peak current density 中文意思是什麼

peak current density 解釋
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  • peak : vi 1 瘦弱;消瘦,憔悴。2 減少,縮小 (out)。n 1 山峰,山頂;孤山。2 (胡須等的)尖兒;尖端。3 最...
  • current : adj. 1. 通用的,流行的。2. 現在的,現時的,當時的。3. 流暢的;草寫的。n. 1. 水流;氣流;電流。2. 思潮,潮流;趨勢,傾向。3. 進行,過程。
  • density : n. 1. 稠密;濃厚。2. 【物理學】濃度;密度;比重。3. 愚鈍,昏庸。
  1. Value, and the current density and intensity versus the substorm phases. moreover, the characteristics of substorm current wedge are given special attention. it is found that the density and intensity of facs reach their peak during the expansion phase, the onset of the expansion phase is triggered when imf is changed to southward from northward or the southward imf decreases, and the positions of onset are most likely to be at the edge of plasma sheet near the earth

    值分佈以及場向電流強度和密度隨亞暴位相的變化,並著重分析了亞暴電流楔的特徵。結果表明,亞暴膨脹相的場向電流強度和密度都達到極大值亞暴的膨脹相是由行星際磁場轉向或南向分量變小觸發的,其起始位置很可能位於近地等離子體片內邊緣。
  2. In the third chapter, the influence of current density, solution concentration, erosion time and aging in ambient air on the pl spectra of ps suggests that peak would blue shift with current density increasing, and with erosion time and aging time prolonging ; with the increasing of solution concentration, peaks would red shift when solution concentration less than 1 : 1 but blue shift when solution concentration greater than 1 : 1. above phenomena can be explained by quantum confinement and light center model, but do not deny the action of si - h bonding and defect on the surface in the process of photoluminescence. at present, radiation mechanism is still one of the primary problems in the study of ps

    在第z三章中;通過對比,分析了電流密度、陽極化時間、溶液濃度以及自i然氧化時間對多孔硅光致發光光譜的影響,認為在一定的范圍內,多i孔硅的發光峰位會隨電流密度的增大而藍移,要獲得較強的發光,需z要選擇合適的電流密度;隨著腐蝕時間的延長,多孔硅的發光峰位會i發生藍移;當f酸的濃度較小q : 1 )時,峰位隨濃度的增大表現為向i低能移動;而當f酸的濃度較大河山時,峰位隨濃度的增大則表現z為移向高能;多孔硅在空氣中自然氧化;其發光峰位發生藍移,而強i度隨放置時間的延長而降低。
  3. The corrosion potential was the biggest and the corrosion current was the smallest one when the concentration of super - 3900 was 0. 5 % ; the corrosion potential was increased with the addition of mps - dl, but the smallest corrosion current is under 0. 01 % mps - dl. the rust time was the longest one when the concentration of super - 3900 was 0. 5 % as well as mps - dl was 0. 01 %. it was increased as a peak curve with al2o3 concentration in plating solution and ph value increased gradually with cathodic current density ; the corrosion weight

    通過測量tafel曲線可知,在super - 3900濃度為0 . 5 % (相對于鍍液的體積百分含量)時獲得的鍍層腐蝕電位最正,腐蝕電流密度最小;隨著鍍液中mps - dl含量的增加,獲得的鍍層的腐蝕電位逐漸正移,在濃度為0 . 01 % (相對于鍍液的體積百分含量)時腐蝕電流密度最小。
  4. In this session, current research will be presented to demonstrate the best type of exercise to develop peak bone density and the stage of life at which bone is capable of greatest growth

    在這節課中,將會通過最新的研究演示對于提高骨密度頂峰的最好的訓練種類,以及在生命的何種階段骨骼生長能力最好。
  5. With the development of the electronic technology, the higher requirements of power supply are raised including high efficiency, high power density, low emi and rapid dynamic response. a hysteresis - band instantaneous current control pwm technique is popularly used because of its simplicity of implementation, fast current control response, and inherent peak current limiting capability

    隨著電子技術的發展,用電設備對電源要求不斷提高,開關電源正向著效率高、功率密度大、可靠性高、電磁干擾低、無噪聲、維護方便的方向發展。
  6. The hardness and corrosion resistance were evaluated by, the anticorrosion mechanism was also discussed by xps as well. the composited content of particles in coating was high when 0. 5 % super - 3900 was added into al2o3 suspention before plating the composited content increased with the increase of al2o3 concentration in plating solution and the time of stirring before plating and increased as a peak curve with plating temperature, cathodic current density and ph value

    超分散劑super - 3900加入量為0 . 5 % ,對al2o3懸浮液分散后加入時,獲得的鍍層復合al2o3含量高,並隨著鍍液中al2o3含量、鍍前攪拌時間增加而增加,鍍層中al2o3含量隨著施鍍溫度、陰極電流密度、 ph值的增加呈先增加后減少的變化。
  7. The oxidizing parameters of the anodization in the following experiments were preferred on the basis of measuring the dependence of pl properties ( peak position, and max intensity, etc. ) on anodization conditions, such as the anodizing current density, the time of the anodization, the concentration of the solution ( mainly of hf ), and on the doping level of the substrate

    刻蝕時間、刻蝕液配比及襯底電阻率對pl發光強度、峰值波長等性質的影響。在此基礎上優化出制備多孔硅的具體參數。對不摻sb與摻sb的snci 。
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