正確曝光 的英文怎麼說

中文拼音 [zhēngquèpùguāng]
正確曝光 英文
correct exposure
  • 正 : 正名詞（正月） the first month of the lunar year; the first moon
  • 確 : 形容詞1. （符合事實; 真實） true; reliable; authentic 2. （堅固; 堅定） firm
  • 曝 : 動詞[書面語] （曬） expose to the sun
  • 光 : Ⅰ名詞1 （照耀在物體上、使人能看見物體的一種物質） light; ray 2 （景物） scenery 3 （光彩; 榮譽） ...
  • 正確 : exactness; correct; right; proper; rightness; rectitude; validity
  • 曝光 : exposure
  1. Another exposure mode offered by the k10d is shutter & aperture - priority ae ( tav ) mode, which is designed to automatically select the most appropriate sensitivity for a user - selected shutter - speed & aperture combination

    也就是說，用戶選擇光圈和快門，然後相機根據不同光線條件自動調節感光度以獲得正確的曝光。
  2. When the density step wedge has been properly exposed, the film is then processed.

    當密度階梯光楔被正確曝光后，即把膠片沖洗出來。
  3. As the right combination of exposure time and aperture varies for different celestial objects shooted and equipment used, bracket exposure two stops either way is recommended in order to find out the best exposure time

    使用不同的儀器拍攝不同的天體，均要求不同的曝光時間與光圈。拍攝時多試上下兩級的曝光即1 4 1 2 2及4倍，可以更準確找出正確的曝光時間。
  4. Any shutter speed aperture selectable in 12 ev or 13 ev increments ; correct, over - under - exposure indicated in viewfinder ; bulb also selectable

    可選擇任何光圈值及快門速度，每次以12ev或13ev增減；觀景器內及導向顯示屏上會顯示影像是否曝光正確、曝光過度曝光不足；可選擇bulb
  5. The use of standard gray scale and color targets in the scene is required for correct camera exposure and positive printing.

    在景物中設置標準灰階標板和彩色靶標，其目的是為了確定正確的曝光量和正片印製。
  6. Compensation is necessary in this case to get correct exposure

    為了獲得正確的曝光量，需要進行修正。
  7. In manual operation or exposure compensation, the exposure indicator in the viewfinder display indicates the difference between the correct exposure value ( ev ) and the current exposure compensation setting

    手動操作或補償曝光時，取景器顯示的曝光指示燈表示正確曝光量（ ev ）和當前曝光補償設置的差值。
  8. Intensity distribution in photoresist is analyzed during ldw exposure process in terms of the improved theoretical model and the method of selecting the optimal exposure is described. results of ray - tracing using zemax that is optical design software agree well with the calculated results of theoretical model and l dw experimental results verify the accuracy of the model. therefore this improved model is important significant for directing ldw research

    本文完善了激光直寫光刻理論，分析了直寫曝光中膠層內光場的分佈，探討了最佳曝光量的選擇方案，利用zemax軟體進行光線追跡的結果和理論模擬十分相近，實驗結果驗證了理論模型的正確性，該理論模型對激光直寫光刻技術研究具有重要指導意義。
  9. Look at the exposure indicator when setting the aperture and shutter speed

    如曝光指示燈的點出現在「 0 」下，說明曝光設置正確。
  10. When the dot of the exposure indicator is under the “ 0 ”, the correct exposure is set

    如曝光指示燈的點出現在「 0 」下，說明曝光設置正確。
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