濺射鍍膜 的英文怎麼說
中文拼音 [jiànshèdùmó]
濺射鍍膜
英文
sputter coating-
Using jgp560c magnetron sputtering equipment, cu / ag film are deposited on cd1 - xznxte substrate by dc magnetron sputtering in order to get the influences of the main experiments parameters such as sputtering power, gas flow, vacuum air pressure, magnetoelectricity power and substrate temperature on deposition rate of film, discovered that dc sputtering power is the most key factor influencing the deposition rate
在jgp560c型超高真空多功能磁控濺射鍍膜機上，採用直流磁控濺射法在cdznte晶體上制備出cu ag合金薄膜，揭示了氣體流量、直流濺射功率、勵磁電源功率、工作氣壓和襯底溫度等工藝參數對沉積速率的影響規律。結果表明濺射功率對沉積速率的影響最大，隨濺射功率的增大沉積速率快速增大。Compound medium wave - guide film on columned li - ferrites was made by magnetron sputtering system
用磁控濺射的方法在圓柱鋰鐵氧體表面鍍覆了復合介質波導薄膜。High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature
摘要本文論述了在空心微珠表面磁控濺射鍍金屬薄膜的方法。The zircondri filin wtut rirconia wa prepared and the removing technology of the zirconia on the zirconium sdrices was obtalned. the methods of chemistry and magnetron sputtring plating were used in order to platc a palladium film, which is characteristic of self catalysis for hydrogen and the sole h - permselectivity on the clean rirconium sdrices prepared by the methods of electrochemitw and ( or ) high temperatur vacuum hydrgenization, which was firstly studied. the plating tedrilogy was obained and the surface modified zirconium membran was prepared
在利用電化學法和真空高溫除氧加氫法去除了鋯表面氧化膜的基礎上，分別採用化學法、磁控濺射法兩種鍍膜技術在其表面上鍍上了一層對氫具有自催化分解、唯一選擇滲透性的金屬鈀膜，首次獲得了鋯基材膜表面上鍍鈀的制備工藝，成功制備了鋯表面改性選擇滲氫膜。The results show that proper control the motion mode of the particle in plating results in many strengths of the nickel films, such as good uniformity, high compactness, and strong interfacial adhesion
濺射鍍膜時，通過控制空心微珠的運動方式，在空心微珠表面沉積了一層均勻性好、附著力強和緻密性好的金屬鎳膜。Our factory specializes in manufacturing cabinet vacuum coaters, magnetic control sputter coaters and vacuum exhaust equipments, industrial boiler, all kinds of valves, coaters and press packer specially used in the industry of quartz crystal
我廠是國內專業生產箱式真空鍍膜機、磁控濺射鍍膜機、真空排氣設備、石英晶體行業專用被銀機和壓封機、工業爐及各種真空閥門設計製造的專業廠家。It make possible for the system to set and to change source current ( which is proportional to evaporation rate from the ms source ) during coating process
在鍍膜過程中，保證了每個磁控濺射靶上電流的穩定控制和精確調整。Uniform and compact plzt and sno _ 2 ceramic targets, which diameter were 212mm and 221mm, respectively, had been successfully fabricated. ( 2 ) a rotating magnetic field rf magnetron sputtering system had been designed and set up, which showed high utilization efficiency of target, high films uniformity, and high deposition rate, etc. ( 3 ) the plzt and sno _ 2 thin films were investigated by afm, xrd, sem, and spectral photometer. the optimized processing parameters of preparing these films had been found
並以此為基礎分別制備了緻密、均勻、平整、直徑為212mm的plzt和221mm的sno _ 2陶瓷濺射靶材; （ 2 ）為克服現有磁控濺射設備的不足，提出了一種新的磁控濺射方案，採用該方案的設備具有:靶材利用率高、鍍膜均勻、成膜速度快等特點; （ 3 ）運用afm 、 xrd 、 sem以及雙光路分光光度計等分析手段對plzt和sno _ 2薄膜的微結構和性能進行研究，找到了制備plzt電光薄膜和sno2透明電極材料的最佳工藝條件。Ion sputtering coator
離子濺射鍍膜臺A control system for the thickness of ion beam sputter ( ibs ) coating is introduced in this paper. the basic principle of ibs coating machine is discussed. this paper also gives the scheme of hardware and sofeware
本文介紹了離子束濺射鍍膜機膜厚控制的一種實用的系統，文中論述了離子束濺射鍍膜機的工作原理及鍍膜厚度控制系統的硬、軟體的實現方案。Cu - fe thin films were fabricated by a direction - current ( dc ) magnetron sputtering system
本文首先採用直流磁控濺射鍍膜方法制備了cu - fe過飽和固溶體薄膜。Vacuum sputtering coating plant
真空濺射鍍膜設備In order to fabricate excellent electro - optic materials, this paper focused on the choice of electro - optic materials, the fabrication of ceramics target, developing new rf magnetron sputtering system, and the preparation of the electro - optic film, etc. the following results were obtained
