mask process 中文意思是什麼
mask process
解釋
掩模過程-
Developing the lithography process models to properly characterize critical dimension ( cd ) variations caused by proximity effects and distortions introduced by patterning tool, reticule, resist exposure, development and etching, they are beneficial to develop a yield - driven layout design tool, the engineers could use it to automate the tasks of advanced mask design, verification and inspection in deep sub - micron semiconductor manufacturing
建立準確描述由於掩模製造工藝、光刻膠曝光、顯影、蝕刻所引起的光學鄰近效應和畸變所導致的關鍵尺寸變化的光刻工藝模型，有助於開發由成品率驅動的版圖設計工具，自動地實現深亞微米下半導體製造中先進的掩模設計、驗證和檢查等任務。 -
The shadow mask is the critical component of the colour picture tube and the important component for the choice of colour, its function concentrates on the limitation of electronics bound diameter and the screening direction, the electronics bound which is sent by the electronics gun goes scanning, during the scanning process, we should guarantee every bound gathering into the small holes situated on the screen, then these bounds will point to the regularized position through the small holes on the flat mask, and then three basic colours will be produced, at the same time, those useless electronics will be blocked by the mask board
平板蔭罩是彩色顯像管的關鍵部件之一，是一個重要選色元件，其作用是限制電子束直徑和上屏方向，由電子槍發射的電子束在偏轉磁場的作用下進行掃描，掃描過程中必須使每個電子束只能射中熒光屏上的為該束指定的那些小孔上會聚，並通過蔭罩上諸多的小孔分別打到各自對應的熒光質點上，發出三種基色（紅，綠，藍） ，而無用的電子則被蔭罩板截獲。 -
We have contrasted several methods on fabrication of passive matrix oled, then we mainly discuss two fabricating methods, one is the precise mask method, the other is the barrier wall method. we find that the barrier wall method to fabricate the passive matrix oled ( pmoled ) has the advantages of high resolution, simple process and no crosstalking problem, so the barrier wall method is the good one to fabricate pmoled. in this paper we adopt the both methods, and we have successfully fabricated the pmoled
分析和對比了實現無源矩陣有機電致發光顯示器件的幾種方法，著重介紹了採用精密掩模技術和障壁技術等技術方案，來製作和設計無源矩陣有機電致發光顯示器件，其中採用障壁技術方案製作的器件具有解析度高、工藝簡單容易實現、器件的交叉效應少、成本低等許多優點，是一種可行的製作無源矩陣有機電致發光顯示器件的方案。 -
The processes include the deposition of the waveguide film, the design and fabrication of the mask pattern, the lithography, the metal coating with a magnetic sputtering, the lift - off process for the metal mask, the dry deep etching by icp, the slicing of the wafer, the polishing of the cutting edge, the fiber - to - waveguide alignment and at last, the performance testing. some edg chip samples are fabricated
對設計好的集成波導器件，本論文設計並試驗了器件的製作的全部工藝，包括波導薄膜的沉積，掩模的設計製作，光刻，濺射金屬薄膜，剝離法製作金屬掩模，干法深刻蝕，矽片切割，端面磨拋，波導對準和性能測試。 -
In the section of fabricating technology, i first discuss the ion beam technology. through the analysis of the effects of each parameter on the surface smoothness, profile fidelity and linewidth resolution in the process of ion etching, the suitable angle of incident ion beam, ion energy, density of ion beam and time of etching are selected combining the actual status of the mask
在製作工藝的研究方面，首先研究了離子束刻蝕技術，通過對離子束刻蝕過程中各個參數對刻蝕元件的表面光潔度、輪廓保真度和線寬分辨的影響分析，結合掩膜的實際情況選擇出了合適的離子束入射角、離子能量、束流密度和刻蝕時間等參數。 -
Lithography, as used in the manufacture of ics, is the process of transferring geometic shapes on a mask to the surface of a silicon wafer.
