石英膜 的英文怎麼說
中文拼音 [dànyīngmó]
石英膜
英文
quartz film-
And these limit the diamond film application. in order to grow high quality diamond film, this experiment using cleanout and negative bias to improve nucleus
為了得到高質量的金剛石薄膜本研究對于石英玻璃的表面進行了清洗並用了負偏壓增強形核的方法。The prototype is made by a concave sphere primary and a plane secondary deposited the mo / si multilayer on the fused quartz substrates. the reflectivity peak and the reflectivity uniformity of the multilayer mirrors are respectively 25 % and around + 2. 5 % at 17. 1nm
望遠鏡主鏡為球面,次鏡為平面,所用反射鏡為在熔石英基底上鍍制mo si多層膜的euv波段反射鏡,在17 . 1nm的反射率25 ,反射率的均勻性2 . 5 。The photocatalytic activity of the samples was evaluated by the photocatalytic oxidation of nitrogen monoxide in the gaseous phase and the photocatalytic decolorization of methyl orange solution in the aqueous phase, respectively. the titania thin films on fused quartz were prepared by lpd method and then calcined at different temperatures
用液相沉積法在石英玻璃上制備了二氧化鈦薄膜,並在不同的溫度下進行熱處理,用甲基橙水溶液的降解脫色評價二氧化鈦薄膜的光催化活性。In this thesis, a kind of reversible immobilization method based on the plasma - polymerized film ( ppf ) used for effective immobilization of active bio - molecules and easy reproduction of sensors is developed. the surface of quartz crystal microbalance ( qcm ) is firstly prepared with plasma - polymerized film of butyl amine by glow - charge technique and then covered with a negative - charged polyelectrolyte by self - assembling. through strong electrostatic attraction, antibodies ( antigens ) positive - charged are immobilized for the determination of antigens ( antibodies )
本論文基於等離子體聚合膜,設計了一種既能固定生物活性物質又易於傳感器再生的可逆固定化方法,即採用輝光放電的等離子體沉積技術,先在石英晶體上沉積一層正丁胺等離子體聚合膜,再在膜上自組裝一層帶負電的聚電解質,用以靜電吸附固定抗體(抗原)測定抗原(抗體) 。The ability of counterion so42 - to improve fc16ab monolayer ' s compressibility is poorer than cl -. with the technology of lb film, the monomolecular film of fc16ab was deposited on to quartz and caf2 with hydrophilic surfaces on ultrapure water subphase, y - type lb film of transfer ratio approaching to 1 is obtained. the lb film is demonstrated with uv - vis, ft - ir spectra
利用lb膜技術將不同亞相上的fc _ ( 16 ) ab單分子膜沉積到具有親水表面的石英基片和caf _ 2基片上,得到轉移比接近1的y -型lb膜,並用uv - vis 、 ft - ir光譜lb膜進行了表徵。Upon comprehensively reviews of the predecessors ? results, using the experience of other countries for reference, and implementing thin film technology, the author have developed the microsensor in this thesis by sputtering metal material on a silex substrate
本文在綜合評述前人工作成果的基礎上,借鑒國外的製作和研究經驗,利用薄膜技術,在石英基片上濺射銅、鎳和二氧化硅薄膜,形成薄膜熱流計。1 silica glass multimode optical fibers erratum 1
石英玻璃多膜光學纖維Abstract : molecular deposition ( md ) film, a nano film, is assembled by the interaction of static charge between cationic and anionic compounds. the micro - friction properties of an md film on silica has been studied with atomic force microscope ( afm ). it has been found that the md film has lower coefficient of friction as compared with the original surface of silica. moreover, based on the analyses of the surface force versus distance curves, photographic image, friction force image, and modulated force image, it is concluded that the friction reduction effect of md film on silica is attributed to the surface adhesion reduction and surface micro - modification
