titanium deposit 中文意思是什麼

titanium deposit 解釋
鈦礦床
  • titanium : n. 【化學】鈦（Ti）。 titanium dioxide [white] 二氧化鈦 （＝titanic oxide）。
  • deposit : vt 1 放置，安置。2 使淤積，使沉澱。3 儲蓄。4 付保證金。5 寄存，委託保管。6 （把硬幣）放入（自動售...
  1. Silica pigment, benzene parazolone, oxalic acid catalyzer, accelerant, catalyst, deposit carbon powder, starch, paraacetaminophenetol - sulfonamide, sodiumpara - aminosalicylate ( pasna ), dalmato, p - thephalic acid, diethylbenzene - amine, titanium dioxide, acticarbon, sodium fluosilicate, fluorite, by - thiamine, silica gel powder, synthetic resin, sulfonic acid, polypropylene resin, aureomycin, pyrosodium silicate, gluchlorine acid coffee grounds, glucose, sodium sulfate, sulfide mineral, guound phosphate rock, bb, p. v. c.,

    M 、觸媒、沉澱炭粉、對乙酰氮基苯磺酰氨、對氨基水楊酸、哆耳瑪托、對苯二酸、二乙苯銨、二氧化鈦、活性碳、氟硅酸鈉、氟石礦、副產硫銨、硅膠粉未、合成樹脂、磷酸鈣、聚丙烯樹脂、金黴素、偏硅酸鈉、糠氯酸咖啡渣、口服葡萄糠、硫酸鈉、硫化礦、磷礦粉、蘭bb 、 p . v
  2. In the aspect of application research, through analyzing the existing state and selection - smelting feature of iron, titanium and vanadium which were mainly applied elements in panzhihua vanadic titano - magnetite deposit, the mine - exploding mode of zhujiabaobao section could be figured out by combining the rhythmic change feature of ore chemical composition, mineral composition and content and mineral chemical composition

    在應用研究方面，通過分析攀枝花釩鈦磁鐵礦主要利用元素鐵、鈦、釩的賦存狀態及選冶特性，結合礦石化學成分、礦物成分及含量、礦物化學成分呈韻律式變化這一特徵，建立了朱家包包礦段的開采模型。
  3. Abstract : it has been established that titanium exists in jinduicheng molybdenum deposit in rutile type by test for all kinds of ores. its grade is about 1 %. there isn ' t concentration in products. the particle size is fine, and the distribution isn ' t evenly. it has a definite economic benefit if it recoveried from tailings

    文摘:通過對金堆城鉬礦床中各種類型礦石的系統測試，查明了鈦在該礦床中主要以單礦物金紅石的形式存在於花崗斑巖各蝕變帶的鉬礦礦石中，品位約為1 % ，產品中沒有富集，基本隨尾礦流失，粒度細，分佈不均，從尾礦中進行綜合回收，具有一定的經濟效益。
  4. The paper put forward an aim to deposit n - doped titanium dioxide film on glass substrate by the atmospheric pressure chemical vapor deposition ( apcvd ) method. using ticl4 and oa as precursors, titanium dioxide thin films had been deposited by apcvd method. nitrogen had also been doped in the film when n2o gas was added as the dopant

    在實驗室條件下以ticl _ 4和o _ 2為先驅體，採用常壓化學氣相沉積法（ apcvd ）制備得到具有一定光催化性和親水性的tio _ 2薄膜，並且以n _ 2o作為摻雜劑，對薄膜進行了n的摻雜，在一定程度上提高了薄膜可見光照射下的光催化性和親水性。
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