reticle 中文意思是什麼
reticle
解釋
n. 名詞 【光學】（光學儀器上的）分劃板，標線片；標線，十字線。-
The integration level lies on the width of reticle
集成度取決于微晶元上的刻線寬度。 -
Act of moving a mask or reticle to match up alignment marks
對準，調整掩模和晶片之間的位置。 -
Reticle rotation error
標線旋轉誤差 -
Also, purists should appreciate that it ' s possible to play with the old - school fps view, with nothing on screen but the gun reticle
另外，還可以用第一人稱方式進行，屏幕上只有槍械的瞄準十字線。 -
When the width of reticle is less than 30nm, the semiconductor material achieves its physical limit, and it would be happen that quantum effect
刻線寬度小於30nm時，半導體材料達到它的物理極限，就會發生量子效應。 -
This paper presents the basic construction and movement rules of the coordinator gyrorotor with reticle of archimedes spiral reticule pattern, also, it explains the principles and methods of dynamical balance to damp the vibration and forced nutation
闡述了具有阿基米德螺旋線圖案的位標器的基本原理及其運動規律，並說明這種陀螺轉子的振動與繞動的平衡原理與方法。 -
The grating and reticle, which linewidth errors are less than 10 % nominal linewidth, are fabricated by ldw. for the first time metallic mesh film with area 200mm 200mm fabricated by using ldw photolithography and coating technology
本文完成了直角坐標激光直寫光刻技術研究，開展了離焦激光直寫光刻的工藝研究，製作了光柵和網格分劃板，線寬誤差控制在10 %以內。 -
In these years, image measuring has been used in every walk of life gradually. this paper discusses the characteristic, the virtue and the application of digital image measuring. in this paper. after analyzing the practical situation and theory, it has confirmed the project that identify automatically the pointer and the reticle of the pressure gauge with technique of optic photographic system, image process and automatic identification
近年來，圖像測量逐漸應用到各行各業。本文討論了數字圖像測量的特點、優點及應用范圍，結合實際情況和理論分析，確定了利用光學攝像系統和圖像處理、識別技術，自動識別壓力表的指針和刻線的方案，解決了壓力表示值的自動檢定問題，研製了一套集計算機、圖像處理和識別、自動控制和光學等技術於一體的壓力表示值的自動檢定系統。 -
Before more advanced lithography tool is produced, in order to use current tools to manufacture vdsm ic, reticle correction methods such as perturbing the shape ( via optical proximity correction ( opc ) ) or the phase ( via phase - shifting masks ( psm ) ) of transmitting aperture in the reticle are proposed by the industry
在波長更小的光刻系統出現前，為了能利用現有設備解決集成電路的可製造性問題，工業界提出了對掩模作預失真（光學鄰近校正）和在掩模上加相位轉移模（移相掩模）等的掩模校正方法。
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