壓制薄膜 的英文怎麼說

中文拼音 [yāzhìbómó]
壓制薄膜 英文
prehaut orange peel/forming defect
  • 壓 : 壓構詞成分。
  • 制 : Ⅰ動詞1 （製造） make; manufacture 2 （擬訂; 規定） draw up; establish 3 （用強力約束; 限定; 管束...
  • 薄 : 名詞[方言] （浮萍） duckweed
  • 膜 : 名詞1. [生物學] （像薄皮的組織） membrane 2. （像膜的薄皮） film; thin coating
  • 薄膜 : thin film; film; diaphragm
  1. Organic electroluminescent devices ( oleds ) have aroused many scientists " interests because of their potential adventages in low - power, emissive, flexible, cost - competitive, flat panel displays. red, green and blue light - emitting devices are readily avaible

    有機薄膜電致發光器件具有驅動電壓低、發光效率高、制備容易、可製成大面積的平板顯示器以及顏色豐富等特點，已引起各國科學工作者的廣泛關注。
  2. Series of guowei dry - method composite machines as new product are explored with our many years ' experience, the requirement of the users. the first metal of this machine is adopted with : photo - ecectricity auto. tracking " correcting deviation equipment, magnetic powder tension control. pneumatic back pressure shifting blade, oven temperature controlled qutomatically, big roll with oil heating, coating composite pneumatic control as well as double frequency governor etc. it will make the machine with fast speed, lower voice, low polluted by air, shout consumptionfor energy, stable working etc. especially suitable for al - foil with smooth surface and no enough firming, glass paper, polyester ect. the composite material with hard strength, fireproof, anti - ventilation, anti - fatty, frozen, dudrable steam etc character. it is widely used in food, pharmacy, as well as daily articles to package

    「國偉」 、系列乾式復合機，是我廠根據多年的復合機製造經驗及結合客戶需求，開發的新產品，該機第一基材採用了「光電自動跟蹤」糾偏放卷裝置，磁粉張力控制、氣動背壓移動式刮刀、烘箱溫度分段自動控制、大輥筒導熱油加熱、上膠復合氣動控制及雙變頻調速技術，使該機具有復合速度快、噪聲低、空氣污染小、能耗低、運行平穩等特點，適宜於表面光滑的鋁箔玻璃紙聚酰胺等與聚乙烯、聚丙烯等薄膜的復合，復合薄膜具有強度高、防水、防透氣、防油脂、可冷凍、蒸煮等優點，廣泛應用冷凍食品、乾燥食品、醫藥品及日用品的包裝。
  3. Using jgp560c magnetron sputtering equipment, cu / ag film are deposited on cd1 - xznxte substrate by dc magnetron sputtering in order to get the influences of the main experiments parameters such as sputtering power, gas flow, vacuum air pressure, magnetoelectricity power and substrate temperature on deposition rate of film, discovered that dc sputtering power is the most key factor influencing the deposition rate

    在jgp560c型超高真空多功能磁控濺射鍍膜機上，採用直流磁控濺射法在cdznte晶體上制備出cu ag合金薄膜，揭示了氣體流量、直流濺射功率、勵磁電源功率、工作氣壓和襯底溫度等工藝參數對沉積速率的影響規律。結果表明濺射功率對沉積速率的影響最大，隨濺射功率的增大沉積速率快速增大。
  4. Two kinds of n - substituted pyrrole ( trimethyl - ( 2 - pyrrol - l - yl - ethyl ) - ammonium iodide and 2 - ( 2 - pyrrol - 1 - yl - ethoxy ) - ethane - sulfonate sodium ) were synt hesized ; poly ( trimethyl - ( 2 - pyrrol - l - yl - ethyl ) - ammonium iodide ) / v2os nanocomposites were synthesized by two methods ( monomer in - situ intercalate polymerization and polymer intercalation in solvent ). to fabricate vaos sol by melt quenching, oxygen top - blend technique was applied to improve oxygenic part - pressure, decrease the oxygenic anoxic and restrain the increase of v4 + ion when vos was melted. the xos xerogel prepared by the new technique had more complete structure than the vos xerogel which v20s powder was melted in the air