文摘:利用原子力顯微鏡對石英巖表面單層分子沉積膜的微觀摩擦特性進行了研究,發現該分子沉積膜具有一定的減摩性.通過對其表面力-位移曲線、表面形貌像、調制力像和摩擦力像的進一步分析表明,石英巖表面分子沉積膜具有減摩作用的原因在於它能夠降低表面的粘著力並對表面具有微觀修飾作用The feasibility that kaufman ion source is applied in reactive ion beam etching is discussed. etching characteristics of materials, including pr, cr, quartz, are investigated. the etch rate and mechanisms of such materials are measured and analyzed as a function of ion energy, ion beam density and ion incidence angle in pure ar and chf3, respectively. the etch rate has shown a square root dependence on variation versus
深入研究了光刻膠、鉻薄膜、石英等光學材料離子束刻蝕特性,分別以ar氣和chf3為工作氣體,研究光刻膠、鉻薄膜、石英等的刻蝕速率隨離子能量,束流密度和離子入射角度的變化關系,得到刻蝕速率與影響因素的擬合方程,為掩模的製作工藝路線提供了實驗依據和理論指導。Bai shi new development over the years, the company ' s products are mainly trade sales world - renowned brands ; has formed a production and supply of quartz crystal and ceramic capacitors, thick film resistors based serial production lines. main products include : plug posted quartz crystal surface, the surface of quartz crystals and crystal oscillators, posted plug surface, quartz oscillator vco, stickers and vco plug - round version of ceramic capacitors and vertical and horizontal layer ceramic capacitors, chip resistors and resistor ranked / exclusion order and capacitance / second polar body / mixed network
新佰仕經過多年的發展,公司貿易的產品主要銷售世界知名品牌電子元器件;現已形成了以生產及供應石英晶體?陶瓷電容器?厚膜電阻器為主的系列化產品生產線,主要產品包括:表面貼石英晶體?插件石英晶體?表面貼石英振蕩器?插件石英振蕩器?表面貼壓控振蕩器?插件壓控振蕩器?圓版型陶瓷電容?立式與臥式積層陶瓷電容?排列電阻器?晶元電阻/排阻?排列電容/二極體/混合網路。On the heat - shrinking packing machine, far infra - red quartz pipes are providedfor heating, which makes the filmon the packed articles shrink and tightly wrap packed. the machine is widely used the ofight industry, foodstuffs, cultural articles, and general merchandise
熱收縮包裝機採用石英紅遠外管加熱,使套在包裝物外的熱收縮薄膜收縮而裹緊包裝物,廣泛應用於輕工、食品、文化用品、日用百貨等行業。For xrd, ellipsometry examinations, single - side - polished si ( lll ) wafers were used as substrates and for resistance measurement, glass was used and for infrared examination, double - side - polished si ( lll ) wafers were used and for ultraviolet - visible spectrophotometry, double - side - polished quartz wafers were used and for tem micrograph and electron diffraction pattern observation, cu nets deposited by formvar film were used. the cu - mgf2 cermet films were from 50 to 600nm thick
用於xrd分析、橢偏測量的單拋si ( 111 )晶片和電阻測試的載玻片上淀積膜厚約為600nm ;用於ir測試的雙拋si ( 111 )晶片和uv測試的石英玻璃片上淀積膜厚約為250nm ;用於透射電鏡分析的樣品則淀積在400目銅網上的支撐formvar膜上,膜厚約為50 100nm 。Our factory specializes in manufacturing cabinet vacuum coaters, magnetic control sputter coaters and vacuum exhaust equipments, industrial boiler, all kinds of valves, coaters and press packer specially used in the industry of quartz crystal
我廠是國內專業生產箱式真空鍍膜機、磁控濺射鍍膜機、真空排氣設備、石英晶體行業專用被銀機和壓封機、工業爐及各種真空閥門設計製造的專業廠家。The transmittance and reflectance spectra of bn films were obtained as a function of incident photon wavelengths, and the thickness of films was measured by alpha - step meter
用紫外-可見分光光度計測量了沉積在石英片上的bn薄膜的透射光譜和反射光譜,用臺階儀測量薄膜的厚度。Either the boron nitride ( bn ) thin films with different cubic phase content were deposited on n - type si ( 111 ) and fused silica substrates by radio frequency ( rf ) sputtering using two - stage deposition process. the films were characterized by fourier transform infrared ( ftir ) spectroscopy. the transmittance te ( ) and reflectance re ( ) were obtained as a function of incident photo wavelengths and the thickness of films was measured by alpha - step. the absorption coefficient was calculated from te ( ) and re ( ). the optical band gap ( eg ) of the films was determined by effective medium form of formula containing eg
