材料去除率 的英文怎麼說

中文拼音 [cáiliàoqùchúlǜ]
材料去除率 英文
material removing rate
  • 材 : 名詞1 （木料） timber 2 （泛指可以直接製成成品的東西; 材料） material 3 （供寫作或參考的資料） ma...
  • 料 : 名詞1 （材料; 原料） material; stuff 2 （喂牲口用的穀物） feed; fodder 3 （料器） glassware 4 （...
  • 去 : 去動詞1. （用在動詞后, 表示動作離開說話人所在地） 2. （用在動詞后, 表示動作的繼續等）
  • 除 : Ⅰ動詞1 （去掉） get rid of; eliminate; remove 2 [數學] （用一個數把另一個數分成若干等份） divide:...
  • 率 : 率名詞（比值） rate; ratio; proportion
  • 材料 : 1. （原料） material 2. （資料） data; material 3. （適于做某種事的人才） makings; stuff
  1. By analyzing the mathematics cutting model of traditional maf, it is found that increasing the cutting ability of the magnetic abrasive brush is the key to improve the efficiency of maf

    通過分析傳統磁粒研磨材料去除數學模型，揭示了提高磨刷切削能力是提高磁粒研磨效率的關鍵。
  2. Design engineers now selecting pmbldc motors over conventional dc or induction motor drives for the following reasons : 1 ) the absence of brushes results in an essentially maintenance free operation and eliminates the undesirable effects of commutation such as sparks, brush - loss, radio - frequency interference, etc. 2 ) the low inertia of the rotor enhances the quality of the mechanical response of the motor, shortening the acceleration and deceleration time. 3 ) utilizing rare - earth permanent magnet materials with high coercive force results in substantially higher efficiency than their counterpart with brushes of the same size. 4 ) because of the absence of commutation segments, the stator construction is simple

    現在的工程師們更為青睞永磁無刷直流電動機是因為以下幾點原因： （ 1 ）去除了電刷的永磁無刷直流電動機徹底地免除了維護而且消除了我們不希望的由於換向帶來的火花、電刷損耗以及無線電干擾等等； （ 2 ）低轉動慣量的轉子提高了電機機械響應的質量，從而縮短了電機加速和減速的時間； （ 3 ）高矯頑力稀土永磁材料的使用使得同樣尺寸的永磁無刷直流電動機比傳統的直流電動機效率高； （ 4 ）由於沒有機械換向部分定子的結構簡單了。
  3. The results show that, when increasing the feed rate of the grinding wheel, decreasing the rotating speed of the wafer chuck table and using coarser grit grinding wheel, the material removal rate in the wafer rotating grinding increase, the feed rate of the grinding wheel has greater influence on the material removal rate ; when suitably increasing the rotating speed of the grinding wheel, decreasing the feed rate of the grinding wheel and using finer grit grinding wheel, the wafer surface roughness can be reduced ; there exists a critical rotating speed of the grinding wheel ( about 2300rpm ), beyond which the material removal rate evidently decreases and the spindle motor current and wafer surface roughness steeply increase ; when the grit size of the grinding wheel is finer than # 2000, the material removal rate decreases and the wafer surface roughness has no obvious improvement

    研究結果表明，增大砂輪軸向進給速度和減小工件轉速，採用粗粒度砂輪有利於提高磨削矽片的材料去除率，砂輪軸向進給速度對材料去除率的影響最為顯著；適當增大砂輪轉速，減小砂輪軸向進給速度，採用細粒度砂輪可以減小磨削表面粗糙度；在其它條件一定的情況下，砂輪速度超過一定值會導致材料去除率減小，主軸電機電流急劇增大，表面粗糙度變差；採用比# 2000粒度更細的砂輪磨削時，材料去除率減小，矽片表面粗糙度沒有明顯改善。
  4. By using a wafer - rotating grinding machine, the influence of the main process factors including grit size of diamond grinding wheel, rotating speed of the wafer chuck table, rotating speed and the down feed rate of the cup grinding wheel on the material removal rate, spindle motor current and wafer surface roughness in grinding large size wafer are experimentally investigated

    摘要利用基於自旋轉磨削原理的矽片超精密磨床，通過試驗研究了砂輪粒度、砂輪轉速、工件轉速及砂輪進給速度等主要因素對材料去除率、砂輪主軸電機電流以及磨削后矽片表面粗糙度的影響關系。
  5. Material removal rate study of wire electrical discharge machining pocketing

    線電極放電銑削凹坑的材料去除率規律研究
  6. Material removing rate

    材料去除率
  7. The stability, rheology, chain structure and consecutive medium model in magnetorheological fluids are analyzed. according to the contribution of shear stress and normal pressure in polishing zone, the quantificational machining model of mrp is presented. as an example of plane workpiece, the influences of machining parameters on removal rate and surface roughness in mrp are studied

