photomask 中文意思是什麼
photomask
解釋
光掩模-
Hard surface photomask substrates
硬面光掩模基板 -
Determining effective adhesion of photoresist to hard - surface photomask blanks and semiconductor wafers during etching
測定在蝕刻期間光致抗蝕劑同硬表面光掩膜坯及半導體片的有效粘附性 -
Test method for calibration verification of laser diffraction particle sizing instruments using photomask reticles
用光掩模原版校準檢驗激光繞射粒子定尺寸儀器的試驗方法 -
The principle, theory, realizing methods for holographic lithography as well as the pattern transfer mechanism among the traditional photomask - hologram mask - resist have been deeply investigated. an experimental system with total inner reflection wavefront conjugation holographic lithography using right angle prism and refractive index matching liquid is designed and built, and the experimental research is carried out
對全息光刻的原理、理論、實現方法及傳統光掩模?全息掩模?抗蝕劑圖形傳遞機理進行了深入的研究，設計和建立了採用直角棱鏡和折射率匹配液的全內反射波前共軛全息光刻實驗系統，進行了實驗研究。 -
Specification for round quartz photomask substrates
圓形石英玻璃光掩模基板規范 -
Guidelines for photomask defect classification and size definition
光掩模缺陷分類和尺寸定義的準則 -
Test method for distortion of optical lenses used in photomask fabrication
光掩膜製作用光學透鏡畸變的試驗方法
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