測光學 的英文怎麼說
中文拼音 [cèguāngxué]
測光學
英文
photometry-
The vertical and horizontal slides of stramata of cordyceps sinensis ( berk ) sacc were observed and photographed on optical microscope. the shape of perithecia and ascospore of cordyceps sinensis ( berk ) sacc in qinghai province, the number of ascus contained in each perithecia, the number, length, width, the horizontal partition number and the distance among the partitions of ascospore in each ascus were measured and described
把冬蟲夏草子座製成縱、橫切片,用光學顯微鏡觀察並拍照,對青海冬蟲夏草子囊殼及子囊孢子的形態、每一子囊殼中所含子囊、每一子囊所含子囊孢子的數目、長度、寬度、橫隔隔數和隔距進行了測量與描述。Raw optical glass. determination of birefringence
未加工的光學玻璃.雙折射的測定Raw optical glass - determination of birefringence
原光學玻璃.雙折射的測定Measuring method for stress - birefringence of optical crystals
光學晶體應力雙折射測量方法V2o5 and vo2 thin films are a kind of outstanding chromogenics, and have a large potential for various applications, such as display devices, light storage devices, optical switch, bolometer, smart - windows and so on
主要應用於顯示器件、光學開關、光存儲、激光保護、輻射測熱裝置等,特別是在智能窗材料方面的應用已成為研究的熱點。In this dissertation, by virtue of self - developed test system, the studies on the optical and electric properties of oled of little molecule with different material, configuration manufactured with different processes have been presented. concepts of chromatics and the mechanism of carrier transportation in the semiconductor device have been applied here to qualitatively analysis and interpret the result of measurement. some interesting conclusions have been given which will be helpful in the further optimization of the performances of oled
在oled研究過程中,對器件性能的表徵工作起到十分重要的作用,本文利用自主開發的測試平臺(包括軟體、硬體的搭建) ,對不同材料、結構、工藝的小分子oled器件進行了光學、電學性能的測試和評估,並依照色度學、半導體電輸運等理論成功的對測試結果作出了定性分析,揭示了制約器件工作性能的相關因素,為器件性能的進一步優化奠定了基礎、指明了方向。In the wafer - cycle fitting algorithm, comparing with circumgyration radius approach, track fitting approach, and least square circle fitting approach. in the wafer pre - alignment system, the wafer square fitting algorithm - least square circle fitting approach, based on optical linear ccd sensor, as well as the theoretical error analyze of this algorithm
在晶圓檢測演算法方面,比較回轉半徑法、軌跡擬合法以及最小二乘圓法,選擇光學線陣ccd的晶圓圓心最小二乘圓法作為系統晶圓圓心的檢測方法。No optical counterpart has been observed.
沒有觀測到光學對應體。Microwave electron cyclotron resonance ( mwecr ) cvd is a newly developed technique for plasma processing and materials fabrication, such as plasma etching and films deposition
本論文介紹了我們對ecr等離子體cvd系統的測試、 bn薄膜的制備和薄膜光學特性研究。This text introduces a kind of optics to measure the principle, characteristics and the diagraph methods of the system
摘要介紹了一種光學測量系統的原理、特點和測量方法。In the system, the collimation semiconductor laser - scanned beam scanning two perpendiculars direct of one plane of the measured workpiece at the same time is made. the beams with the dimension information of two perpendiculars direct are processed by the scanning receive system, the high - speed photoelectric transition and electronic data process. two measured results of the diametric directs and ellipse tolerance, etc, parameter, of the turning workpiece on the same plane are obtained by non - contact automatic measurement
