無掩模法 的英文怎麼說
中文拼音 [wúyǎnmófǎ]
無掩模法
英文
maskless process- 無 : 無Ⅰ動詞(沒有) not have; there is not; be without Ⅱ名詞1 (沒有) nothing; nil 2 (姓氏) a surn...
- 掩 : 動詞1 (遮蓋; 掩蔽) cover; hide 2 (關; 合) shut; close 3 [方言] (被卡住) get squeezed [pinch...
- 模 : 模名詞1. (模子) mould; pattern; matrix 2. (姓氏) a surname
- 法 : Ⅰ名詞1 (由國家制定或認可的行為規則的總稱) law 2 (方法; 方式) way; method; mode; means 3 (標...
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The beam division method in maskless laser interference photolithography can be divided into wave - front division and amplitude division
摘要無掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。We have contrasted several methods on fabrication of passive matrix oled, then we mainly discuss two fabricating methods, one is the precise mask method, the other is the barrier wall method. we find that the barrier wall method to fabricate the passive matrix oled ( pmoled ) has the advantages of high resolution, simple process and no crosstalking problem, so the barrier wall method is the good one to fabricate pmoled. in this paper we adopt the both methods, and we have successfully fabricated the pmoled
分析和對比了實現無源矩陣有機電致發光顯示器件的幾種方法,著重介紹了採用精密掩模技術和障壁技術等技術方案,來製作和設計無源矩陣有機電致發光顯示器件,其中採用障壁技術方案製作的器件具有解析度高、工藝簡單容易實現、器件的交叉效應少、成本低等許多優點,是一種可行的製作無源矩陣有機電致發光顯示器件的方案。However, in current design flow, designers do not consider whether designs are friendly to opc before they are sent to foundries. in fact, a lot of features in such designs can not be corrected enough because of many factors such as the constraints of environments. so even though such designs are corrected, many lithographic errors still exist
然而,由於在當前的集成電路設計流中,在設計出的版圖送到製造廠商前,電路的設計者並沒有考慮版圖對光學鄰近校正和交替移相掩模的友好性問題,這使得版圖中的一些圖形由於周圍條件的限制,如無法充分進行光學鄰近校正,無法進行交替移相掩模的處理等,從而使得版圖設計即使進行了校正處理,還存在大量光刻故障的可能性。The methods and systems ( including amplitude division double - beam interference system, three - beam interference system, liquid immersion type deep uv interference system and full automatic interference photolithographic system ) for amplitude division maskless laser interference photolithography are studied and compared
研究和比較了振幅分割無掩模激光干涉光刻方法和系統,包括振幅分割雙光束干涉系統、三光束干涉系統、液浸式深紫外干涉系統及全自動干涉光刻系統。The basic principle, theory, main types and realizing methods of maskless laser interferometric lithographic technology used for generation of high resolution, deep sub - micron and nanometer patterns in large field of view are deeply investigated
深入研究了無掩模激光干涉光刻技術用於高分辨、大視場、深亞微米和納米圖形生成的基本原理、理論、主要類型和實現方法。The foregoing states the sole and exclusive liability of the parties hereto for infringement of patents, copyrights, mask works, trade secrets trademarks, and other proprietary rights, whether direct or contributory, and is in lieu of all warranties, express, implied or statutory, in regard thereto, including, without limitation, the warranty against infringement specified in the uniform commercial code
上文規定了本合同雙方就專利、版權、掩模、商業秘密、商標以及其他專有權利的侵權(無論是直接的還是協從的)所承擔的唯一責任,並且取代就其所做出的所有保證(明示的、暗示的或法定的) ,包括(但不限於)中規定的不侵權保證。分享友人