reacting field 中文意思是什麼
reacting field
解釋
反應場-
Basing on the project management practice of hunan international convention and exhibition center, the thesis explains the concept of project management 、 the knowledge system structure 、 the management theory and technology measure, discourses the present development of convention and exhibition economy of the world, and the far - reacting significance of constructing hunan international convention and exhibition center, puts forward the basic thinking and practical measure of applying project management in the convention and exhibition project. according to the typical project management procedure, it applies the management theory and technology measure of different knowledge field to the research work of project management activity of hunan international convention and exhibition center
論文以湖南國際會展中心工程項目管理實踐為基礎，闡述了項目管理概念、知識體系結構、管理理論與技術方法，論述了國內外會展經濟發展和建設湖南國際會展中心的深遠意義，探索了在項目中實施項目管理的基本思路和應用方法，並針對項目管理體系中典型項目管理過程，運用不同知識領域的管理理論和技術方法進行了湖南國際會展中心工程項目管理研究。 -
In this paper, two - dimensional and three - dimensional flow models in supersonic inlet and a simple reacting flow model in combustor and integrated flow field are established on the basis of k ? two - equation turbulence model and steady - compressible n - s equations, which are dispersed by finite volume method
本文以定常可壓縮n - s方程作為控制方程，採用-雙方程模型作為湍流模型，分別建立了超聲速進氣道的二維、三維流場計算模型和補燃室及一體化流場的湍流燃燒模型，並採用有限體積法對控制方程進行離散。 -
The material origin of the time rate of change of radiant reacting force is the radiation field
輻射反作用力變率的物質來源是帶電粒子的輻射場。 -
The dependence of cw df / hf cl performance on the flow - field parameters in f & d2 / h2 reacting zone, which act as criterion to nozzles design, has been inversely educed on the light of original formula of gain coefficient, output power and laser efficiency
從增益系數、輸出功率和激光效率的基本模型公式出發，逆推得到了df hf化學激光器性能對光腔中f和d 。川。反應區流場參數的依賴關系。 -
We combined the cvd technique with the pecvd technique by adding a dc or rf electric field to the reacting region of cvd device, and improved the inputting method of reaction gases, then had executed a diamond film growth system. the advantages of our system are : ( 1 ) reaction power, which can enhance the density of the plasma in the reacting region, is supplied with the heat filament and the dc electric field, or with the heat filament and the rf electric field both of them can be controlled precisely and they are complementary to each other
將熱絲cvd技術與pecvd技術相結合，在薄膜的成核和生長階段分別給反應區再施加一個直流和射頻電場，同時改進反應氣體的進氣方式，製成具有下列兩大特點的金剛石薄膜生長系統： （ 1 ）反應功率由熱絲和直流電場或熱絲和射頻電場共同提供，兩者互相補充，可精確控制，大大提高了反應區的等離子體密度； （ 2 ）能精確控制反應氣體的分佈、流量及流速。 -
A film formation method for a semiconductor process is arranged to form a thin film on a target substrate by cvd, while supplying a first process gas for film formation and. a second process gas for reacting with the first process gas to a process field accommodating the target substrate
本發明揭示一種用於半導體製程之薄膜形成方法，其系配置成藉由cvd在目標基板上形成薄膜，同時將用於薄膜形成的第一製程氣體及用於與該第一製程氣體反應的第二製程氣體供應至一容納該目標基板的製程區域。
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