resistivity and hall coefficient and determining hall mobility in single - crystal semiconductors
測量單晶半導體的電阻率霍爾系數及霍爾遷移率的試驗方法
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