laser energy density 中文意思是什麼

laser energy density 解釋
激光能量密度
  • laser : n 鐳射激光,受激發射光,激光;萊塞;激光器,光激射器 ( = light amplification by stimulated emis...
  • energy : n. 1. 干勁,活力。2. (語言、行為等的)生動。3. 〈pl. 〉 (個人的)精力;能力。4. 【物理學】能,能量。
  • density : n. 1. 稠密;濃厚。2. 【物理學】濃度;密度;比重。3. 愚鈍,昏庸。
  1. Based on the diopter status of myopia and hypermetropia, the paper presented the principle of excimer laser refractive surgery, the change of impacting cornea curvature on the cornea diopter. in this chapter, we also discussed excimer laser - corneal tissue interactions and photoablation. determine the relationship between the fluence of arf excimer laser and the cornea ablation rate, attain the relationship between the energy density and the ablation depth

    研究了激光與生物組織相互作用、光蝕作用及準分子激光消融角膜的機理;首次定量研究193nm準分子激光高斯光束的切削量與能量密度的關系,計算單個激光脈沖角膜切削量;發現了角膜曲率對切削效果的影響,首次提出了角膜曲率半徑、切削位置與切削深度的關系;首次定量確定了激光光斑參數及其排列方式對術后角膜表面粗糙度的影響,為更精確實現角膜切削和提高切削后角膜表面光潔度、減少手術后角膜渾濁及角膜表面術后不規則提供了理論依據。
  2. The paper discusses, on energy density of laser beam, emanative angle of laser beam and malajustmentdegree of laser beam s axes, the feasibility on adding irradiation of a certain laser irradiator

    從激光束的能量密度、瞄準光軸與激光束光軸的失調度、激光束的束散角三個方面論述某型激光照射器增程照射的可行性。
  3. Some by - products of this work can be used as routine tools in the uv laser laboratory. commercial video ccd cameras are used to image uv laser and soft x rays, window glass as a fluorescer is used to indirectly measure the uv laser beam profile with high energy density, and a special glass which permits uv light to pass through while absorbs the visible, is introduced into the uv beam profiling in strong visible stray light environment

    實驗中發展了一些測量技術,例如用可見光視頻ccd直接測量紫外激光的光束分佈和激光等離子體產生的x光二維圖象,利用窗玻璃作為熒光體測量能量密度較高的紫外光束分佈,利用可見吸收紫外透射玻璃製成的衰減器測量有嚴重背景光的紫外光束分佈,可以作為實驗室的常規測量工具,並有一定的推廣價值。
  4. In this thesis, we demonstrate the study of si - based light emitting materials and its importance in si - based photonics integration. we discussed mainly the gain, differential gain, threshold current of si - based quantum - dot laser and the dependence of threshold current on temperature from discrete energy level of three - dimension confined quantum - dot and state density distribution of 5 - function

    本文闡述了si基光發射材料的研究進展及它在硅基光電子集成中的重要地位,從三維受限量子點的分立能級和函數狀的態密度分佈入手,著重討論了si基量子點激光器的增益、微分增益、閾值電流及閾值電流的溫度特性。
  5. The relationships between the laser performance index, such as laser power densities, pulse energy and energy densities, and the diameter of holes have been set up, and a experience formula between the energy density and the diameter of holes has been established by the regression method, based on the experiment results

    在此基礎上,本文對微噴帶激光打孔機的性能進行了試驗研究,得到了激光功率密度、激光脈沖能量和激光能量密度對打孔孔徑的影響關系。通過數據回歸的方法,建立了激光能量密度與孔徑之間的半經驗公式。
  6. Optics and optical instruments - lasers and laser - related equipment - test methods for laser beam power energy density distribution

    光學和光學儀器.激光和激光設備.激光束能量密度分佈的試驗方法
  7. Optics and optical instruments - lasers and laser - related equipment - test methods for laser beam power energy density distribution iso 13694 : 2000 ; german version en iso 13694 : 2000

