low-temperature plasma 中文意思是什麼

low-temperature plasma 解釋
低溫等離子體
  • low : adj 1 低的;淺的,矮的。 low flight 低飛。 a low temperature 低溫。 low tide [water] 低潮。 The g...
  • temperature : n. 1. 溫度,氣溫。2. 體溫。3. 〈口語〉發燒,高燒。
  • plasma : n. 1. 【生理】血漿;淋巴液。2. 【生物學】原生質。3. (做藥膏用的)膏漿。4. 【礦物】半透明的綠玉髓。5. 【物理學】等離子(體);等離子區。
  1. In order to modify wool fabrics properties, low - temperature oxygen plasma is used to treat wool fabric

    摘要為了改善羊毛織物的氈縮、潤濕等性能,採用低溫氧等離子體對羊毛織物進行改性處理。
  2. In this dissertation, we mainly report on a laser - produced plasma ( lpp ) source with liquid aerosol spray target. for sufficiently high backing pressure and low temperature, the valve reservoir gas of the light source can undergo a gas - to - liquid transition

    液體微滴噴射靶激光等離子體( lpp )光源是一種具有較高的軟x射線轉換效率且能夠長期連續運行的低碎屑光源。
  3. The experiment result shows that with low - temperature oxygen plasma treatment, fabric ' s shrinkage and wettability have bettered a great deal, and fabric ' s breaking strength and breaking elongation is also increased in given condition

    有效控制處理條件,織物的斷裂強力和伸長率不但不會減小,反而可以得到一定程度的增強。
  4. The result shows that argon gas can not only promote the excitation of plasma at low pressure, but also improve discharge state, increase the density and activation of reaction radical and improve the quality of diamond films. on the other side, argon can cool the plasma and maintain low temperature of substrate due to its big ionization section and high collision probability with gas molecules

    結果表明,氣體系統中引入氬氣一方面不僅有利於維持低壓放電,而且改善放電狀態,提高反應活性基濃度和活性,提高低溫沉積金剛石膜的質量;另一方面,由於其大的電離截面使其和電子碰撞的幾率大大提高,對等離子體進行冷卻,有利於基片溫度的降低。
  5. The amorphous surface layer of tantalum was obtained by anodic oxidation in melting nitrate after plasma - nitriding at relative low temperature, and the composition, phase structure and property of coating were tested

    摘要採用低溫離子滲氮后再熔鹽陽極化的方法,在鉭表面形成厚度達微米數量級的非晶態層,測試了非晶層的成分、相結構和性能。
  6. Study on low temperature plasma treatment on functionality of wool fabric

    低溫等離子體處理羊毛織物功能性整理的研究
  7. No matter how different the discharge scheme is, low pressure discharge plasmas take a common characteristic of bright glow and is generally entitled as low temperature glow discharge. glow discharge plasma has been selected as a most suitable system for plasma diagnostics in laboratory and for application technology development because of its good stability and reproducibility

    利用n _ 2輝光放電中n _ 2 ~ +的發射光譜研究了放電空間的溫度分佈的變化規律,發現了直流放電的一些重要特性,如阻礙輝光與正常輝光的光譜差別。
  8. The clad diamond with multilayer films of metals, alloys or metalceramics are manufactured by low - temperature plasma composite technology

    採用該技術可以在單晶金剛石顆粒表面獲得強力結合的多層金屬層、合金層及陶瓷塗層。
  9. Low temperature plasma has been extensively investigated for catalyst preparation, including plasma chemical synthesis of ultra - fine particle catalysts, plasma regeneration or plasma treatment of catalysts, plasma - assisted deposition of catalytically active compounds on carriers and combination of plasma and catalyst in reaction system

    摘要低溫等離子體技術在化學生產中的用途越來越廣泛,它在催化劑領域的應用主要表現在以下幾個方面:超細顆粒催化劑合成,催化劑再生,催化劑表面處理,活性組分沉澱到基體以及低溫等離子體系統中添加催化劑。
  10. In this paper, plasma - enhanced chemical vapor deposition ( pecvd ) technique was used to deposit the dielectric p - sio2 films and p - sion films on the silicon wafer under the conditions of low temperature and low pressure with teos organic sourse. this research was focused on the evaluation of film growth, hardness, stress, resistance and refractive index, by changing the experimental parameters including rf power, substrate temperature, chamber pressure, and the flow rates of teos, o2, n2. the results showed that the p - sio2 film was smooth, dense, and structurally amorphous

