optical illumination 中文意思是什麼

optical illumination 解釋
光照明
  • optical : adj 眼的；視覺的；視力的；幫助視力的；光學（上）的。 optical activity 【物理學】旋光性。 an optic...
  • illumination : n. 1. 照明，光照；照（明）度；〈常用 pl. 〉 燈飾。2. 啟發，啟蒙。3. （手寫本的）彩飾。illuminative adj.
  1. Such a mirror - based camera obscura is simple by today ' s standards, but at the time of van eyck it would have represented the most sophisticated optical system on the planet, requiring greater precision in the shape and arrangement of the mirror and more stringent requirements for illumination than any known system

    以今天的標準來看，這種配備鏡子的暗箱並不難做，但若在范艾克的時代，卻會是全世界最尖端的光學系統，鏡子的形狀與配置所需的精確性，比當時所知的任何設備還要高，而照明上也有更嚴格的要求。
  2. Optical radiation physics and illumination engineering ; quantities, symbols and units ; table of contents and catchword index to din 5031

    光學范輻射物理學和照明技術. din5031標準的量值符
  3. Optical radiation physics and illumination engineering ; terms for wavebands

    光輻射物理學及照明工程.波段用術語
  4. The dynamic behaviors of both electrons and irons in the case of light illumination and elevated temperature are analyzed, and hereby the optical erasure effect of subsequent recording light on fixed electronic gratings and the thermal erasure effect of subsequent heating on revealed ionic gratings are presented

    本論文深入研究了分批存儲定影過程中電子和離子在光照和高溫作用下的動態特點，全面描述了全息圖寫入過程中的兩種光擦除作用以及高溫熱定影過程中的補償和平滑機制。
  5. In shadow moir topography, there are theoretically four main kinds of optical field arrangements as parallel illumination and parallel receiving, parallel illumination and point receiving, point illumination and point receiving with equal distance, point illumination and point receiving with unequal distance

    摘要形貌影柵雲紋測量中主要有4種光場：平行照射平行觀察、平行照射點觀察、等距點照射點觀察和不等距點照射點觀察光場。
  6. The human eye is not a perfect optical system, we analyzed the optical factors of affecting the human eye vision quality, such as diffraction on small pupil, the aberration of the eye system, the size of the pupil, illumination arid optical dispertion

    摘要人眼作為一種光學器官，存在著一些光學缺陷，從物理學的角度分析了小瞳孔的衍射效應、眼球光學系統的像差、瞳孔尺寸、照明度和光學散射等對人眼視覺質量的影響。
  7. And the average illumination intensity can be figured out through statistic method. here, some kinds of traditional led ' s optical encapsulated structure were simulated using monte carlo method. and experiments were performed using the correspondent led ' s optical encapsulated structure with the same conditions just like what were used in simulation

    採用二次曲面系數矩陣a統一描述任意二次曲面，給定系數矩陣a1 ， a2 … ， an ， （ n為小於10的正整數） ，和描述曲面范圍的條件，就描述了一個完整的led光學結構模型供模擬。
  8. At last, relation between optical efficiency and etendue value is analyze. zemax and lighttools are used in the design of fly - eye lens array illumination system, which has many advantages including compact volume, high efficiency and uniformity. now it has been applied in commercial 0. 9 inch tft - lcd panel projector

    在深入分析設計原理的基礎上，使用zemax 、 lighttools等軟體實現了結構緊湊、高光能利用率、高均勻性的偏心的蠅眼透鏡陣列設計，在0 . 9英寸tft - lcd面板的投影儀上已經被商業應用，達到了廠家的技術指標要求。
  9. The subwavelength optical elements with features smaller than the wavelength of the incident illumination do not give rise to diffraction other than the zeroth orders in the substrate and incident medium

    亞波長光學元件的特徵尺寸小於入射光波波長，特點是僅有零級反射波和透射波存在。
  10. Who should attend : optical engineers who wish to learn more about modeling illumination systems and performing stray light analysis with zemax

    針對人士：想要學習利用zemax進行更多的照明系統建模和雜散光分析的光學工程師。
  11. Based on the theory mode, the delay time between the beginning of optical illumination and the onset of lock - on switching was calculated, and the transiting speed of electrons, the traversing velocity of the current filament, was obtained as well. the calculated results matched well the experimental results. taking advantage of the ultra - fast response characteristics of the devices, si - gaas pcss ' s are successfully applied to the broadening test of nanosecond laser pulses

    應用單極電荷疇模型數值計算了lock - on效應的光、電時間延遲和載流子的渡西安理工大學碩士學位論文越速度（絲狀電流穿越開關間隙的速度） ，所得計算結果與實驗測試結果基本吻a利川半絕緣gaas光屯導開關的超快光l匕11向應燈性，成功地應川下納秒激光脈沖展寬試驗中，證明了開關可廠泛應川在超快光電響應和光電反饋網路中。
  12. For the coordination of the contradictory, the wavefront technique has been regarded as an effective method to improve the image quality in photolithography by optimizing the image of the mask. it includes : pupil filtering, phase shift mask, off - axis illumination, optical proximity correction, and so on

    為了協調這種矛盾，利用波前工程來改善光刻圖形的質量以提高光刻解析度，已廣泛地應用於光學光刻中，如：瞳孔濾波、相移掩模、離軸照明、光學鄰近效應校正等。
  13. Extreme ultraviolet lithography ( euvl ) represents one of the promising technologies for supporting integrated circuit ( 1c ) industry ' s lithography needs during the first decade of the 21st century. this technology builds on conventional optical lithography experience and infrastructure, uses 11 - to 14 - nm photon illumination, and is expected to support multiple technology generation from 65 nm to 35 nm

    極紫外投影光刻（ euvl ， extremeultravioletlithography ）技術作為下一代光刻技術中最佳候選技術，建立於可見/紫外光學光刻的諸多關鍵單元技術基礎之上，工作波長為11 14nm ，適用於製造特徵尺寸為65 35nm的數代超大規模集成電路，預計在2006年將成為主流光刻技術。
分享友人
分享到 Line

分享到臉書