本文還研究了立方相含量與光學帶隙的關系,在n型si ( 111 )片和熔融石英片上沉積出不同體積分數的立方氮化硼薄膜,薄膜的成分由傅立葉紅外吸收譜標識;用紫外-可見分光光度計測量了沉積在石英片上的bn薄膜的透射光譜te ( )和反射光譜re ( ) ,薄膜的厚度用臺階儀測得。Base on two - stage approach, we adjust experimental parameter to develop a new method ( three - stage approach ) to prepare c - bn thin films. the study proves that it is favorable to prepare bn thin films of high cubic phase content. depositing time and substrate bias voltage in the first stage are 5 min and - 180v respectively
根據si片上bn薄膜的反射光譜r ( )和熔融石英片上bn薄膜的反射光譜r ( )和透射光譜t ( )各自獨立的計算了bn薄膜的光學帶隙,利用兩種方法分別計算立方相含量均約為55 %的bn薄膜的禁帶寬度為5 . 38ev和5 . 4ev ,其結果均和由經驗公式計算得到的結果非常接近。And then, zno thin films were synthesize on quartz and silicon substrates by sol - gel dip - coating and spin - coating. the properties of the films and the effects of growth parameters on the quality of zno films were studied using x - ray diffraction, optical absorption, photoluminescence techniques, etc. to modify the energy gap of the zno, mg2 + was added in the sol - gel solution, and mgxzn1 - xo films were prepared by the same method as that for zno films
利用溶膠凝膠法成功地在石英玻璃和單晶矽片等襯底上制備出了c軸擇優取向的zno薄膜,並利用x射線衍射儀、紫外-可見光光譜儀、熒光光譜儀等對zno薄膜的結構和性能進行了測試、分析,並研究了熱處理參數等條件對zno薄膜性能的影響。The main work is introcuced as follows : ( 1 ) the inorganic - organic nanocomposite of nanogold and chitosan, which have high biocompatibility, was synthesized in situ and used for the immobilization of antibodies. an amplified piezoelectric immunosensor for detection of normal human igg was designed with this nanocomposite film. comparing with self - assembling film of semi - cystamine, the inorganic - organic nanocomposite film could immobilize more antibodies with the activity of antibodis well retained
與半胱胺自組裝膜比較,納米金-殼聚糖復合物膜較大的比表面積使其可固載更多的抗體,同時可較好地保持抗體的反應活性;納米金的物理吸附作用使更多的沉澱結合於石英晶體表面,以其為載體制備的傳感器具有更大的頻率響應值。Both the dielectric layer and metal film were internally deposited on the fiber. it is found that ag is able to engender the highest ir reflectivity among the metal materials, so ag is ascertained as the metal layer material of the hollow waveguide, cop was used in this work as the dielectric material. based on countless calculations, optimum thickness for the deposited films were obtained, namely, 0. 2 / / m for ag layer and 1. 4 fan for the cop layer
實驗用來制備空芯光纖的基管材料為石英基管;內徑為1mm ;通過理論推導與分析發現:相對于其它的金屬材料而言,金屬銀的紅外反射率最高,因此金屬銀最適合用做制備空芯光纖的金屬膜層的材料;通過比較幾種聚合物的性質確定選擇環烯聚合物cop為電介質層材料;通過理論推導與計算確定了金屬銀膜與電介質膜的最佳理論厚度,即銀膜為0 . 2 m , cop膜的厚度為1 . 4 m 。To make cds / k4nb6o17 powder on the base of the k4nb6o17 powder which by the courses of ion exchanging, amine intercalation, sulfuration etc. to obtain cds / k4nb6o17 thin film through the same course of making cds / k4nb6o17 powder on the base of k4nb3o17 thin film on the quartz which made by the spin coating and after heat treatment. to make experiments with additives ( na2so3, 0. 1mol / l ) of photocatalytically decomposing water into h2 and o2 to evaluate the photocatalytic activities of the catalyst knb6o17 powder, cds / k4nb6o17 powder, k4nb6o17 film, cds / k4nb6o17 film. the crystalline structures of the midst powder and film productions were investigated by using the x - ray diffraction ( xrd )
本課題的主要內容是:高溫固相反應合成具有層狀結構的k _ 4nb _ 6o _ ( 17 )晶體材料,然後以此為母體材料,通過離子交換、層間胺插入、硫化處理等過程制備出cds / h _ 4nb _ 6o _ ( 17 )粉末形式的光催化材料;通過旋轉塗覆法在石英玻璃基片上制備了k _ 4nb _ 6o _ ( 17 )薄膜,採用一定的熱處理制度后對薄膜分別進行離子交換、層間胺插入、硫化處理等處理過程制備了cds / h _ 4nb _ 6o _ ( 17 )薄膜形式的光催化材料。分享友人