pattern alignment 中文意思是什麼
pattern alignment
解釋
圖形對準-
The processes include the deposition of the waveguide film, the design and fabrication of the mask pattern, the lithography, the metal coating with a magnetic sputtering, the lift - off process for the metal mask, the dry deep etching by icp, the slicing of the wafer, the polishing of the cutting edge, the fiber - to - waveguide alignment and at last, the performance testing. some edg chip samples are fabricated
對設計好的集成波導器件，本論文設計並試驗了器件的製作的全部工藝，包括波導薄膜的沉積，掩模的設計製作，光刻，濺射金屬薄膜，剝離法製作金屬掩模，干法深刻蝕，矽片切割，端面磨拋，波導對準和性能測試。 -
Extreme ultraviolet lithography is being developed as one of the most important candidates to fabricate a sub - o. lum - pattern. in recent years, several key technologies have been developed rapidly such as laser producing plasma source, extreme ultraviolet multilayer, optical fabrication and metrology, projection - camara alignment, low - defect mask and control technology of stage
極紫外投影光刻（ extremeultravioletlithography簡稱euvl ）最有可能成為下一世紀生產線寬小於0 . 1 m集成電路的技術，近年來在激光等離子體光源、極紫外多層膜、光學加工和檢測、光學精密裝調、低缺陷掩模、光刻膠技術以及高穩定工作臺系統控制等關鍵技術方面得到了飛速發展。 -
The dynamic model of grey is comeing or bring into being the function concept with the grey serving as the foundation, and with the differential drawing up closing the pattern the building method for the nucleus, to build pattern thought is directly changing the time alignment to the differential equation grey system, thus builds that the development abstracting the system changes the dynamic model, and namely grey ' s dynamic ' s model, ' s brief note is for gm
灰色系統理論與方法的核心是灰色動態模型，其特點是生成函數和灰色微分方程。灰色動態模型是以灰色生成函數概念為基礎，以微分擬合為核心的建模方法，灰色系統建模思想是直接將時間序列轉化為微分方程，從而建立抽象系統的發展變化動態模型，即greydynamicmodel ，簡記為gm 。
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