物理濺射 的英文怎麼說

中文拼音 [wùlǐjiànshè]
物理濺射 英文
physical sputtering
  • 物 : 名詞1 （東西） thing; matter; object 2 （指自己以外的人或與己相對的環境） other people; the outsi...
  • 理 : Ⅰ名詞1 （物質組織的條紋） texture; grain （in wood skin etc ） 2 （道理;事理） reason; logic; tru...
  • 濺 : 動詞（液體受沖擊向四外射出） splash; spatter
  • 射 : Ⅰ動詞1 （用推力或彈力送出） shoot; fire 2 （液體受到壓力迅速擠出） discharge in a jet 3 （放出） ...
  • 物理 : 1. （事物的內在規律） innate laws of things2. （物理學） physics
  1. The study on low temperature pvd deposited sic film was carried out - m - employing bias assisted magnetron sputtering. furthermore, pvd deposited sic film mainly containing cubic phase was achieved at room temperature for. the first time

    採用偏壓輔助rf濺射法，對低溫物理氣相沉積sic薄膜進行了研究，並首次在室溫下制備出含有? sic構相併以其為主的sic薄膜。
  2. The theory of ion - beam etching and ion sources are reviewed. the classification of ion - beam etching are introduced. according to the mechanism that ion sputtering leads to faceting, trenching, reflection and redeposition, some relative solutions are put forward

    綜合敘述了離子束刻蝕技術和離子源的工作原理，簡單介紹了離子束刻蝕的分類，闡述了離子束刻蝕的物理濺射效應導致的刻面，開槽，再沉積等現象的產生機理及解決辦法，分析了kaufman離子源進行ribe的可行性及出現的問題。
  3. First, we prepared amorphous bacacuo precursor thin films on single crystal laalo3 ( 001 ) substrate by rf magnetron sputtering. then tl2ba2cacu2o8 hts thin films were obtained by an ex situ post annealing

    本文採用射頻磁控濺射法在laalo3 （ 001 ）單晶基片上制備了bacacuo非晶前驅物薄膜，然後將前驅物薄膜進行非原位鉈化處理，制備了tl2ba2cacu2o8高溫超導薄膜。
  4. In the first step, effect of the target ' s components on properties of thin films was investigated. influences of tl2o partial pressure and thallination temperature on the component phases and properties of tl2ba2cacu2o8 hts thin films were studied in the second step of ex situ post annealing treatments

    在濺射沉積前驅物薄膜的過程中，研究了靶材成分對薄膜性能的影響；鉈化后處理過程中，研究了tl2o分壓和鉈化溫度對tl2ba2cacu2o8高溫超導薄膜相組成及其性能的影響。
  5. Our experiments emphasized the correlation between micro structures and some properties of the coatings and tried to obtain the protective coatings with the comprehensively good properties, in which auger electron spectroscopy ( aes ), scanning electron microscope ( sem ), and x - ray diffraction ( xrd ) were employed to investigate the composition, microstructure and crystal phase of the coatings respectively, and the properties test was primarily considered with the wear resistance and corrosion resistance of the coatings

    本論文主要採用pvd技術中的磁控濺射鍍膜（ ms或rms ）及部分用等離子噴塗（ ps ）和熱氧化（ to ）表面處理技術研究了鈾的具有代表性的三種防腐保護鍍層，即單質al 、氧化物al _ 2o _ 3和合金al - zn鍍層。實驗力圖在制備技術、工藝參數及鍍層的微結構和性能之間找到一些內在的聯系，探索綜合性能較好的防腐蝕鍍層。
  6. And so on, the method of cvd and pvd were also discussed. through the theoretical calculation and experimental results, the distance between the diaphragm and the base plate was optimize, which will touch in case of over loading

    另外也對化學氣相沉積法（ cvd法）和物理氣相沉積法（ pvd法） （包括其中的濺射法）進行了探討。
  7. Rf magnetron sputtering that has been broadly used to fabricate a variety of thin films is a kind of physical vapor deposition ( pvd ), which consists of two main microscopic processes, one is the generation and transportation of the vapor phase particles to form the thin film, the other is the diffusion and aggregation of the film atoms on substrate, which leads to the formation of the film

    射頻磁控濺射是一種物理氣相沉積技術，已被廣泛地用於各種薄膜的制備。它主要包括成膜氣相粒子（原子或分子）的產生和輸運以及輸運到襯底的成膜粒子在襯底上的擴散、聚集、生長成膜兩大過程。
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