氦工質 的英文怎麼說
中文拼音 [hàigōngzhí]
氦工質
英文
hard propeller-
Recent experiments have succeeded in obtaining oscillations from the new system, with frequencies of 66hz and 23hz for the cases with helium and nitrogen as the working fluids, respectively. the traveling wave system is expected to be one of the good candidates as a driver for pulse tube refrigerator, leading to a thermoacoustically driven pulse tube refrigerator without any moving component
還利用deltae對環路部分進行了數值模擬分析，著重討論了系統的起振臨界溫度與臨界加熱功率、效率與加熱溫度的關系、噴射泵的作用以及不同工質（氮氣和氦氣）的比較等，得出一些有益的結論。The gettering processes usually are estimated by gettering of au to nanocavity in silicon. in this paper, the characteristics of nanocavity gettering mechanism, diffusion and distributing of aurum and ion implantation in silicon were described. in this work, many bumps on the polishing surface of the silicon, after a he + impantation in and subsequently a hot - treatment, were observed using atomic force microscope ( afm )
我們注意到，在研究氫、氦離子注入誘生微孔的吸除作用時多以對金雜質的吸除效果來對吸除工藝進行評估，因此本文對微孔吸除機理、金在硅中的擴散和分佈以及半導體中離子注入的特點進行了描述。Investigations have been made on the influence of the heating power, working pressure, stack packing ratio, and the opening of the orifice valve and the double - inlet valve on the performance of the system
以氦氣為工質，獲得了119 . 7k的脈管無負荷製冷溫度，在國內首次用熱聲機械進入低溫溫區。With the helium as the working gas, we attained 119. 7k the refrigeration temperature of the pulse tube. this is the first time that it enters the cryogenic field using the thermocaoustic engine in china. 2 ) the application of binary noble gas on tadptr after the discuss of the possibility of applying binary noble gas on tadptr, we give the way to calculate the prandtl number of the binary noble gas
混合工質應用於熱聲驅動的脈管製冷機對惰性氣體二元混合工質在熱聲機械中的可能應用進行了探討，給出了混合工質的普朗特數等參數的計算方法，並進行了採用氦-氬混合工質的熱聲驅動脈管製冷機的實驗研究。Some previous experiments have showed that cavities had more efficient gettering than p - diffusion, mechanical damage and ion implantation. most of studies about cavities gettering are concentrated on the peculiarity of cavities gettering metal impurities intentionally into silicon wafer from the viewpoint of basic study. this technique especially applied to low - contamination process, how ever, has not been carefully studied, which should be important to the semiconductor manufacturing
而過去的工作多集中在從基礎研究的角度研究氦微孔對有意摻入金屬雜質的矽片的吸除特性，對無意引入的低濃度金屬雜質的器件吸雜效果的研究卻非常少，這方面的研究是氦微孔技術走向實際應用的必經之路。It is a symmetrically heated system, achieving pressure ratios of 1. 10 and 1. 06 with nitrogen and helium as the working fluids, respectively
在以氮氣和氦氣為工質，加熱溫度為400的情況下分別獲得1 . 12和1 . 06的最大壓比。分享友人