magnetron frequency 中文意思是什麼
magnetron frequency
解釋
磁控管頻率-
An experimental invesigation of frequency - agile relativistic magnetron
可調諧相對論磁控管的實驗研究 -
In this paper, several thin films samples of vanadium oxide were got by high - frequency magnetron sputter with pure metal vanadium as sputter source
本文以高純金屬釩作為靶材，採用磁控濺射工藝制備氧化釩薄膜。 -
In this paper, fluorocarbon films are deposited on polyetylene terephalate ( pet ) substrate by radio frequency magnetron sputtering polytetrefluoroethylene ( ptfe ) targets to examine the effect of discharge condition on the properties and mechanism of deposited films. the effect of the power, pressure and treating time on morphology is observed by means of scanning electron microscopy ( sem ) and atom force microscopy ( afm ). it is found that the fluorocarbon film particles distribute more uniform and join tightly with increasing power, the surfaces of films become closer and denser as pressure increases
利用掃描電鏡（ sem ）和原子力顯微鏡（ afm ）研究了成膜機理以及cf膜的表面形貌，觀察了不同功率、壓力和時間下對氟碳膜表面形貌的影響，系統研究了氟碳膜表面結構隨功率和壓力的變化規律，發現功率提高使得氟碳膜顆粒分佈均勻，結合更加緊密，而提高壓力，氟碳膜的顆粒更加密集，並且濺射條件不同，粒子的形態、粒子間構成的介觀結構也不相同。 -
Secondly, we have studied the properties of the conbzr high frequency soft - magnetic thin film, and use the dc magnetron sputtering system by conquering the key technology to fabricate double - sides thin - film inductors on 10mm * 10mm printed circuit board and 20mm * 20mm ceramic board
再次，研究了薄膜電感所使用的conbzr高頻軟磁薄膜材料的性能，並利用真空磁控濺射設備，克服各種關鍵技術及工藝難度，在10mm 10mm的pcb板、 20mm 20mm陶瓷基片上製作了薄膜電感。 -
In the work, mid - frequency pulse magnetron sputtering is used to prepare znoral thin films used as the back reflector of the thin silicon films solar cells. the best techological condition was obtained by optimizing the preparing conditions, ( var is decided by the deposition rate, target voltage : 265v, gas pressure : 0. 6pa, the high base vacuum is expected
本文採用中頻脈沖磁控濺射法，通過優化zno ： al薄膜的制備工藝，如靶電壓、本底真空度、工作氣壓、襯底溫度、 o _ 2 ar ，得到可用於硅薄膜太陽能電池背電極的zno ： al薄膜。 -
In this work, the influences of fabrication process on microstructure, dielectric properties, ferroelectric properties and pyroelectric properties of plt films have been studied. plt films were prepared on the pt ( 111 ) / ti / sio2 / si ( 100 ) substrates by radio frequency magnetron sputtering method and then annealed by rapid thermal annealing process ( rta ) or conventional furnace annealing process ( cfa ). with the help of atom force microscopy ( afm ), x - ray diffraction ( xrd ) and some other apparatus, it was found that : lower substrate temperature ( ts ) was helpful for plt films to form better surface morphologies. with the increase of substrate temperature, the dielectric constant of plt films increased
Afm 、 xrd以及性能測試結果表明:較低的基片溫度有利於形成表面均勻緻密的薄膜，且薄膜的表面粗糙度均方根較小;隨著基片溫度的升高，經過快速退火的plt薄膜的介電常數逐漸增大;相比于傳統退火，快速退火縮短了退火時間，提高了薄膜的介電和鐵電性能;快速退火隨著保溫時間的延長，大部分鈣鈦礦結構的特徵峰的峰強增大，半高寬減小，峰形越來越尖銳，但當保溫時間為80s的時候， （ 100 ）和（ 110 ）峰的強度有所下降，因此保溫時間在60s較為適宜。 -
The designed films of sio2 and sio2 / si are prepared on sample and hemisphere dome of sapphire by radio frequency magnetron reactive sputtering method
利用射頻磁控反應濺射法，在藍寶石試片和半球形頭罩上制備出所設計的sio _ 2和sio _ 2 si增透膜系。 -
The afc system of linac, based on the embeded - system, is studied in the paper. the frequency of the magnetron changes with the temperature of environment outside when linac works
本論文重點研究的是嵌入式系統在電子直線加速器磁控管頻率自動跟蹤控制中的應用。 -
Detail specification for frequency agility pulsed magnetron of type ckm - 709 709a
Ckm - 709 709a型捷變頻脈沖磁控管詳細規范 -
" we tried to prepare the aircore meander type thin film inductors to increase the frequency that can be used. we prepared them with masks and by magnetron spllttering. wthollt the magnetic material we got large inductance by properly choosing the size parameter. the change of the size parameter does not influence the frequency that can be used, so we can improve the quality factor in the same time
為了得到在更高頻率下適用的薄膜電感，在本實驗中我們嘗試製作了柵極型空心薄膜電感。我們採用掩膜法，通過磁控濺射制各樣品，在不加磁性材料的情況下，適當選取線圈形狀參數來得到較大的電感，由於形狀參數的改變不影響樣品的適用頻率，因而也能達到增大品質因數（ q值）的目的。 -
Preparation of high quality cubic boron nitride film by radio frequency magnetron sputtering and its characterization
高質量立方氮化硼薄膜的射頻磁控濺射制備及其性能表徵
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