    實驗結果顯示,用pecvd法淀積的p - sio _ 2膜是一表面平坦且緻密的非晶質結構的薄膜,與矽片襯底之間有良好的附著性;在中心條件時生長速率可控制在2600a / min左右;在基板溫度410時有最大的硬度可達16gpa ;其應力為壓縮應力,可達- 75mpa ;薄膜的臨界荷重為46 . 5un 。
  11. So we applied low temperature techniques to manufacture the sense film of qcm sensors. at low temperature and low pressure, with n - butylamine as the carbon source material, and with dry hydrogen as the carrying gas, we applied r. f. glow discharge plasma to preparation the working film for the qcm sensors

    在「實驗與分析」一章中較為詳細地闡述了採用等離子體化學氣相淀積的方法,以正丁胺作為碳源物質,通過射頻輝光放電在低溫低壓條件下制得了正丁胺等離子體淀積膜。
  12. My major are on electromagnetic field theory 、 applied research in low - temperature plasma and optics

    曾參與國家級科研課題兩項,獨立承擔校級科研課題兩項,近年來共發表省級以上科研論文10多篇。
  13. Aramid filaments are treated by a low - temperature plasma with different treatment times. the surface of filaments is observed by sem and the results show that the filament surface is smooth before the treatment and becomes more rough if filaments are treated for 6 minutes. in addition, it is found that the filament peels after 9 minutes of plasma treatment

    本課題採用低溫等離子體對芳綸纖維進行表面處理后,用sem觀察纖維表面,發現未經等離子體處理的纖維表面比較光滑;等離子體處理6分鐘后,纖維表面變得粗糙,產生很多微小的刻蝕坑;等離子體處理9分鐘后,纖維表面受到的刻蝕程度明顯增加,並產生表面剝離現象。
  14. Plasma enhanced chemical vapour technique ( hf - pecvd ) on monocrystalline silicon and quartz glass substrates under the low temperature. the effects of ultrasonic pre - treating of substrates, temperature, r. f

    系統地研究了襯底的超聲預處理工藝、沉積溫度、射頻功率以及氫氣對氮化硼薄膜的生長、組成及表面形貌結構的影響。
  15. Emission spectroscopy methodology for low temperature discharge plasma of low pressure gas low pressure gas discharge has been frequently utilized to generate plasma in laboratory and application. this kind of discharge is capable of providing various kinds of plasma for any requirements and realizing control of plasma parameters

    本文概述了雙原子分子光譜理論,指出了雙原子分子光譜對等離子體光譜診斷學的重要性,總結了應用雙原子分子發射光譜和原子發射光譜進行等離子體診斷的原理和實現方法,給出了幾個常用的雙原子分子的光譜數據。
  16. In this paper, we employ the plasma enhanced chemical vapor deposition ( pecvd ) to prepare high quality zno thin film at low temperature using a zinc organic source ( zn ( c2h5 ) 2 ) and carbon dioxide ( co2 ) gas mixtures. the effect of the substrate temperature and annealing temperature on the quality of zno thin films was studied in detail

    為了在低溫下制備高質量的氧化鋅薄膜,我們採用金屬有機源和二氧化碳氣源,首次利用等離子體增強化學氣相沉積的技術在低溫下制備了高質量的氧化鋅薄膜,確定了生長高質量氧化鋅薄膜的優化條件;研究了不同的襯底溫度和退火溫度對氧化鋅納米薄膜質量的影響。
  17. On the basis of the low - temperature plasma treat the surfaces of the fibres, a subject about the application of artifigial neural network in the low - temperatuer plasma surface treatment of ultra - high molecular weight polyethylene fiber has been researched deeper and more extensively in this dissertation

    在處理參數的優化中引入人工神經網路技術,主要完成了以下幾個方面的工作: 1 )論述了低溫等離子體在復合材料表面處理上的應用原理及參數對處理的影響。
  18. In this paper are introduced the low - temperature plasma composite technology

    本文簡介了低溫等離子復合技術。
  19. Then the influence of low - temperature plasma surface treatment on interface shearing strength between reinforcing fiber and matrix was investigated

    然後著重研究了增強纖維的低溫等離子體表面處理對增強纖維與基體間界面剪切強度的影響。
  20. The plasma composition and classification is brieved and the condition control in the low temperature plasma surface modification of fibers, the modification methods and mechanism, and the application progresses in the textile dyeing and printing are described with emphasis

    簡要介紹了等離子體的組成和分類,重點闡述了低溫等離子體表面改性的控制條件、對纖維表面改性方法和原理以及等離子體在紡織印染中的應用進展。
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