丁脲 的英文怎麼說

中文拼音 [dīng]
丁脲 英文
butyl urea
  • : 名詞[化學] (尿素) urea; carbamide
  1. Cml ' s pi is 5. 7. the purified cml modified by n - ethymaleimide in the physiological saline containing 8mol / l urea or not did n ' t lose its agglutinate activity. about 3. 1 sulfhydryl groups in cml were modified in 8mol / l urea and 3. 2 sulfhydryl groups in cml were modified in the physiological saline without urea

    在含8mol l和不含的緩沖體系中,用n -乙基順烯二酰亞胺( nem )修飾cml的巰基,計算每個cml分子中被修飾的巰基數目分別為3 . 1和3 . 2個,修飾后cml的凝血活性無明顯變化。
  2. There were 5. 9 tip residues in cml. the purified cml was modified with n - bromosuccinimide ( nbs ) in hac - naac buffer containing 8mol / l urea or not

    在含8mol l和不含的緩沖體系中,用n -溴代二酰亞胺( nbs )修飾cml的色氨酸殘基。
  3. The tio2, cds and cds - tio2 films on the common glass substrate were prepared, respectively, using ti ( oc4h9 ) 4, cd ( cooch3 ) 2 and scn2h4 as raw materials by sol - gel method. the influences of manifold preparing parameters ( such as the concentration of sol, the amount of the peg. the number of coatings, the heat - treated temperature and time ) on the structure and performance were studied

    本文採用溶膠-凝膠技術,以鈦酸酯、乙酸鎘和硫為原料,以普通玻璃片為載體,制備了納米tio _ 2薄膜、 cds薄膜和cds - tio _ 2復合半導體薄膜,研究了制備過程中多種制備參數(如溶膠的濃度,聚乙二醇( peg )的加入量,鍍膜層數,熱處理溫度及時間)對薄膜結構和性能的影響,採用x -射線衍射( xrd ) 、掃描電鏡( sem ) 、能譜分析( edxa ) 、紫外-可見吸收光譜( uv - vis )等測試手段對各薄膜進行了結構和物性表徵。
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