曝光設備 的英文怎麼說

中文拼音 [pùguāngshèbèi]
曝光設備 英文
exposure sources
  • 曝 : 動詞[書面語] （曬） expose to the sun
  • 光 : Ⅰ名詞1 （照耀在物體上、使人能看見物體的一種物質） light; ray 2 （景物） scenery 3 （光彩; 榮譽） ...
  • 設 : Ⅰ動詞1 （設立; 布置） set up; establish; found 2 （籌劃） work out : 設計陷害 plot a frame up; fr...
  • 備 : Ⅰ動詞1 （具備; 具有） have; be equipped with 2 （準備） prepare; provide with; get ready 3 （防備...
  • 曝光 : exposure
  • 設備 : equipment; device; facility; implementor; apparatus; installation; appointment; furnishing; setou...
  1. Called " the audubon of this century " for the variety and proficiency of his marine photography, photographer david doubilet has mastered the use of light to produce what one national geographic editor calls " customary superb doubilet shots. " among them is this, a light - drenched photo of sea lions swimming in the waters of the great australian bight in the indian ocean

    意譯：海底下的彩色圖片誕生在攝影一種豬形之魚，照片來自佛羅里達的墨西哥海灣，由威廉博士長期和國家的路雜志的攝影師查爾斯?馬丁合作於1926年預備防水設備的照相機和高曝光的鎂閃光粉保證能夠在水下照明，他們成為水下攝影的先驅者。
  2. As the ic manufacturing process develops from sub - micron to very deep submicron ( vdsm ) technologies, with current lithography tools ( 248nm and 193nm ), foundries can not manufacture products that designs want because of so - called optical proximity effect ( ope )

    當集成電路生產工藝發展到納米級時，利用現有的曝光設備（ 248nm和193nm ） ，由於所謂的光學鄰近效應，集成電路製造廠商已經無法製造出滿足電路功能要求的產品。
  3. Excimer laser processing equipment for wafer stepper

    準分子激光縮小投影曝光設備用
  4. 08. 03 practice for operating xenon arc - type exposure apparatus with water for exposure of photodegradable plastics

    光降解塑料曝射用帶水氙弧光型曝光設備操作慣例
  5. Light - exposure and light - and - water - exposure apparatus enclosed carbon - arc type

    曝光量和曝光與曝水設備
  6. The company has cad design centre, precision etching and developing production line, chemical cleaning production line, scrubbing production line, high - power exposing machine, cnc drilling machine, suctioning silk screen machine, speedy press, vacuum multilayer press, chemistry sink copper and metal surface treating production line, punches, etc. import or domestic advanced equipment

    公司擁有cad設計中心，精密蝕刻、顯影生產線，化學清洗生產線，磨板生產線，大功率曝光機，數控鉆床，吸氣絲印機，快壓機，真空層壓機，化學沉銅及金屬表面處理生產線，沖床等進口或國產先進設備。
  7. Photography - electronic flash equipment - automatic control of exposure

    攝影.電子閃光設備.曝光的自動控制
  8. Introduced a new way for dispersion compensation in transmission using uniform fiber bragg gratings. at the last, the analysis of fiber grating production with a phase mask was carried out. based on diffraction and interference theories, we access the near - field optical intensity distributions produced by a periodic mask and draw the important conclusion that we must put the mask near the fiber as we can in the experiment

    最後論文討論了光纖光柵的製作，分析了掩膜板后干涉光場的分佈，指出了掩膜板製作應該盡量實現零級抑制，且在系統調試中，光纖要盡量靠近掩膜板放置這一重要結論，在此基礎上利用現有實驗設備製作出了光纖光柵，研究了不同曝光條件對光柵製作的影響，並利用實驗分析了光柵的溫度穩定性。
  9. Lithograghy and its relative techniques play a very important role in mems fabrication processes, spin coating and baking are an indispensable working procedure before and after the lithography process. oven and hotplate are often employed in order to enhance adhesion between the film and the substrate, stabilize sensitivity of film and improve the abrasion resistance when the film touches a mask in contact exposure

    均膠和烘乾是光刻工藝中不可缺少的一道工序，為增加膠層與矽片表面粘附能力，提高在接觸式曝光中膠層與掩模版接觸時的耐磨性能及穩定膠層的感光靈敏度，通常採用烘箱或熱板等加熱設備對光刻膠進行乾燥。
  10. Considering the practical manufacturing condition, an oxygen - free copper microchannel heatsink consisting of five copper sheets is designed and fabricated utilizing the technology of deep photolithography, mechanical machining, and bonding with medium

    根據實際製作條件，設計了五層結構微通道熱沉，採用深層光刻分離曝光化學腐蝕技術、機械加工技術和銅直接粘接技術（ dbc ）制備出冷卻大功率半導體激光器迭陣的無氧銅微通道熱沉。
  11. Operating light - exposure apparatus xenon - arc type with and without water and testing method for exposure of nonmetallic materials

    非金屬材料曝露試驗用的有水和無水光曝露設備氙弧型及實施方法
  12. Operating light - exposure apparatus carbon - arc type with and without water and testing method for exposure of nonmetallic materials

    非金屬材料曝露試驗用的有水和無水光曝露設備碳弧型及實施方法
  13. It might preferable, however, to use shperical mirror for the first step studies of euvl in a series investigation of system design, component fabrication, assembly technique and experimental process. along this thought, the author designed a schwarzschild optics using spherical mirrors with 10 : 1 reduction projection optics

    作為研究的第一步，出於進行euvl原理及系統設計、光學元件的制備、系統集成、掩模曝光實驗等相關技術研究目的，採用球面schwarzschild微縮投影物鏡是比較切實可行的技術方案。
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