照相掩模 的英文怎麼說
中文拼音 [zhàoxiāngyǎnmó]
照相掩模
英文
photographic mask- 照 : Ⅰ動詞1 （照射） illuminate; light up; shine 2 （反映） reflect; mirror 3 （拍攝） take a picture ...
- 相 : 相Ⅰ名詞1 （相貌; 外貌） looks; appearance 2 （坐、立等的姿態） bearing; posture 3 [物理學] （相位...
- 掩 : 動詞1 （遮蓋; 掩蔽） cover; hide 2 （關; 合） shut; close 3 [方言] （被卡住） get squeezed [pinch...
- 模 : 模名詞1. （模子） mould; pattern; matrix 2. （姓氏） a surname
- 照相 : 1 （拍照） take a picture; take pictures; take photographs; take photos; photographing base; phot...
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At first, double random phase encoding techniques are looked back and its improved methods are introduced in detail. in connection with characteristics of spherical wave gene and function of phase mask, one random phase encoding techniques are proposed with spherical wave based on 4f system
本文首先對雙隨機相位加密技術進行了回顧，並對它的一些改進方案的特點作了詳細介紹，並在此基礎上，根據球面波相位因子的特點和相位掩模在加解密中作用，提出了一種利用球面波照射4f系統的單隨機相位編碼加密的新方法。For the coordination of the contradictory, the wavefront technique has been regarded as an effective method to improve the image quality in photolithography by optimizing the image of the mask. it includes : pupil filtering, phase shift mask, off - axis illumination, optical proximity correction, and so on
為了協調這種矛盾，利用波前工程來改善光刻圖形的質量以提高光刻解析度，已廣泛地應用於光學光刻中，如：瞳孔濾波、相移掩模、離軸照明、光學鄰近效應校正等。Based on light interference, diffraction and optical holography theory, the paper comprehensively describes the basic principle, main types, development trend as well as the objective and significance for carrying out the research of laser maskless interferometric lithography and holographic lithography
本論文基於光的干涉和衍射及光學全息照相理論，綜合評述了光學光刻的基本原理、主要類型、發展趨勢及開展激光無掩模干涉光刻和全息光刻研究的目的和意義。
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