ultraviolet source 中文意思是什麼

ultraviolet source 解釋
紫外光源
  • ultraviolet : adj. 【物理學】紫外的；紫外線的；產生[應用]紫外線的。n. 紫外線輻射。
  • source : n 1 源頭，水源，源泉。2 根源，本源；來源。3 原因；出處；原始資料。4 提供消息的人。5 血統。vt 〈美...
  1. The laser - liga technology provided by this research is the first technology to use ultraviolet laser as the exposal source for su - 8 photoresist lithography. it is a technology with lower cost and big potential to increase the aspect ratio as well as wider application

    本文首次提出採用紫外激光作為曝光光源的laser - liga技術，對su - 8膠進行曝光光刻不僅成本低、易推廣，而且具有大幅度提高光刻深寬比的潛力。
  2. Cholecalciferol is produced by irradiation of 7-dehydrocholesterol with ultraviolet light either from the sun or from an artificial source.

    膽鈣化醇是7脫氫膽固醇經日光或人工來源的紫外線照射而產生的。
  3. Cholecalciferol is produced by irradiation of 7 - dehydrocholesterol with ultraviolet light either from the sun or from an artificial source

    膽鈣化醇是7 ?脫氫膽固醇經日光或人工來源的紫外線照射而產生的。
  4. The differences of the monochromaticity and the direction of ultraviolet laser and non - laser ultraviolet source are analyzed firstly. the advantage of ultraviolet laser in exposing su - 8 photoresist is discussed

    首先分析了激光紫外光源與普通紫外光源在單色性與方向性上的差異，論證了採用激光紫外光源曝光su - 8光刻膠的優勢。
  5. Starting from the theory of two photoionization, we simplified the model of the ultraviolet light source, derived the equation for the spatial distributions of the initial electron density between the main electrodes, and then gave a simple method to homegenize the spatial distribution of the initial electron density between the main electrodes

    本文從光離化的雙光子吸收這一理論出發，簡化紫外光源模型后，導出了主電極間初始電子密度的空間分佈規律並給出了使其空間分佈均勻化的簡單方法。
  6. Ultraviolet - emitting source

    紫外線發射源
  7. Extreme ultraviolet lithography is being developed as one of the most important candidates to fabricate a sub - o. lum - pattern. in recent years, several key technologies have been developed rapidly such as laser producing plasma source, extreme ultraviolet multilayer, optical fabrication and metrology, projection - camara alignment, low - defect mask and control technology of stage

    極紫外投影光刻（ extremeultravioletlithography簡稱euvl ）最有可能成為下一世紀生產線寬小於0 . 1 m集成電路的技術，近年來在激光等離子體光源、極紫外多層膜、光學加工和檢測、光學精密裝調、低缺陷掩模、光刻膠技術以及高穩定工作臺系統控制等關鍵技術方面得到了飛速發展。
  8. Stationary source emission. determination of phosgene. aniline ultraviolet spectrophotometric method

    固定污染物排氣中光氣的測定.苯胺紫外分光光度法
  9. The ultraviolet laser emission is the expected goal of zno nanowires, but we need deep ultraviolet excite source to pump in previous experiments, which put a disadvantageous limit in future application

    Zno納米線紫外受激發射是人們希望達到的目標，但以往的激發過程一般是採用深紫外光泵浦，這對應用本身就是一條不利的限制。
  10. The optical parametric oscillator ( opo ) has been widely used as a wavelength tunable coherent radiation source, since it offers a broad tuning range from ultraviolet to far infrared, and some of its wavelengths are unaccessible to common laser systems, so opo has great value of application

    光學參量振蕩器具有可調諧的優點，調諧范圍可從紫外到遠紅外以上，彌補了普通的激光器只能輸出一種波長激光的缺點，並且覆蓋了普通激光器不能達到的波長，具有很高的應用價值。
分享友人
分享到 Line

分享到臉書