放電光譜 的英文怎麼說

中文拼音 [fàngdiànguāngpǔ]
放電光譜 英文
discharge spectrum
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  • 放電 : [物理學] （electric） discharge; electro-discharge; discharging
  1. Surface chemical analysis - glow discharge optical emission spectrometry gd - ose - introduction to use

    表面化學分析-輝光放電發射光譜方法通則
  2. Surface chemical analysis - glow discharge optical emission spectrometry gd - oes - introduction to use

    表面化學分析.輝光放電發射光譜.使用介紹
  3. Gd - oes. surface chemical analysis - glow discharge optical emission spectrometry gd - oes - introduction to use

    表面化學分析.輝光放電發射光譜測定法
  4. In the third chapter, the influence of current density, solution concentration, erosion time and aging in ambient air on the pl spectra of ps suggests that peak would blue shift with current density increasing, and with erosion time and aging time prolonging ; with the increasing of solution concentration, peaks would red shift when solution concentration less than 1 : 1 but blue shift when solution concentration greater than 1 : 1. above phenomena can be explained by quantum confinement and light center model, but do not deny the action of si - h bonding and defect on the surface in the process of photoluminescence. at present, radiation mechanism is still one of the primary problems in the study of ps

    在第z三章中；通過對比，分析了電流密度、陽極化時間、溶液濃度以及自i然氧化時間對多孔硅光致發光光譜的影響，認為在一定的范圍內，多i孔硅的發光峰位會隨電流密度的增大而藍移，要獲得較強的發光，需z要選擇合適的電流密度；隨著腐蝕時間的延長，多孔硅的發光峰位會i發生藍移；當f酸的濃度較小q ： 1 ）時，峰位隨濃度的增大表現為向i低能移動；而當f酸的濃度較大河山時，峰位隨濃度的增大則表現z為移向高能；多孔硅在空氣中自然氧化；其發光峰位發生藍移，而強i度隨放置時間的延長而降低。
  5. Abstract : in this paper, the adherent properties of pet fabric treated by corona - discharge were studied through esca and wettability, the application of two mechanisms in terms of weak boundary layer and chemical structure on fabric surface was discussed

    文摘:本文通過光電子能譜和表面潤濕實驗來研究經電暈放電處理后的滌綸織物的表面性能，探討了弱界面層和化學結構兩種理論在粘合中的應用。
  6. Iron and steel - method for spark discharge atomic emission spectrometric analysis

    鋼鐵.火花放電原子發射光譜分析法
  7. Analysis of cast iron by glow - discharge atomic emission spectrometry

    輝光放電原子發射光譜法快速分析生鑄鐵
  8. These instruments can be divided into three categories, chromatographic separation methods including gas chromatography, liquid chromatography and ionic chromatography, spectrometric methods including atomic absorption, ultraviolet / visible absorption, infrared spectrometry, atomic emission spectrometry and fluorescence method, and electroanalytical methods including potentiometry, coulometry and voltammetry methods

    如層析法中的氣相層析、液相層析及離子層析，光譜法中的紫外光可見光光譜法、原子吸收光譜法、紅外線光譜法、螢光光譜法、放射光譜法及拉曼光譜法，及電化學方析方法如電位法、庫倫法及伏安法等。
  9. This sort of membrane has excellent physics and chemical properties. farther studies indicates that this film is a kind of hydrogenated carbon films containing amino groups, it posses the network configuration of diamond - like carbon, the amino - group is in the networks

    通過紅外光譜分析，結合其物理性能和化學傳感特性，對射頻輝光放電制備的正丁胺淀積薄膜的化學組成與微觀結構做了初步分析和研究。
  10. In this thesis, we have mainly studied the characteristics of chf3, c6h6 and cf4 electron cyclotron resonance ( ecr ) plasma using langmuir probe and optical emission spectroscopy ( oes ). the relative concentration of different radicals in chf3 plasma and the effect of chf3 / c6h6 ratio on bond configuration of a - c : f films were discussed. it was showed that h, f, c2 were the main radicals among radicals of h, f, c2, ch and f2 in chf3 ecr plasma

    重點研究了chf _ 3 、 cf _ 4和chf _ 3 c _ 6h _ 6放電等離子體中基團的分佈；分析了不同基團的相對密度隨宏觀放電條件（微波輸入功率、放電氣壓、源氣體流量比）的變化規律；探討了等離子體中各種基團的生成途徑；在不同源氣體流量比的條件下沉積了a - c ： f薄膜並通過傅立葉變化紅外吸收光譜（ ftir ）的測量得到了薄膜中鍵結構的信息；分析了a - c ： f薄膜的沉積速率及其鍵結構與等離子體空間基團分佈狀態之間的關聯。
  11. Standard test method for trace metallic impurities in high purity copper by high - mass - resolution glow discharge mass spectrometer

    使用高質量解析度輝光放電質譜儀測量高純度銅中痕量金屬雜質的標準試驗方法
  12. Standard test method for trace metallic impurities in electronic grade aluminum - copper, aluminum - silicon, and aluminum - copper - silicon alloys by high - mass - reduction glow discharge mass spectrometer

    用高質量減少輝光放電質譜儀測量電子級鋁銅鋁硅和鋁銅硅中微量金屬雜質的標準試驗方法
  13. No matter how different the discharge scheme is, low pressure discharge plasmas take a common characteristic of bright glow and is generally entitled as low temperature glow discharge. glow discharge plasma has been selected as a most suitable system for plasma diagnostics in laboratory and for application technology development because of its good stability and reproducibility

