vacuum vapor deposition 中文意思是什麼

vacuum vapor deposition 解釋
真空汽相淀積法
  • vacuum : n (pl vacuums vac ua )1 真空;空處,空虛,空白。2 〈美口〉吸塵器(= vacuum cleaner)。vi vt 〈...
  • vapor : n. 〈美國〉= vapour.
  • deposition : n. 1. 免職,罷免;廢位。2. 淤積[沉積](物,作用)。3. 耶穌從十字架上放下(的畫、雕刻)。4. 寄存,委託;委託物。5. 【法律】口供,證言;口供書。
  1. The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc

    干鍍是一種在真空下在聚合物表面沉積金屬的方法,包括濺射、氣相沉積、真空沉積等。
  2. The results indicate that the optical performance and coating quality have been improved drastically by using ion - assisted deposition technology in the vacuum deposition, in comparison with the traditional thermal vapor deposition

    結果表明,與傳統的熱蒸發鍍膜工藝相比,在真空沉積過程牛採用離子束輔助沉積技術,可以大大提高膜層的光學特性及膜層品質。
  3. A ) si thin film with sub - micro thickness was epitaxial grown on heavy - doped si substrate by ultra high vacuum chemical vapor deposition ( uhv - cvd )

    A )利用超高真空化學氣相沉積( uhv - cvd )技術在重摻si襯底上生長高晶體質量的亞微米級薄硅外延片。
  4. By the design of microwave electric field mode and microwave mode converter ( mmc ), the thesis participated in equipping an domestic microwave plasma chemical vapor deposition ( mpcvd ) equipment with a quartz glass window and water - cooled stainless steel resonant chamber in 2450mhz / 5 kw, introduced the basic machineries and functions of the sub - systems, including microwave system, gas - route system, vacuum system, detecting system and safeguard system

    論文通過微波場型和模式轉換器的設計,參與建立了一套2 . 45ghz 5kw帶有石英玻璃窗、水冷卻不銹鋼諧振腔的微波等離子體化學氣相沉積( mpcvd )系統( mpcvd - 4型) 。論述了包括微波系統、氣路系統、真空系統、檢測系統和保障系統等結構的組成及基本功能。
  5. Vacuum chemical vapor deposition

    真空化學汽相淀積
  6. Vacuum vapor deposition method

    真空蒸發法
  7. Sige simox ; 3. sige smart - cut and behavior of sige / si he terostructure implanted with hydrogen. sige film preparation : sige films were grown on silicon substrate using solid source molecular beam epitaxy ( ssmbe ), gas - solid source molecular beam epitaxy ( gsmbe ) and ultra high vacuum chemical vapor deposition ( uhvcvd ) technologies

    Sige薄膜生長方面:在熟悉各種薄膜外延技術的基礎上,採用了近年來發展較為成熟的固態源分子束外延( ssmbe ) 、氣-固態源分子束外延( gsmbe ) 、超高真空化學氣相淀積( uhvcvd )三種sige薄膜外延技術,在硅( 100 )襯底上外延生長了sige薄膜。
  8. Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, sol - gel, laser - pulsed deposition

    多種工藝可以用來制備透明導電薄膜,如磁控濺射真空反應蒸發、化學氣相沉積、溶膠-凝膠法以及脈沖激光沉積等。
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