inhomogeneous plasma 中文意思是什麼

inhomogeneous plasma 解釋
不均勻等離子體
  • inhomogeneous : adj. 1. 【生物學】不同質的，非純系的，不同源的。2. 不均勻的，不純一的。3. 【數學】非齊次的。
  • plasma : n. 1. 【生理】血漿；淋巴液。2. 【生物學】原生質。3. （做藥膏用的）膏漿。4. 【礦物】半透明的綠玉髓。5. 【物理學】等離子（體）；等離子區。
  1. Propagation of electromagnetic wave along waveguide filled with inhomogeneous plasma

    電磁波在非均勻等離子體波導中的傳播
  2. In the lowest order, for the propagation of solitons in an inhomogeneous dusty plasma composed by two kinds of dust grains with different masses, if the interface of two kinds of dust grains in an inhomogenous dusty plasma is discontinuous, the tra nsmision and reflection waves both can be described by the kdv equation

    2在非均勻塵埃等離子體中，對于小的、但有限振幅的長波振動，孤子可用kdv方程（或kdv型方程）來描述，而且電勢孤子的傳播情況在定性上與離子等離子體中電勢孤子的傳播情況一致。
  3. Using the microwave selective heating property for materials, by setup equivalent equation, and first time inducing the electromagnetic field perturbation theory to the design of heating materials for substrate in mpcvd, three temperature distribution modes were established, including temperature distribution comprehensive mode of inhomogeneous plasma, temperature distribution composite mode of composite substrate materials, temperature distribution perturbation mode of composite materials, which ii provided an whole new technology route to the design of substrate heating system in mpcvd and guided the preparation of heating materials for substrate. and then the heating materials for substrate were designed and optimized to obtain large area homogeneous temperature distribution even larger than substrate holder ' s diameter. as an important part, this thesis researched the nucleation and growth of diamond films in mpcvd, systematically researched the effects of substrate pretreatment, methane concentration, deposition pressure and substrate temperature etc experimental technologic parameters on diamond films " quality on ( 100 ) single crystal silicon substrate in the process of mpcvd, characterized the films qualities in laser raman spectra ( raman ), x - ray diffraction ( xrd ), scanning electron microscopy ( sem ), infrared transmission spectra ( ir ), atomic force microscopy ( afm ), determined the optimum parameters for mpcvd high quality diamond in the mpcvd - 4 mode system

    該系統可通過沉積參數的精確控制，以控制沉積過程，減少金剛石膜生長過程中的缺陷，並採用光纖光譜儀檢測分析等離子體的可見光光譜以監測微波等離體化學氣相沉積過程；利用微波對材料的選擇加熱特性，通過構造等效方程，並首次將電磁場攝動理論引入到mpcvd的基片加熱材料的設計中，建立了非均勻等離子體溫度場綜合模型、復合介質基片材料的復合溫度場模型及復合介質材料溫度場攝動模型，為mpcvd的基片加熱系統設計提供了一條全新的技術路線以指導基片加熱材料的制備，並對基片加熱材料進行了設計和優選，以獲取大面積均勻的溫度場區，甚至獲得大於基片臺尺寸的均勻溫度區；作為研究重點之一，開展了微波等離體化學氣相沉積金剛石的成核與生長研究，系統地研究了在（ 100 ）單晶硅基片上mpcvd沉積金剛石膜的實驗過程中，基片預處理、甲烷濃度、沉積氣壓、基體溫度等不同實驗工藝參數對金剛石薄膜質量的影響，分別用raman光譜、 x射線衍射（ xrd ） 、掃描電鏡（ sem ） 、紅外透射光譜（ ir ） 、原子力顯微鏡（ afm ）對薄膜進行了表徵，確立了該系統上mpcvd金剛石膜的最佳的實驗工藝參數。
  4. Chapter 2 : the beam propagation of x - ray in an inhomogeneous plasma with a continuous varied refractive index is studied. we emphasize, theoretically and numerically, on the analysis of the effect of refractive index gradient on the beam parameters

    第二章：研究了x射線激光光束在折射率連續變化的非均勻等離子體介質中的傳播，從理論和數值模擬上著重討論了折射率梯度效應對光束參數的影響。
  5. In chapter four, by using reductive perturbation technique, ion acoustic solitary wave in weakly relativistic plasmas under transverse perturbation, the propagation of solitons in an inhomogeneous dusty plasma and the modulational instability of dust - acoustic waves in warm dusty plasmas are all discussed respectively

    論文第四章分別研究了弱相對論等離子體橫向擾動下的離子聲孤波、非均勻塵埃等離子體中孤子的傳播和塵埃等離子體中塵埃聲波的調制不穩定性。
  6. Scattering of plane electromagnetic wave from anisotropic inhomogeneous plasma cylinder

    平面電磁波在磁化分層不均勻等離子體圓柱上的散射研究
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