    5 、磁流變拋光（ mrf ）是超光滑光學表面的一種新型加工技術，本文從mrf的磁、力學性質出發，研究了磁流液的穩定性、流變效應、鏈化結構和連續介質模型；根據拋光區內剪應力、正壓力的分佈特徵，提出了mrf的定量加工模型；然後以平面工件的磁流變拋光為例，揭示了工藝參數對材料去除率和表面粗糙度的影響規律。
  8. The cmp experiment was carried out systematically on litao3 wafer. the polished surface foughness and material removal rate in different polishing conditions were measured and the effects of polishing pad material and its condition, pressure, rotating speed of the polishing plate, the type and size of abrasive, and the properties of the polishing slurry on the surface routhness and material removal rate were analysed in details

    通過對鉭酸鋰晶片的化學機械拋光過程的實驗研究，通過測量鉭酸鋰晶片在不同拋光條件下的表面粗糙度和材料去除率，詳細分析了拋光墊材料和狀態、拋光壓力、拋光盤轉速、磨料種類及粒度、拋光液組成等幾個因素對拋光表面質量和材料去除率的影響規律。
  9. The solution formula of dwell time is deduced by using the pulse iteration method and the smoothing fourier transition method, and the formula can be simplified referring to workpiece shape. according to the anastomotic status of the tool and workpiece surface, we present the new model of the inherent relation among local pressure density, removal rate, convergence ratio and residual errors, and the corresponding formulas are given. the forming cause of the edge effect in the polishing process is analyzed, and the means which reduces the edge effect is put forward

    2 、針對計算機控制光學表面成形（ ccos ）的加工方式、誤差收斂特點，研製了去除函數呈高斯分佈的雙轉子結構研拋模；採用脈沖迭代法、平滑因子傅立葉變換法推導出駐留時間的演算法，求解過程中根據工件面形的特點作了各種形式的簡化；提出了工件表面和研拋模的吻合誤差與局部壓強、材料去除率、收斂比之間內在關系的數學模型，並推導出相應的計算公式；分析了邊緣效應產生的原因，在加工過程中採用相對壓力因子對去除函數進行修正，可以消除邊緣效應的影響。
  10. This study dealled with high concentrated pharmaceutical wastewater treatment. the high level sediments of organic pollutants were examined qualitatively and quantitatively, and the three dominated strains, which can degrade the sediments of albendazole, chlor - trimeton and brufen, had been screened. the three dominated strains were trailed to solidify by materials three of bounded solidification and two of embed solidification. the results of degradation experiment announced that at high loading condition a removal ratio over 90 % of organic compounds had been obtained, about 1 / 3 higher than conventional activated sludge process. assumes to treat the high level organic wastewater has been suggested

    針對制藥行業的高濃度有機廢水，定性定量地測定了高濃度有機物底物；篩選出降解以阿苯噠唑、撲爾敏和布洛芬為主要底物的3種優勢細菌；應用了3種結合固定化材料和2種包埋固定化材料對優勢菌群進行了固定化試驗；通過降解試驗，在高負荷的情況下有機污染物最高去除率可達90 %以上，比一般活性污泥法提高功效1 / 3 ；提出了利用現有設施對高濃度有機廢水的處理工藝設想。
  11. For making system more efficient, we use a series of technologies to speed up calculation and displaying realistic picture of simulation, such as opengl display list to speed up display cutter, image copy to speed up displaying cutter movement and local refresh to speed up displaying material remove process

    為了進一步提高系統的運行效率，我們還採用了一系列加快模擬計算和圖形生成顯示的技術。包括利用opengl的顯示表技術加快顯示刀具的速度；利用圖象拷貝技術顯示刀具的運動；應用局部刷新技術加快材料去除的動畫圖形顯示。
  12. The polishing technology of ccos is studied by a series of experiments. the effect of polishing process parameters on the removal efficiency and the stability of the removal function are studied, which include the polishing compound, the density of the polishing fluid, ph of the polishing fluid, the polishing velocity, the polishing pressure and so on. finally, a suit of effective process parameters are given and better experimental result are obtain

    在大量工藝實驗的基礎上，揭示了拋光劑種類、拋光液的供給量、拋光液濃度、拋光液的酸度值（ ph值） 、拋光速度、拋光壓力、拋光模材料、拋光模直徑及膠層厚度等對拋光效率和去除函數穩定性的影響規律;最後，總結了一套拋光工藝，利用該工藝進行的拋光精度收斂性實驗達到了較好的效果。
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