在單向激光掃描檢測技術的基礎之上,提出了一種雙向激光掃描檢測系統,其採用激光掃描檢測技術與特殊光學系統相結合,用準直半導體激光掃描光束對被測工件徑向某一截面的兩個相互垂直方向同時掃描,經掃描接收光學系統、高速光電變換、電子學系統和微機數據處理系統,對將攜帶有垂直方向被測量信息的光束進行處理,實現了回轉體工件同一截面兩個垂直方向的徑向尺寸和橢圓度等參數的非接觸自動測量,解決了同時非接觸測量回轉體零件同一截面兩個徑向尺寸的難題,它具有高速,高精度和非接觸自動測量等特點。The excimer laser diopter correction and aberration correction have been proved efficiency and safety. based on cad / cam, applied optics, ophthalmology, biomedicine and computer techonlogy, this paper studied the principle of excimer laser aberration correction. the conception, cause of formation and representation of wavefront aberration are introduced
準分子激光治療屈光不正及消除像差的有效性和安全性已被證實,本學位論文將cad 、眼科視光學、波前像差技術、生物醫學技術與計算機技術等多學科理論交叉結合,系統敘述了人眼波前像差理論,包括波前像差概念、表示方法、測量方法和產生的原因等。Optically stimulated luminescence dosimetry systems
光學受激發光劑量測定系統Optical 3 - d profilometry has been widely used for 3 - d sensing, machine vision, intelligent robots control, industry monitoring, biomedicine, dressmaking, etc. several 3 - d object profilometry methods, including moire technique ( mt ), phase - measuring profilometry ( pmp ), fourier transformation profilometry ( ftp ), modulation measurement profilometry ( mmp ) have been exhaustively studied
光學三維傳感已廣泛應用於機器視覺,實物仿形,工業檢測,生物醫學等方面,在三維面形測量中,對莫爾輪廓術,位相測量輪廓術,付里葉變換輪廓術,調制度測量輪廓術這些方法已經進行了大量深入的研究。This paper summarized several main research methods on this topic in our country, including " the determinant of laser - induced - damage of thin film by the scan of transmission and reflectance method ", " study of the phenomena on laser - induced thin film damage by photo - acoustic method " and " the measurement of damage threshold on optical thin film by diffusion method ", etc
本文總結了目前國內幾種主要的研究方法,包括用透射反射掃描法檢測光學薄膜的激光損傷,用光聲法測定光學薄膜的破壞閾值,以及用散射法來測量光學薄膜的損傷閾值等。In this thesis, wide - fov ( field - of - view ) optical systems with optical gain based on fov and optical gain of laser detection and warning optical system are studied. it can solve the problem of wide fov matching with small photosensitive surface, enhance the power received, increase detecting sensitivity, reduce the power of laser and decrease the cost of laser accordingly
本文正是針對上述問題,從激光輻射探測光學系統的視場和光學增益出發,研究寬視場有增益光學系統,解決大視場和小光敏面匹配的矛盾,增強接收到的光功率,提高探測靈敏度,降低對激光輻射源功率的要求,從而降低相應激光器的成本。Firstly, in order to meet the requirement in application, the influencing factors for defocus measurement with one - way defocused detector are analyzed and the influencing regularity of detector position are discussed, after that the relationship between defocus errors and output signals is given too. according to the optimization results, the experimental device is established for this paper
首先,本文從工程應用角度出發,通過分析單向離焦檢測的誤差影響因素,討論了探測器位置誤差對測量的影響規律,給出了離焦量與測量信號的輸出關系,優化設計了檢測光學系統,搭建了實驗裝置。The pd packaged in the laser diode can detect the signal of the self - mixing speckle interference and determine the motion state of the target
封裝在半導體激光器另一側的光電二極體,檢測光學反饋生成的自混合散斑干涉信號,確定物體的狀態。Firstly, the work principle of staring laser detection optical system is introduced, and the relation between optical antenna ’ s amount and fov in laser warning system of optical antenna array is deduced
首先闡述了凝視型激光輻射探測光學系統的工作原理,推導了光學天線陣列激光告警系統中光學窗口數與光學單元視場角應滿足的關系。Extreme ultraviolet lithography is being developed as one of the most important candidates to fabricate a sub - o. lum - pattern. in recent years, several key technologies have been developed rapidly such as laser producing plasma source, extreme ultraviolet multilayer, optical fabrication and metrology, projection - camara alignment, low - defect mask and control technology of stage
極紫外投影光刻( extremeultravioletlithography簡稱euvl )最有可能成為下一世紀生產線寬小於0 . 1 m集成電路的技術,近年來在激光等離子體光源、極紫外多層膜、光學加工和檢測、光學精密裝調、低缺陷掩模、光刻膠技術以及高穩定工作臺系統控制等關鍵技術方面得到了飛速發展。分享友人