殘余膜 的英文怎麼說

中文拼音 [cányúmó]
殘余膜 英文
residual film
  • 殘 : Ⅰ形容詞1 （不完整; 殘缺） incomplete; deficient 2 （剩餘的; 將盡的） remnant; remaining 3 （兇惡...
  • 余 : Ⅰ動詞（剩下） remain; leave: 9減4 余 5。 nine minus four is five ; four from nine leaves five ; i...
  • 膜 : 名詞1. [生物學] （像薄皮的組織） membrane 2. （像膜的薄皮） film; thin coating
  1. Efffect of viscoelastisity of hpam solution on residual oil film

    聚合物溶液的黏彈性對殘余油膜的作用
  2. The dissertation firstly discusses the reflectance of euv and soft x - ray in " multilayer system based on classical electrodynamics and optical characteristics of materials. the nns surface roughness in different spatial frequency range is carefully studied since scattering can seriously reduce the reflectance in euv and soft x - ray wavelength region. we discuss representative model of residual stress in

    首先從材料在極紫外、軟x射線波段的光學特性出發，討論了極紫外、軟x射線在理想和非理想多層膜系中的反射特性；研究了影響極紫外、軟x射線多層膜反射率的表面粗糙度的空間頻率范圍；重點探討了多層膜殘余應力的典型模型、應力形成機制以及薄膜的形成過程。
  3. With the decrease of silicide content in interfacial layer, leakage property of hfo2 mos architecture was greatly improved

    界面層里殘余的硅化物的含量越低，薄膜的漏電性能就越好。
  4. In the process of sputtering, it is important to characterize the thickness and residual stress of plct films. in experiment. through the technology of x - ray

    基於掠入射x射線衍射（ gixrd ）的殘余應力測量表明，射頻磁控濺射plct薄膜中為壓應力。
  5. The surface morphologies of thin films were observed by using scan electron microscope ( sem ) and atomic force microscope ( afm ). based on grazing incidence x - ray diffraction ( gixrd ) equipment, we find that residual stress exist in magnetron sputtering plct film, in addition, the ferroelectric properties of plct thin films were measured by radiant premier lc type multifunctional ferroelectric properties test system

    利用廣角x射線衍射技術對不同濺射工藝下plct薄膜的相結構進行了研究;採用掃描電子顯微鏡（ sem ）和原子力顯微鏡（ afm ）分別觀察了薄膜的表面形貌;利用掠入射x射線衍射（ gixrd ）測量了薄膜的殘余應力。
  6. A side effect of wear occurring in the mixed film lubrication regime is the formation of organic residues through interaction between the fluid and the wear process

    混合油膜潤滑模式存在的副作用是液體與磨損過程中會產生有機殘余物。
  7. The phase structure of different cu - fe thin films were studied by using grazing incidence x - ray analysis ( gixa ). the texture and residual stress of different cu - fe thin films were measured by scan of x - ray diffraction ( xrd ) and 2 scan with different. the thicknesses of different thin films were characterized by means of small angle x - ray scattering ( saxs ) technique. by using atomic force microscope ( afm ) measured surface roughness of thin films. the component of different thin film was characterized by energy disperse spectrum ( eds ) and x - ray fluorescence ( xrf ). the magnetic properties of cu - fe thin films were measured by means of vibrating sample magnetometer ( vsm ). in addition, the giant magnetoresistance ( gmr ) effects of different films were also measured. the original resistance of the film fabricated by a direction - current magnetron sputtering system is directly affected by bias voltage

    利用掠入射x射線分析（ gixa ）技術對不同cu - fe薄膜的相結構進行了研究;利用xrd掃描及不同角度的2掃描對薄膜進行了結晶織構及殘余應力分析;運用小角x射線散射（ saxs ）技術測量了薄膜的厚度;採用原子力顯微鏡（ afm ）觀察了薄膜的表面形貌;運用能量損失譜（ eds ）及x射線熒光光譜（ xrf ）對薄膜進行了成分標定;使用振動樣品磁強計測量了不同cu - fe過飽和固溶體薄膜的磁性能;最後利用自製的磁阻性能測試設備測量了真空磁場熱處理前後不同薄膜的巨磁阻值。
  8. Moreover, it was found that the microstructure and physical properties of dlc film were affected to some extent by the distance between target and substrate. when the distance between target and substrate increases, sp 3c content in the deposited dlc film decreases. accordingly, the value of surface roughness, microhardness, friction coefficient, residual stress and band gap became lower in the same way

