magnetron current 中文意思是什麼
magnetron current
解釋
磁控電流-
Magnetron management of target capacity and stabilization of an anodi current with the help of the built - in electromagnet, an opportunity of a parallel feed several magnetrons from one rectifier, a low level of the shf radiation from a cathodic leg is characterized effective
該磁控管可有效控制輸出功率，內建電磁石使提高了它的陽極穩定性，一個整流器可同時供幾個磁控管，具有低的陰極超高頻輻射。 -
In theoretical analysis, the motion of radially - emitted electron beam in diode region and drift region has been analyzed, and the relation between radial momentum or current of electron beam and the guiding magnetic field has also been studied, then the possibility to optimize the guiding magnetic field has been derived. the motion of radially - emitted beam electrons in smooth bore magnetron and smooth bore milo has also been studied theoretically. at last, the motion of radially - emitted beam electrons in compound axial and azimuthal magnetic field has been studied
在理論分析中，初步分析了軸向發射條件下電子在二極體區域和漂移區的運動規律，電子徑向動量隨著外加磁場變化的規律，以及電子束電流隨著外加磁場的變化規律，還有二極體區域磁場優化的可能性;分別研究了有軸向磁場時以及有角向磁場時徑向發射的電子在光滑陽極結構中的運動規律，最後分析了在軸向和角向復合磁場中電子的運動規律。 -
Cu - fe thin films were fabricated by a direction - current ( dc ) magnetron sputtering system
本文首先採用直流磁控濺射鍍膜方法制備了cu - fe過飽和固溶體薄膜。 -
The phase structure of different cu - fe thin films were studied by using grazing incidence x - ray analysis ( gixa ). the texture and residual stress of different cu - fe thin films were measured by scan of x - ray diffraction ( xrd ) and 2 scan with different. the thicknesses of different thin films were characterized by means of small angle x - ray scattering ( saxs ) technique. by using atomic force microscope ( afm ) measured surface roughness of thin films. the component of different thin film was characterized by energy disperse spectrum ( eds ) and x - ray fluorescence ( xrf ). the magnetic properties of cu - fe thin films were measured by means of vibrating sample magnetometer ( vsm ). in addition, the giant magnetoresistance ( gmr ) effects of different films were also measured. the original resistance of the film fabricated by a direction - current magnetron sputtering system is directly affected by bias voltage
利用掠入射x射線分析（ gixa ）技術對不同cu - fe薄膜的相結構進行了研究;利用xrd掃描及不同角度的2掃描對薄膜進行了結晶織構及殘余應力分析;運用小角x射線散射（ saxs ）技術測量了薄膜的厚度;採用原子力顯微鏡（ afm ）觀察了薄膜的表面形貌;運用能量損失譜（ eds ）及x射線熒光光譜（ xrf ）對薄膜進行了成分標定;使用振動樣品磁強計測量了不同cu - fe過飽和固溶體薄膜的磁性能;最後利用自製的磁阻性能測試設備測量了真空磁場熱處理前後不同薄膜的巨磁阻值。 -
Helium - charged al films are prepared by direct current ( dc ) magnetron sputtering with a he / ar mixture
摘要採用氦氬混合氣氛下直流磁控濺射沉積方法制備含有氦原子的金屬鋁膜。 -
In the last few years, because the price of current original material soaring rapidly, and some abroad microwave oven magnetron company control local companies by the intelligent property right, or limit with taking the very high patent fee
當前，由於原材料價格的飛速上揚，以及國外微波爐磁控管企業通過知識產權對我國企業的產品實行限制和收取高額的專利費。使我國的相關企業在激烈的競爭中面臨著巨大的壓力，有的甚至出現虧損。
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