vacuum vapor deposition 中文意思是什麼
vacuum vapor deposition
解釋
真空汽相淀積法- vacuum : n (pl vacuums vac ua )1 真空;空處,空虛,空白。2 〈美口〉吸塵器(= vacuum cleaner)。vi vt 〈...
- vapor : n. 〈美國〉= vapour.
- deposition : n. 1. 免職,罷免;廢位。2. 淤積[沉積](物,作用)。3. 耶穌從十字架上放下(的畫、雕刻)。4. 寄存,委託;委託物。5. 【法律】口供,證言;口供書。
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The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc
干鍍是一種在真空下在聚合物表面沉積金屬的方法,包括濺射、氣相沉積、真空沉積等。 -
The results indicate that the optical performance and coating quality have been improved drastically by using ion - assisted deposition technology in the vacuum deposition, in comparison with the traditional thermal vapor deposition
結果表明,與傳統的熱蒸發鍍膜工藝相比,在真空沉積過程牛採用離子束輔助沉積技術,可以大大提高膜層的光學特性及膜層品質。 -
A ) si thin film with sub - micro thickness was epitaxial grown on heavy - doped si substrate by ultra high vacuum chemical vapor deposition ( uhv - cvd )
A )利用超高真空化學氣相沉積( uhv - cvd )技術在重摻si襯底上生長高晶體質量的亞微米級薄硅外延片。 -
By the design of microwave electric field mode and microwave mode converter ( mmc ), the thesis participated in equipping an domestic microwave plasma chemical vapor deposition ( mpcvd ) equipment with a quartz glass window and water - cooled stainless steel resonant chamber in 2450mhz / 5 kw, introduced the basic machineries and functions of the sub - systems, including microwave system, gas - route system, vacuum system, detecting system and safeguard system
論文通過微波場型和模式轉換器的設計,參與建立了一套2 . 45ghz 5kw帶有石英玻璃窗、水冷卻不銹鋼諧振腔的微波等離子體化學氣相沉積( mpcvd )系統( mpcvd - 4型) 。論述了包括微波系統、氣路系統、真空系統、檢測系統和保障系統等結構的組成及基本功能。 -
Vacuum chemical vapor deposition
真空化學汽相淀積 -
Vacuum vapor deposition method
真空蒸發法 -
Sige simox ; 3. sige smart - cut and behavior of sige / si he terostructure implanted with hydrogen. sige film preparation : sige films were grown on silicon substrate using solid source molecular beam epitaxy ( ssmbe ), gas - solid source molecular beam epitaxy ( gsmbe ) and ultra high vacuum chemical vapor deposition ( uhvcvd ) technologies
Sige薄膜生長方面:在熟悉各種薄膜外延技術的基礎上,採用了近年來發展較為成熟的固態源分子束外延( ssmbe ) 、氣-固態源分子束外延( gsmbe ) 、超高真空化學氣相淀積( uhvcvd )三種sige薄膜外延技術,在硅( 100 )襯底上外延生長了sige薄膜。 -
Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, sol - gel, laser - pulsed deposition
多種工藝可以用來制備透明導電薄膜,如磁控濺射真空反應蒸發、化學氣相沉積、溶膠-凝膠法以及脈沖激光沉積等。
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