    針對以v _ 2o _ 5為原料、熔融淬冷法合成v _ 2o _ 5溶膠、制備v _ 2o _ 5干凝膠薄膜這一方法，提出了在v _ 2o _ 5熔融時運用氧氣頂吹工藝這一思路，目的是增加熔體表面的氧分壓，減少熔體的氧缺損，使v _ 2o _ 5干凝膠的v ~ （ 5 + ）離子含量更高、其結構更完整、性能更穩定。
  5. With the aid of baffle movement, a technique named masking pretreatment and the method of vacuum deposition have been used to fabricate the ag - o - cs photoemissive thin films with internal field - assisted structure for the first time. the internal field - assisted photoemission characteristics of ag - o - cs thin films show that the photoelectric sensitivity is increased when the internal electric field is applied to the thin films, which indicates that the electric field has been effectively provided to the thin films by the above - mentioned internal field - assisted structure. such an enhanced photoemission is attributed to the variations in energy - band structure of ag - o - cs thin films, and which are considered to induce the lower - energy electrons to participate in the photoemission

    通過掩膜預處理和擋板轉移技術的配合，利用真空沉積方法首次制備了內場助結構ag - o - cs光電發射薄膜。 ag - o - cs薄膜內場助光電發射特性測試結果表明，該方法能夠有效地實現ag - o - cs薄膜體內電場的加載與表面電極的引出，薄膜光電靈敏度隨內場偏壓的增大而上升。 ag - o - cs薄膜在內場作用下的光電發射增強現象與薄膜體內能帶結構變化低能電子參與光電發射等物理機制有關。
  6. Firstly, the tio2 thin films are deposited by dc reactive magnetron sputtering apparatus, and characterlized by n & k analyzer1200, x - ray diffraction spectroscopy ( xrd ), scanning electronic microscopy ( sem ), alpha - step500. and it was analyzed that the effect on performance and structure of films with the change of argon flow, total gas pressure, the substrate - to - target distance and temperature

    第一、應用穩定的直流磁控濺射設備制備tio2減反射薄膜並通過n & kanalyzer1200薄膜光學分析儀、 x射線衍射分析（ xrd ） 、掃描電子顯微鏡（ sem ） 、 alpha - step500型臺階儀等儀器對薄膜進行表徵，分析氧分壓、總氣壓、工作溫度、靶基距等制備工藝參數對薄膜性能結構的影響。
  7. Then, by annealing, the si / sic / sich nano - composite films are prepared. the influence of the post - heating on the microstructure of the films has systematically been studied by the means of the measurements of hrem. the nano - crystals are found embedded in the amorphous matrix in the unannealed sample and the crystallinity is not high

    以硅烷和乙烯為原料氣採用常壓化學氣相沉積制備得到si / sic復合薄膜，並使用退火處理方法對該薄膜進行后處理，最終得到si / sic / slo ：納米鑲嵌復合薄膜。
  8. Promax tension ind corp has long sold and manufactured a variety of custo mized air shafts / air chucks / safety chucks, edge position control systems / epc, powder / air / disk brakes and clutches, ac / dc motor control systems, re - winding / un - winding systems, tension control systems, web inspection systems, automatic color register systems, servo - vector control systems, mmi interface and supervisory control and data acquisition ( scada ) systems and others such as slitting, winding, laminating, extruding, coating, and gravure printing machines, even other auxiliary devices etc. for webs such as paper, films, rubber, textiles and foils