    光學和光學設備.激光和激光相關設備.激光束能量密度
  8. Abstract : this paper describes the thermal effects of a coaxial rf - excitedco2 laser , based on the balance equations of electron density and energy , current continuity equation , and heat conduction equation. depende ncies of the spatial distributions of gas temperature on some discharge parameters arediscussed

    文摘:通過求解放電等離子體中的帶電粒子密度和能量的平衡方程、電流連續性方程以及熱傳導方程,研究了同軸射頻( rf )激勵co2激光器中放電混合氣體的溫度效應,分析了有關放電參數對溫度分佈的影響。
  9. Cubic nitride boron ( c - bn ) films have been prepared at room temperature ( 25 ) by radio frequency plasma enhanced pulsed laser deposition ( rf - pepld ), assisted with substrate negative bias. in this paper, we primarily studied the effect of laser energy density, radio frequency power, substrate bias and depositing time on the growth of c - bn films, and analyzed the formation process and mechanism of c - bn films deposited by rf - pepld method at room temperature

    本文採用偏壓輔助射頻等離子體增強脈沖激光沉積( rf - pepld )方法在常溫下( 25 )制備立方氮化硼( c - bn )薄膜,初步研究了薄膜沉積參數:激光能量密度、射頻功率、基底負偏壓和鍍膜時間對立方氮化硼薄膜生長的影響,並分析了常溫下用rf - pepld方法沉積立方氮化硼薄膜的形成過程和機理。
  10. In laser surface hardening for the mould - roller, the hardened depth was controlled by laser specific energy density ( p / dv ), and proper overlapping ratio is the technical key. 3

    在模切輥激光表面強化中,激光比能密度p dv是影響相變硬化層深度的主要因素,搭接率的正確選取是模切輥表面強化技術的關鍵。
  11. The sto, ybco and sto / ybco thin films were deposited on laalo3 ( 001 ) ( lao ) substrate by pulsed laser deposition ( pld ). the effects of deposition parameters, such as the substrate temperature, the of target - substrate distance, laser energy density, on the properties of the thin fillms were systematically studied. the surface morphology of the thin films was investigated by atomic force microscopy ( afm ) and scanning electron microscopy ( sem )

    採用脈沖激光沉積技術在laalo3 ( 001 ) ( lao )基片上生長ybco 、 sto以及sto / ybco集成薄膜,系統研究了基片溫度、基片表面狀態、氧分壓、激光能量密度、脈沖重復頻率等工藝參數對薄膜表面性能、結晶情況的影響,優化了ybco 、 sto薄膜生長的工藝參數,運用afm 、 sem 、 xrd等分析手段表徵薄膜的微觀性能,分析結果表明:薄膜表面平整、結晶良好、 c軸織構。
  12. Abstract : a laser damage facilities, which has mm size spot and operates in tem00 mode , were achieved. in order to know the reasons of laser damage, the laser energy density was controlled near the damage threshold of the oxide thin films. according to the examined near - threshold damage morphology, the damage mechanisms of the optical coatings can be divided into two types. one was caused by melting of the coating materials, another by exploding, induced with the inner stress of the film. the plasma generated was an important reason to expand the damage area

    文摘:採用毫米量級大光斑的近單模的激光器,控制入射薄膜表面的激光能量,獲得了幾種常見單層膜和增透膜的損傷形貌,實驗結果表明,薄膜的損傷可區分為熔化型和應力型兩種,薄膜表面等離子體對損傷斑點的擴大有重要作用。
  13. The experimental evidences indicated that three deposition parameters, i. e., energy density of laser, rf plasma power and substrate negative bias played key roles in the growth of the c - bn films at room temperature. on this basis, the explanation of formation process and mechanism of c - bn film was given

    通過分析各個沉積參數在薄膜生長中的作用,證明三個沉積參數:激光能量密度、射頻功率和基底負偏壓是室溫下生長立方氮化硼薄膜的關鍵因素,並在此基礎上初步解釋了立方氮化硼薄膜的形成過程及機理。
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