    此外，靶基距對dlc薄膜的結構和性能也有一定的影響，隨著靶基距增加， dlc薄膜中的sp ~ 3c含量減少， dlc薄膜的表面粗糙度降低，顯微硬度降低，摩擦系數減小，殘余應力減小，光學帶隙eg減小。
  9. It is found that the microstructure and properties of as - deposited dlc films is seriously dependent on the substrate temperature used in deposition processes. with the increase of substrate temperature, sp 3c content in the deposited dlc film decreases, surface roughness and friction coefficient of deposited dlc films increase. at the same time, microhardness, residual stress and optical band gap became lower

    研究發現，基片溫度對dlc薄膜的結構和性能影響最明顯，隨著薄膜沉積過程中基片溫度的增加， dlc薄膜中的sp ~ 3c含量減少， dlc薄膜的表面粗糙度增加， dlc薄膜的顯微硬度降低， dlc薄膜的摩擦系數增大， dlc薄膜的殘余應力都是減小的，光學帶隙eg變窄。
  10. In the other method, young ' s modulus, residual stress, and bending strength are characterized under a wedge tip by means of micro bridge deflection tests

    利用楔形壓頭和薄膜微橋撓曲法，得到了標準氮化硅、低應力氮化硅和氮化鋁薄膜的楊氏模量、殘余應力和彎曲強度。
  11. In fundamental theory, adaptive optics, electrostatic actuation, flexure beam theory and squeeze film damping are researched ; in fabrication, bulk micro fabrication process and surface micro fabrication process are researched and compared, then the structure parameters and layout of a 8 x 8 micromirror array are designed using summit foundry ; in analysis, analytical and numerical method are used to perform static analysis, modal analysis, transient analysis, frequency analysis and to characterize the farfield performance of this 8x8 micromirror array. finally, in order to realize large scale micromirror array with lower snap down voltage, advices are given for further research

    在基本理論方面，通過對自適應光學，靜電力驅動，彈性梁理論和擠壓薄膜阻尼的研究，確定了微變形鏡的配置方案；在加工方面對體加工工藝， mumps工藝和summit工藝進行了研究與比較，並選用殘余應力小，表面質量好的summit工藝對8 8的微變形鏡陣列原型進行了結構設計與版圖設計；在分析方面主要對微變形鏡單元的靜態特性，模態特性，瞬態響應，頻率響應和8 8規模的微變形鏡陣列的遠場光學模型進行了研究，確定了微變形鏡的性能參數。
  12. Influence of texture on residual strain in cvd free standing diamond films

    自支撐金剛石薄膜殘余應變的影響
  13. Main content of the thesis are also given in the introduction. the thesis presented three different of the residual stress based on x - ray diffraction - - two - exposure method, sin2, high - resolution reciprocal space mapping, which are applied to investigate the residual stress state of pt / ti bottom electrode stack, polycrystalline pzt ferroelectric thin films and epitaxial laalo3 / batio3 ferroelectric

    基於此，提出了本文的選題依據，即研究鐵電薄膜中的殘余應力是基於「鐵電薄膜的重要應用背景和殘余應力對鐵電薄膜性能的可能影響以及目前鐵電薄膜中殘余應力研究的不足」 。
  14. By varying mo - to - si ratio ( ), stress in multilayers - can be compensated to a certian extent / and 13mpa low - stress mo / si multilayers is fabricated. this research is supported by the national natural science foundation of china and " 863 " project of china and innovation foundation of china academy of sciences

    實驗發現，通過改變多層膜兩種材料的比率、改變ar氣工作氣壓等方法，可以在一定程度上補償因貫穿擴散產生的壓應力，而採用同時改變比率和ar氣工作氣壓可以控制多層膜中殘余應力。
  15. Standard test method for residual strain measurements of thin, reflecting films using an optical interferometer

    用光學干涉儀測量反射薄膜殘余應力的標準試驗方法
  16. Stress generating mechanisms was discussed. the residual stress of 40 - bilayer mo / si multilayers in a high reflectivity multilayer was - 500 mpa ( compressive ), stress generating cause may be attributed to interfacial diffusion

    重點研究了多層膜的殘余應力控制技術；通過對單層膜以及多層膜的應力狀態分析，得出應力主要是由膜層之間的貫穿擴散引起的。
  17. Calculation method of predictive model for residual stress distribution in optical thin films

    光學薄膜殘余應力分配預測模型計算方法研究
  18. Residual stresses of bst thin films are tensile stresses, grain size and stresses increase with annealing temperature

    Bst薄膜殘余應力表現為張應力且隨著薄膜晶化溫度升高，薄膜的晶粒變大，殘余應力呈變大的趨勢。
  19. Study of in situ measurement of residual tensile stress in thin films for t - shaped microstructures

    形結構在位測量薄膜中殘余張應力的理論研究
  20. The residual stress in the thin films may lead the crack, hillock formation, or delamination or completely failure of the thin films

    薄膜中的殘余應力可能會造成薄膜的開裂、表面形成小丘凸起或翹曲，導致鐵電薄膜器件失效。
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