    本公司長久以來已經從事製造及銷售有關紙類，薄膜，膠片，紡織品，橡膠等薄片卷材的捲筒物控制糸統周邊設備，諸如氣漲軸，氣漲/安全夾頭，邊緣追蹤器裝置，磁粉/氣壓/碟式煞車器及離合器，交直流轉矩馬達控制系統，收放料車動系統，張力控制裝置，印刷機靜態觀測器，自動套色控制裝置，伺服向量控制系統，人機介面及監控系統及其他有關印刷，貼合，分條，復? ，塗布，上膠，押出，淋膜等產業機械
  9. 1 successively depositing cbn thin films on si substrates which reaches international advanced level, the impact of negative substrate bias voltage and rf powers on the formation of cbn thin films were studied. boron nitride ( bn ) films were deposited on ( 100 ) - oriented p - type silicon substrate ( 8i sqcm ) with rf sputtering system. the target was hexagonal boron nitride ( hbn ) of 4n purity, and the working gas was the mixture of nitrogen and argon

    研究了襯底負偏壓和射頻功率對制備立方氮化硼薄膜的影響立方氮化硼薄膜沉積在p型si （ 100 ） （ 8 15 cm ）襯底上，靶材為h - bn靶（純度達99 . 99 ） ，濺射氣體為氬氣和氮氣混合而成，制樣過程中，襯底加直流負偏壓。
  10. Pressure - sensitive adhesive tapes for electrical purposes. part 3 : specifications for individual materials. sheet 11 : combined tapes made of creped cellulosic paper and polyethylene terephthalate film with rubber thermosetting adhesive

    電工用壓敏膠帶.第3部分:專用材料規范.活頁11 :塗覆橡膠熱固膠的纖維素縐紋紙和聚乙烯對苯二甲酸酯薄膜制復合膠帶
  11. Polycrystalline diamond films with preferred orientation by adopting assisted - bias hfcvd technique are prepared, and the mechanisms of the nucleation and growth of the films are studied. in addition, application of the film to the heat sink of power electron device is discussed

    採用輔助偏壓熱絲cvd技術，制備擇優生長的多晶金剛石薄膜，研究了金剛石薄膜的成核及生長機理，並將其應用於功率電子器件的熱沉。
  12. There are better performances in the films prepared by ba2ca2cu3ox target than by ba2cacu2ox target. the single - phase tl2ba2cacu2o8 hts thin film was obtained with a tc0 of 107k at the optimal tl2o partial pressure and thallination temperature 750. on excursion from the optimal conditions, there exist some impurities in the resultant films resulting in a reduction in tc0 and surface quality with change in the microstructure morphology

    研究結果表明，採用成分為ba2ca2cu3ox的靶材制備的薄膜性能要優于成分為ba2cacu2ox的靶材；使用組成式為tl1 . 9ba2ca2cu3oy的鉈片做鉈源時，形成的tl2o分壓達到最佳值；在最佳tl2o分壓和最佳鉈化溫度750的條件下，制備出了純相完全c軸取向的tl2ba2cacu2o8高溫超導薄膜，其tc0高達107k ，膜面均勻平整光滑，呈圓片狀組織；偏離最佳制備工藝參數的條件下，制得的薄膜中都含有一定量的雜相，雜相的生成使得tc0值下降，薄膜表面質量下降，薄膜組織形貌發生變化。
  13. To set up reasonable designing and manufacturing techniques and accurate calibration system and to speed up forming the native pvdf pressure sensors is the direction of this project. first, based on the piezoelectric theorem, the theoretic support of pvdf pressure sensors is deduced. according to purposes of practical projects, special purpose sensor configurations are designed and the corresponding calibration system based on shpb ( split hopkinson pressure bar ) technique is built in succession

    本文從壓電材料的一般壓電控制方程開始，導出了pvdf壓電薄膜測壓技術的相關論據；根據測試目的以及被測結構的特點，設計了多種夾心式的傳感器構造形式；摸索出了一套基於國產pvdf壓電薄膜製作壓力計的加工、安裝工藝；建立了一套基於系統集成技術的多點pvdf壓力測試的數據採集、處理系統；建立了一套基於shpb技術、適用於實際工程應力范圍的pvdf壓力計的動態標定方法，並對兩種厚度的國產pvdf壓電薄膜進行了標定。
  14. In this article, by rf sputtering the licoo _ 2 film was produced. by hot pressing and cold pressing ( and sintering ), the licoo _ 2 targets used in the rf sputtering were produced differently. both technics of the preparation of the licoo _ 2 film and the licoo _ 2 target were studied

