parametric device 中文意思是什麼
parametric device
解釋
參變設備- parametric : adj. 參（變）數的；參量的。
- device : n. 1. 設計，計劃；方法，手段。2. 〈pl. 〉意志，慾望。3. 謀略，策略，詭計。4. 器具，器械，設備，裝置。5. 圖案，圖樣；花樣；紋章；標記，商標；（紋章上的）題銘。
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It is transparent in a region from the visible to the infrared range ( 0. 45 - 13 ? m ) and has a fitful birefringence and a large nonlinear coefficient. aggas2 crystal can be made to be octonary device, difference - frequence device and parametric oscillator, and laser sources of different frequences in 1. 8 - 11 ? m band can be provided
其紅外透波范圍寬（ 0 . 45 - 13 m ） ，具有適宜的雙折射率和大的非線性系數，可製成倍頻、差頻和光參量振蕩器件，在1 . 8 - 11 m范圍內可提供多種頻率的激光光源。 -
Locomotion study laboratory focuses research on normal and pathological human motion and foot pressure analysis, functional evaluation of limb prosthesis and orthotics, parametric analysis of prosthetics alignment, motion - aid device functional analysis, motor control study
動作分析實驗室：專門研究正常與有疾病之人體動作與足底壓力分析；下肢義肢與支架輔具功能評估；義肢校正參數標準化研究；行動輔助器功能評估；神經控制動作分析。 -
In the part of the experimental designs, a experimental configuration of an unstable cavity by use of two bbo crystals compensating the walkoff effect and pumped by reflection is presented, and two set of controlling systems designs of open and closed loop are also presented ; we realized closed loop controlling system of bbo optical parametric oscillator tuning system, by using american general scanning inc. ' s controller to control bbo crystal ' s rotation, and scaled the output wavelength with charge coupled device
在實驗設計上給出了利用兩塊bbo晶體補償走離效應返回式泵浦非穩腔的實驗設計，設計了開環和閉環兩套控制系統。通過使用美國通用掃描公司的掃描頭控制bbo晶體的轉動，用ccd對bbo - opo輸出波長進行標定，實現了bbo - opo調諧系統的閉環控制，相對波長調諧誤差小於0 . 04 ，並給出了354 . 7nm泵浦的類相位匹配bbo - opo輸出波長隨晶體轉角變化的理論和實驗曲線。 -
Topics covered include : design of experiments, response surface modeling, and process optimization ; defect and parametric yield modeling ; process / device / circuit yield optimization ; monitoring, diagnosis, and feedback control of equipment and processes ; and analysis and scheduling of semiconductor manufacturing operations
主題包括：實驗設計、反應曲面模型建構、流程最優化；缺點與參數良率的模型建構；製程/元件/電路良率最優化；設備與製程的監測，診斷及回饋控制；以及半導體製造作業的分析與排程。
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