silica coefficient 中文意思是什麼

silica coefficient 解釋
硅氧系數
  • silica : n. 【礦物】硅石,二氧化硅。
  • coefficient : adj. 共同作用的。n. 1. 共同作用;協同因素。2. 【數,物】系數,率;程度。
  1. Standard test method for coefficient of linear thermal expansion of plastics between - 30 c and 30 c with a vitreous silica dilatometer

    用玻璃硅膨脹計測定塑料在- 30和30之間的線性熱膨脹的標準試驗方法
  2. The desorption experiments in the same ph of solutions as adsorption experiments show that the desorption coefficient is bigger than the adsorption coefficient, so the adsorption of neptunium on silica gel in nitric acid belongs to irreversible process

    用239np溶液進行上述實驗后,又用239np與237np的混合溶液或237np溶液進行了上述部分實驗以比較微克量的237np和示蹤量的239np在硅膠上的吸附行為。
  3. Abstract : molecular deposition ( md ) film, a nano film, is assembled by the interaction of static charge between cationic and anionic compounds. the micro - friction properties of an md film on silica has been studied with atomic force microscope ( afm ). it has been found that the md film has lower coefficient of friction as compared with the original surface of silica. moreover, based on the analyses of the surface force versus distance curves, photographic image, friction force image, and modulated force image, it is concluded that the friction reduction effect of md film on silica is attributed to the surface adhesion reduction and surface micro - modification

    文摘:利用原子力顯微鏡對石英巖表面單層分子沉積膜的微觀摩擦特性進行了研究,發現該分子沉積膜具有一定的減摩性.通過對其表面力-位移曲線、表面形貌像、調制力像和摩擦力像的進一步分析表明,石英巖表面分子沉積膜具有減摩作用的原因在於它能夠降低表面的粘著力並對表面具有微觀修飾作用
  4. Either the boron nitride ( bn ) thin films with different cubic phase content were deposited on n - type si ( 111 ) and fused silica substrates by radio frequency ( rf ) sputtering using two - stage deposition process. the films were characterized by fourier transform infrared ( ftir ) spectroscopy. the transmittance te ( ) and reflectance re ( ) were obtained as a function of incident photo wavelengths and the thickness of films was measured by alpha - step. the absorption coefficient was calculated from te ( ) and re ( ). the optical band gap ( eg ) of the films was determined by effective medium form of formula containing eg

    本文還研究了立方相含量與光學帶隙的關系,在n型si ( 111 )片和熔融石英片上沉積出不同體積分數的立方氮化硼薄膜,薄膜的成分由傅立葉紅外吸收譜標識;用紫外-可見分光光度計測量了沉積在石英片上的bn薄膜的透射光譜te ( )和反射光譜re ( ) ,薄膜的厚度用臺階儀測得。
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