    本文使用熱壓燒結方法和冷壓后燒結方法制備了磁控濺射用的licoo _ 2靶材，並使用磁控濺射方法制備了licoo _ 2薄膜，對兩者的制備工藝進行了研究。
  15. The study on low temperature pvd deposited sic film was carried out - m - employing bias assisted magnetron sputtering. furthermore, pvd deposited sic film mainly containing cubic phase was achieved at room temperature for. the first time

    採用偏壓輔助rf濺射法，對低溫物理氣相沉積sic薄膜進行了研究，並首次在室溫下制備出含有? sic構相併以其為主的sic薄膜。
  16. The influence of depositing condition on the depositing rate and the structure of the films were studied by the aid of tem and xrd. when the temperature ( ts < 450, ta < 800 ) is low, the structure of the samples is still amorphous. the majority content of the sample is sio 90 by the aid of xps

    利用雙離子束濺射沉積技術，通過共濺射方法制備了si - sio _ 2薄膜，研究了沉積時間、工作氣壓p _ （ ar ） 、基片溫度等對沉積速率的影響，用tem和xrd分析了樣品的結構。
  17. Water steam was used as oxidant, and the optimum water steam partial pressure is between 1 10 - 4 and 5. 5 10 - 4 pa. under the optimum growth parameters, a ceo _ 2 seed layer with highly textured degree was successfully prepared. beside the one step process was experimented in this dissertation, the two step process was proposed and studied to further improve the quality of ceo _ 2 seed layer. in the two step process, about 15 nm thick of ce metal layer was deposited on metallic substrate at the first step, then water steam was introduced in the chamber, and the ceo _ 2 thin films were subsequently deposited with reactive sputtering in the

    總結出沉積ceo _ 2薄膜的優化工藝條件，當沉積溫度為720 - 850 、水蒸汽分壓介於1 10 - 4 - 5 . 5 10 - 4pa之間、退火時間40min時，獲得了織構程度良好的ceo _ 2種子層薄膜; 3 .由於一步法制備ceo _ 2種子層中水分壓范圍狹窄，工藝條件難以控制，並且退火延長了薄膜的制備時間，因此，本論文又採用了兩步生長法沉積ceo _ 2種子層，即:先在ni - w基帶上沉積一層約15nm的金屬ce薄膜，再通入氧化氣氛（水蒸汽） ，繼續進行薄膜沉積。
  18. The main products includes various steam and electric heating reaction vessel, conduction oil, outer coil reaction vessel, polyester and resin completed equipments, vacuum reducing concentration tank, methanol and ethanol recovery tower, various corrugated stuffing, high effective membrane evaporator, new - type centrifugal drag membrane evaporator, vacuum rake dryer, condensing drum cut - off machine, shell - and - tube condenser,

    本廠主要產品有各類蒸氣電加熱反應鍋，導熱油外盤管反應鍋，聚脂樹脂全套設備，真空減壓濃縮罐，甲醇乙醇回收塔，各類波紋填料，高效薄膜蒸發器，新型離心刮板式薄膜蒸發器，真空耙式乾燥機，冷凝滾筒切片機，列管式冷凝器，螺旋板式換熱器，外循環蒸發器，鋁制槽車貯罐，乳化設備，高速剪切分散機，種子罐，發酵罐，多功能提取罐，並承接各類非標設備。
  19. Active control of bending - twisting couple vibration of plate using fuzzy control

    壓電薄膜和模糊控制在板的彎曲扭曲振動控制中的應用
  20. The noise produced by the outside speaker radiates into the enclosure through the vibration of the flexible panel. and via the piezoceramic ( pzt - 5h ) actuator and piezoelectricity diaphragm ( pvdf ) sensor located on the flexible panel to realize the active control

    由外部揚聲器產生的噪聲通過柔性墻的振動進入閉合空間內部，並通過粘合在柔性墻上的壓電陶瓷（ pzt ）致動器和壓電薄膜（ pvdf ）傳感器來實現主動控制。
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