mixed gas atmosphere 中文意思是什麼
mixed gas atmosphere
解釋
混合氣體氣氛- mixed : adj 1 混成的，混合的。2 混雜的，各式各樣的。3 男女混合（成）的；各階層混合成的。4 〈英國〉男女同...
- gas : n （pl gases ）1 氣，氣體，氣態 〈cf fluid; solid〉 2 可燃氣，煤氣，沼氣；【礦物】瓦斯。3 【軍事...
- atmosphere : n. 1. 大氣；大氣層，氣圈；空氣。2. 四圍情況，環境，氣氛。3. （藝術品的）基調，風格。4. 氣壓。5. 【化學】霧。
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Among these methods, magnetron sputtering is the most widely used technique for preparing thin films owing to its high deposition rate and good uniformity etc. in my experiment, zao films were prepared by dc magnetron sputtering in pure argon gas atmosphere using zno target mixed with al2o3 ( lwt %, 2wt %, 3wt %, 4wt % respectively ) and the films were figured by xrd, sem, xps, afm and ftir, uv photometer
本研究課題以氧化鋅鋁靶為靶材，採用直流磁控濺射工藝在純氬氣氣氛中沉積zao薄膜。靶材中al _ 2o _ 3的摻雜比例分別為1 、 2 、 3 、 4 。用xrd 、 sem 、 xps 、 afm和紅外、紫外分光光度計等測試手段對沉積的薄膜進行了表徵。 -
Among these methods, magnetron sputtering is the most widely used technique for preparing thin films, owing to its high deposition rate and good uniformity etc. ito films were prepared by rf and dc magnetron sputtering in pure argon gas atmosphere, using in2o3 and in target mixed with sno2 ( 10wt % ) and sn ( 7wt % ) respectively
其中磁控濺射工藝具有沉積速率高均勻性好等優點而成為一種廣泛應用的成膜方法。本研究課題分別以氧化銦錫靶和銦錫合金靶為靶材，採用射頻磁控濺射和直流反應磁控濺射工藝在氬氣氣氛中沉積ito薄膜。靶材中sno _ 2和sn的摻雜重量比例分別為10和7 。 -
The liquid phase is coupled device is the low voltage gradient itself in a high - pressure pumps add ratio valves in the atmosphere will be set according to the proportion of online several solvents mixed, then pump into the gas system
液相色譜中的低壓梯度洗脫裝置就是在高壓泵之前加上一個比例閥，在常壓下將幾種溶劑按設定的比例在線混合之後，再泵入色譜體系。
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