光刻技術應用到集成電路製造中，就是將掩模版的幾何圖形轉移到矽片表面的工藝過程。 -
The emphasis of the paper is on the practical applications, it ' s designed to combine " the modern marketing theory with the actual management of the enterprise, thus establishing a market strategy that best fits the company ' s resources, stressing on the science and feasibility of the definite operating methods in the process of a new product entering market, hoping to contribute considerable in the action of the eye contour mask market
本文重在實務，試圖將現代營銷理論與企業管理實際結合，制定與公司資源匹配的操作性強的市場戰略，強調在新產品入市營銷過程中具體操作方法的科學性、可行性，希望能對olx眼貼膜的市場運作起到很好的支持作用。 -
Staff involved in the triage process should wear a face mask ( see below ) and eye protection and wash hands before and after contact with any patient, after activities likely to cause contamination and after removing gloves
參與篩檢過程的人員應戴口罩、眼睛護具；接觸任何病患之前和之後，執行有可能引起污染的步驟之後，以及脫手套之後，都要洗手。 -
For publishing paper map, some approaches, for examples, area feature symbolization, feature covering, making mask and so on, are accomplished on the process. it is the second key that spatial attribute database management is applied in digital mapping. when a user adds or changes a feature, its attribute and symbol will be changed together
本文指出解決空間數據的地圖表達是實現一體化生產模式的第一個關鍵，其中地圖數據符號化技術貫徹全部過程，實現了基於地圖符號的空間數據生產，並在地圖出版階段，通過面狀符號配置、要素壓蓋、蒙片等地圖出版處理技術，實現地圖出版；本文把屬性管理技術應用在地圖制圖中，實現了屬性數據庫支持下的地圖編輯。 -
In the eme model, the electron energy balance equation is taken into account and the transport coefficients are assumed to be the functions of the electron mean energy. in this paper, a software is programmed to simulate the discharge process of plasma display cell of coplanar - electrode type, the matrix - electrode type and the novel shadow - mask pdp according to the gas discharge mechanism and fluid simulation theory. the simulation results show that both lfa model and eme model can be used to investigate the discharge characteristics of the cell, but the eme model is preferred for its better coincidence with theories and experiments
在本文中，分別使用本地場近似的lfa （ localfieldapproximation ）流體模型和假設碰撞反應系數、傳輸系數和電子的平均能量相關的eme （ electronmeanenergy ）流體模型對pdp放電過程進行模擬，比較分析模擬結果，得出eme模型和lfa模型對放電的繁流、起輝放電、熄滅等過程的描述的基本趨向是大致相同的，而從模擬工作電壓與實際電壓的接近程度和放電效率角度比較， eme模型的模擬結果跟理論和實驗結果更為相符。 -
Lithograghy and its relative techniques play a very important role in mems fabrication processes, spin coating and baking are an indispensable working procedure before and after the lithography process. oven and hotplate are often employed in order to enhance adhesion between the film and the substrate, stabilize sensitivity of film and improve the abrasion resistance when the film touches a mask in contact exposure
均膠和烘乾是光刻工藝中不可缺少的一道工序，為增加膠層與矽片表面粘附能力，提高在接觸式曝光中膠層與掩模版接觸時的耐磨性能及穩定膠層的感光靈敏度，通常採用烘箱或熱板等加熱設備對光刻膠進行乾燥。 -
For the positive real function image encoded by double random - phase, the first random - phase mask placed in the blank can not serve as the key when the decrypted image is detected by intensity detector in the decrypting process
摘要正的實函數圖像通過雙隨機相位編碼加密以後，在解密過程中，用光強探測器接收解密圖像時，位於空域的第1塊相位掩模不起密匙作用。 -
In this thesis, to increase the aspect ratio of liga process, several important influence factors were discussed, which includes the structure and performance of liga mask, x - ray intensity and x - ray spectrum of beam lines, the characteristic of pmma resin and the micro electroforming parameters. the au - pi mask and the au - si mask were designed by xop and origin software, after the difference between the spectrum of 3w1 and 3b1 beam line had been contrastively analyzed
本文著眼于liga技術高深寬比方面的研究，以提高本實驗室用liga技術製作微細結構的深寬比為目的，從分析各因素影響深寬比的機理出發，再加以理論設計和實驗工藝的優化和改善，分別研究討論了影響深寬比的幾大重要因素：掩模結構和性能、光源光譜和光強、 pmma光刻膠性能、電鑄工藝參數等。 -
The basic idea behind opc is to intentionally and systematically distort the mask in such a way as to compensate for optical diffraction limit and process non - idealities
其基本思想是有目的、有系統地通過對掩模形狀做預失真來補償由光學系統的衍射和工藝的非線性引起的失真。 -
When toggled on, these commands will process all directories in the source directory ( i. e., the directory they are copying. ir from ) and will recurse into any that match the mask specified to the command
當使用了遞歸方式時，這些執行的命令會處理源目錄下所有的子目錄（例如目錄下所有的. ir文件） ，同時使用命令中的通配符。 -
The process was not only mental : she also had to put on 12 kilograms, and a makeup artist turned her nearly flawless face into a mask of tragedy
這個過程不只是精神上的：她還必須增加12公斤體重，一位化妝師將她幾近無瑕的臉變成了一張悲劇的面孔。
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