mask layout 中文意思是什麼
mask layout
解釋
掩模草圖-
Developing the lithography process models to properly characterize critical dimension ( cd ) variations caused by proximity effects and distortions introduced by patterning tool, reticule, resist exposure, development and etching, they are beneficial to develop a yield - driven layout design tool, the engineers could use it to automate the tasks of advanced mask design, verification and inspection in deep sub - micron semiconductor manufacturing
建立準確描述由於掩模製造工藝、光刻膠曝光、顯影、蝕刻所引起的光學鄰近效應和畸變所導致的關鍵尺寸變化的光刻工藝模型，有助於開發由成品率驅動的版圖設計工具，自動地實現深亞微米下半導體製造中先進的掩模設計、驗證和檢查等任務。 -
The gyroscope was modeled with the component library and simulated under saber. in the device level, the solid modeling of gyroscope based on solidworks was driven by the result of the system optimization. the mask layout generation from solid model was realized though the layout interchange standard and application programming interface for solidworks
其次，根據微陀螺系統級模擬優化的結果建立了微陀螺器件的實體模型，利用版圖文件交換標準cif和solidworks的二次開發介面實現了從三維實體到二維版圖的數據傳遞，並據此完成了微陀螺的版圖設計。
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