機械化學磨損 的英文怎麼說

中文拼音 [jīxièhuàxuémósǔn]
機械化學磨損 英文
mechano-chemical wear
  • 機 : machineengine
  • 械 : 名詞1. （器械） tool; instrument 2. （武器） weapon 3. [書面語] （枷和鐐銬之類的刑具） fetters, shackles, etc
  • 學 : Ⅰ動詞1 （學習） study; learn 2 （模仿） imitate; mimic Ⅱ名詞1 （學問） learning; knowledge 2 （學...
  • 磨 : 磨動詞1 （摩擦） rub; wear 2 （研磨） grind; mull; polish 3 （折磨） grind down; wear down [out]:...
  • 損 : Ⅰ動詞1 （減少） decrease; lose 2 （損害） harm; damage 3 [方言] （用尖刻的話挖苦人） speak sarcas...
  • 機械 : 1. （利用力學原理組成的各種裝置） machinery; machine; mechanism 2. （死板; 刻板） mechanical; inflexible; rigid
  • 磨損 : wear and tear; abrasive wear; abrase; abrade; detrition; wear; scuff; wear out; fray; battering; ...
  1. 1. 5 m in diameter ) were dispersed in n46 engine oil with different concentrations using ultrasonic respectively in order to study their tribological properties. the tribological experiments were carried out by mq - 800 four - ball tribometer and mm - 200 ring - on - block tribometer, in which extreme pressure properties, wear scan diameter, friction coefficient and wear volume loss were measured. the results showed that oil containing mos2 nanoparticles had a better wear resistance, friction - reducing and extreme pressure than the oil containing common mos2

    將上述制備得到的納米二硫化鉬顆粒和普通二硫化鉬粉末（ 1 . 5 m ）以不同濃度分散在n46機械油中，在mq - 800四球摩擦磨損試驗機上考察它們的最大無卡咬負荷（ p _ b值） 、耐磨性能和摩擦系數；並在mm - 200摩擦磨損試驗機上，通過環?塊摩擦副，比較和分析了它們的摩擦學特性。
  2. In order to discuss the friction and wear mechanisms of mos2 nanoparticles, it was analyzed that the chemical status of elements existed on the rubbed surface by x - ray photoelectron spectroscope, and it was observed that the surface topography of wear zone by scanning electron microscope

    通過x射線光電子能譜儀（ xps ）分析磨痕表面元素的化學狀態，掃描電子顯微鏡（ sem ）對磨痕的表面形貌進行分析，從而總結了納米二硫化鉬在n46機械油中的摩擦磨損機理。
  3. There exist large stress, intensive scratch, damage and pollution of ion in wafer process, so it is necessary to improve mechanism of slicing and lapping by changing single mechanical function to equilibrium chemical and mechanical function for small damage and low stress. reducing damage and stress and enhancing quality and efficiency of product result in a base of followed process so as to improve wafer process and enhance finished product ratio of whole wafer process

    目前加工過程中存在應力過大，造成表面劃傷嚴重，容易產生破損，離子沾污的問題，因而必須改善切削、研磨機理，把單一的機械作用變為均勻穩定的化學機械作用，以達到淺損傷、低應力的目的，有效的減少破損層和應力的累積，提高產品質量和加工的效率。
  4. Mechano - chemical wear

    機械化學磨損
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