本文圍繞制備性能優異的電光材料，從電光材料的選擇、材料配比、靶材制備、射頻磁控濺射鍍膜設備的研製、電光薄膜材料製作等方面進行了研究。Application of multiple plasma arc discharge vacuum magnetron sputtering coating plant in ceramic surface decoration
磁控等離子多弧真空濺射鍍膜機在陶瓷表面裝飾的應用The realization of the algorithm drives the research of micro - electron structure. 2. the la2o3 thin film is prepared by rf technology, the film is analyzed by arxps, the thickness is calculated by quantitative analysis software, the thickness of sio2 thin film between la2o3 and si is 0. 6nm
利用射頻濺射鍍膜技術在si片上制備了la _ 2o _ 3膜，通過變角xps分析和多層結構的定量計算，測得la _ 2o _ 3與si襯底之間的sio _ 2層厚度為0 . 6nm 。Our experiments emphasized the correlation between micro structures and some properties of the coatings and tried to obtain the protective coatings with the comprehensively good properties, in which auger electron spectroscopy ( aes ), scanning electron microscope ( sem ), and x - ray diffraction ( xrd ) were employed to investigate the composition, microstructure and crystal phase of the coatings respectively, and the properties test was primarily considered with the wear resistance and corrosion resistance of the coatings
本論文主要採用pvd技術中的磁控濺射鍍膜（ ms或rms ）及部分用等離子噴塗（ ps ）和熱氧化（ to ）表面處理技術研究了鈾的具有代表性的三種防腐保護鍍層，即單質al 、氧化物al _ 2o _ 3和合金al - zn鍍層。實驗力圖在制備技術、工藝參數及鍍層的微結構和性能之間找到一些內在的聯系，探索綜合性能較好的防腐蝕鍍層。A special clamp for etching optical fiber and depositing pd film on the fiber is designed. designed a encapsulation set of the characteristics that is dampproof, shake and eroding resisted. the experimental set - up for hydrogen sensing includes the light source, gas cell, mass flow controller, stainless steel helical tubing and the detector, etc. the experimental results are also discussed
本文還設計了一套光纖腐蝕用夾具、光纖封裝加熱夾具和一套光纖濺射鍍膜實驗夾具;設計並製作了一套具有防潮、抗震和抗腐蝕功效的光纖傳感頭封裝裝置;設計了一套由激光器、反應混合氣室、光功率計、質子流量計和流量控制器等組成的氫氣定標實驗裝置並對實驗數據進行了分析與處理。With the development of thin film science and technology, various thin film preparation techniques developed rapidly, as a result, conventional so - called filming has developed from single vacuum evaporation to many new film preparation techniques, such as ion plating, sputtering, laser deposition, cvd, pecvd, mocvd, mbe, liquid growth, microwave and mtwecr, etc., of which vacuum evaporation is the common technology for thin film preparation, because it has the distinct advantage of high quality of film deposition, good control - ability of deposition rate and high versatility
隨著薄膜科學與技術的發展，各種薄膜制備方法得到了迅速發展，傳統的所謂鍍膜，已從單一的真空蒸發發展到包括蒸鍍、離子鍍、濺射鍍膜、化學氣相沉積（ cvd ） 、 pecvd 、 mocvd 、分子束外延（ mbe ） 、液相生長、微波法及微波電子共旋（ mwecr ）等在內的成膜技術。其中電子束蒸發技術是一種常用的薄膜制備技術，它具有成膜質量高，速率可控性好，通用性強等優點。Anti - tarnishing capacity of magnetron sputtered silver film in various gaseous and liquid mediums
磁控濺射鍍銀膜抗變色性研究The high - performance heat - reflective coated glass is also called sunlight control coated glass it is made by coating a number of metal or metal compaound films onto the high - quality float glass or other base glass with the vacuum magnetic control sputtering method, which can effectively control the reflection, transmission and absorption of solar energy, that is to say, this glass allows sufficient natural light to come in for daylighting, and can also reflect major part of sunlight irradiation to reduce the collection of indoor heat and lower down the expenses for ventilation and air conditioning ; furthermore, the transmission, reflection ratio and reflection color are ready for the selection by the users
高性能熱所射鍍膜玻璃也稱為陽光控制鍍膜玻璃，是在優質浮法玻璃或其他基片上用真空磁控濺射的方法鍍多層金屬或金屬化合物薄膜而成，可有效控制玻璃對太陽能的反射、透過和吸收，也就是說允許足夠的自然光進入室內用於採光，還能把大部分太陽光輻射熱反射掉，減少室內熱量的積聚，降低通風及空調的費用，而且可以根據客戶的需求，靈活選擇透過率，反射率及反射顏色。分享友人