pulse chamber 中文意思是什麼

pulse chamber 解釋
脈沖電離室
  • pulse : n 1 脈搏;有節奏的跳動;【動物;動物學】脈沖(波);脈動。2 意向;傾向。3 【音樂】拍子,律動。vi ...
  • chamber : n 1 〈古、詩〉室,房間;寢室,臥室;〈pl 〉套房;〈pl 〉律師[法官]辦公室。2 會議室,會場;議會,...
  1. P36 gas furnace ; combustor ; sit valve chamber ; pulse ignition ; ceramic simulation wood ; simulation ceramics ashes, straight safety mini crystal ceramics glass ; flame regulator

    P36天然氣爐體; ;燃燒室; sit閥體;脈沖點火器;陶瓷模擬木材;陶瓷模擬灰燼,平直微晶陶瓷安全玻璃;火焰調節器。
  2. A new hcci combustion system for diesel engine based on the technologies of multi - pulse fuel injection and the bump combustion chamber was developed by professor su wan - hua in necl of tianjin university. the premixed homogenous combustion is realized by the technology of multi - pulse fuel injection

    天津大學內燃機燃燒學國家重點實驗室蘇萬華教授提出的基於多脈沖噴射技術和bump燃燒室的復合燃燒技術是一種能夠實現均質燃油混合氣快速燃燒的新hcci燃燒方式。
  3. It shows that the gas - collecting chamber had an important effect on the mutual influence between the neighboring filter tubes in the back pulse jetting

    同時證明在脈沖反吹過程中,集氣室對相鄰濾管間相互影響具有重要作用。
  4. ( 1 ) the cfd model for the pulse combustion spray drying process. the computational fluid dynamics ( cfd ) based on the two - phase flow theory was employed in this paper, which used the standard k - e model and the particle trajectory model to simulate the gas - particle flow in the drying chamber. the momentum, heat and mass transfer regarding both gaseous and particulate phases during the spray drying inside the drying chamber was also revealed

    為解決這一難題,本文利用氣體一顆粒兩相流理論和計算流體力學( cfd )技術,建立了更符合實際噴霧乾燥過程的數學模型即噴霧乾燥的cfd模型,並進行了脈動燃燒噴霧乾燥過程模擬,其主要內容如下: ( 1 )建立了脈動燃燒噴霧乾燥的cfd模型該數學模型建立在氣體一顆粒兩相流基礎之上,用標準k -模型預測乾燥室內的氣體湍流運動過程,顆粒軌道模型追蹤乾燥室內顆粒群的運動軌跡,熱質傳遞模型描述空氣和液滴的熱質傳遞過程。
  5. The second harmonic produced by a q - switched nd : yag laser with wavelength e = 532 nanometers ( nm ), pulse width 0 nanoseconds ( ns ) and repetition frequency i = 1 hz was used to bombard a highly pure solid hexagonal bn ( h - bn ) target ( 96 % ), with diameter of 2cm. in a vacuum chamber, boron nitride ( bn ) film was deposited on the single - crystal silicon substrate

    利用高能脈沖激光(波長= 532nm ,頻率= 1赫茲,脈寬= 10納秒)在常溫下轟擊燒結的高純六方氮化硼( h - bn )靶,在真空反應室中將bn薄膜沉積在單晶硅基底上。
  6. The research and development for the bump orbit injection system with four kicker magnets centralized in nsrl phase project, and research of some key techniques were summarized, including micro - second pulse ferrite kicker magnet, coated ceramic chamber, measurement device for loss impedance, bpm calibration system, etc

    摘要介紹了國家同步輻射實驗室二期工程改造中四沖擊磁鐵集中布局凸軌注入系統研發過程,以及對若干關鍵技術的攻關,包括微秒脈沖鐵氧體沖擊磁鐵研製,鍍膜陶瓷真空盒研製,縱向阻抗測量裝置研製, bpm標定裝置研製等。
  7. The last or main injection pulse is set around tdc. when the diesel spray impinging on the combustion wall, the bump around the combustion chamber wall can strip off the wall jet and form a secondary spray in combustion chamber, so the fuel and air can mix well and homogenous

    在主噴射時刻,利用燃燒室壁面的bump迅速剝離壁面射流,在空間形成二次射流,二次射流進入燃燒室空間后,再一次與空氣混合,形成相對均勻的稀混合氣。
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