    利用n _ 2輝光放電中n _ 2 ~ +的發射光譜研究了放電空間的溫度分佈的變化規律，發現了直流放電的一些重要特性，如阻礙輝光與正常輝光的光譜差別。
  14. Optical fibre amplifiers. basic spectrum analyzers - transmitter output optical power measurement for single - mode optical fibre cable

    光纖放大器.基本光譜分析儀.單模光纖電纜用發射機光輸出功率測量
  15. The properties of cn thin films such as their morphology, component, crystal structure and the bonding structure and the relation between those properties and the gas - phase reaction parameters were discussed, showing that the deposition of p - c3n4 thin film is the compete result of various reaction processes in the dynamics balance conditions ; the process of cn films depo sition is diagnosed in situ through the optical emission spectra technique, the effects of experimental parameters on the concentration of the precursors and the gas - phase reactions in the plasma have been obtained ; the main reaction precursors for film deposition identified ; the relation between the characteristics of cn thin films and the reaction process in the plasma is analyzed. the cn thin films deposition under different substrate temperatures in high pressure pe - pld shows that the si atom of the substrate has participated the cn films growth process, based on this the growth mode of cn thin films on the si substrate is proposed. the further experiment of cn thin films deposition on si substrate scratched by diamond as well as covered with fe catalyzer has been attempted, which indicates that changing the dynamics conditions of the surface reaction can alter the growth characteristic of the cn thin films and can enhance obviously the films growth rate

    採用pld技術進行了碳氮化合物薄膜沉積，得到了含氮量為21at的cn薄膜；研究了襯底溫度和反應氣體壓強對薄膜結構特性的影響，給出了cn薄膜中n含量較小、 sp ~ 3鍵合結構成分較少和薄膜中僅含有局域cn晶體的原因；引入脈沖輝光放電等離子體增強pld的氣相反應，給出了提高薄膜晶態sp ~ 3鍵合結構成分和薄膜的含n量可行性途徑；應用pe - cvd技術以ch _ 4 + n _ 2為反應氣體並引入輔助氣體h _ 2 ，得到了含n量為56at的晶態cn薄膜；探討了cn薄膜形貌、成分、晶體結構、價鍵狀態等特性及其與氣體壓強和放電電流的關系，證明了- c _ 3n _ 4薄膜沉積為滿足動力學平衡條件的各種反應過程的競爭結果；採用光學發射譜技術對cn薄膜生長過程進行了實時診斷，得到了實驗參量對等離子體中活性粒子相對濃度和氣相反應過程的影響規律，給出了cn薄膜沉積的主要反應前驅物，揭示了cn薄膜特性和等離子體內反應過程之間的聯系；採用高氣壓pe - pld技術研究了不同襯底溫度條件下cn化合物薄膜的結構特性，揭示了si原子對薄膜生長過程的影響，給出了si基表面碳氮薄膜的生長模式；在金剛石研磨和催化劑fe處理的si襯底上進行cn薄膜沉積，證明了通過控制材料表面動力學條件可以改變碳氮薄膜結構特性，並可顯著提高晶態碳氮材料的生長速率。
  16. The concept of viffoal laser frequency stabilizaion is put fowi. the frequency stabilizaion at the center of doppler curve has been realized aller signal detecting, phase sensitive detecting, integrating and high voltage amplifying circuits with fm spectroscopy a frequency stability of l0 -, has been obtained with a reproducibility of l0 - 9. hyperfine spectra of, ', i, near 532nm have been studied via modul8tion tfansfer spectroscopy

    利用fm光譜法將激光單次通過碘吸收室進行線性吸收，再經信號檢測、混頻、積分和高壓放大等伺服電路，實現了在多普勒曲線中心處的頻率穩定，頻率穩定度和復現性可達10 ~ （ - 9 ）量級。
  17. Spectrum of argon dielectric barrier discharge at atmospheric pressure

    大氣壓氬氣介質阻擋放電光譜
  18. The variation of the film composition can be monitored by using the method of spectrum analysis during the film deposition ( for the intensity of the persistent line is proportional to the particle density of the element in the vacuum chamber ). the measurement of the transmission spectrum of the film on a transparent substrate can be used to calculate the film parameters, such as refractive index, extinction coefficient and the thickness of the film. therefore, the combination of the two methods would be helpful to on line monitoring the film constituents and the optical paramenters in the preparation of thin films

    在制備薄膜的過程中，利用光譜分析的方法，以放電光譜特徵譜線強度的變化來反映相應物質成分的變化，以連續光譜光源發出的光透射過薄膜的透射率的變化，來反映薄膜的厚度、折射率、吸收系數等光學參數的變化，從而達到在制膜過程中，對薄膜的成分、厚度等參數進行在線監控的目的
  19. Optical fibre amplifiers - basic specification - part 5 - 3 : test methods for reflectance parameters - reflectance tolerance using an electrical spectrum analyser

    光纖放大器.基礎規范.第5 - 3部分:反射參數的試驗方法.使用電光譜分析儀檢測反射公差
  20. Standard test method for trace metallic impurities in electronic grade aluminum by high mass - resolution glow - discharge mass spectrometer

    應用高質量分辯率輝光放電質譜計測定電子級鋁中微量金屬雜質的標準試驗方法
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