硅微球體 的英文怎麼說

中文拼音 [guīwéiqiútǐ]
硅微球體 英文
silica micro here
  • 硅 : 名詞[化學] silicon （14號元素符號 si）
  • 球 : 名詞1 （以半圓的直徑為軸 使半圓旋轉一周而成的立體; 由中心到表面各點距離都相等的立體） sphere; glo...
  • 體 : 體構詞成分。
  • 球體 : spherome; sphere; orb; spheroid; spherite
  1. The iron covered silicon powder was fabricated separately by the milling method and the mixing method. treated separately at 500, 600, 700, 800, 900 and 1000 for 1 minute, the iron silicon alloy bulk was attained. it also found that the density of the bulk was enhanced by the boost of the treated temperature

    實驗分別採用球磨法和混料法制備鐵硅包覆粉末，採用放電等離子燒結技術分別在500 ， 600 ， 700 ， 800 ， 900 ， 1000保溫一分鐘進行處理，得到鐵硅合金塊體，研究發現，隨著處理溫度的提高，塊體的緻密度隨之增加，顯微結構的分析表明，塊體基本保持了包覆粉末原始自然狀態。
  2. And the value drop to the lowest at ph = 0. 8. as the increase of heat treatment temperature, the pore size distribution peak of sio2 microspheres is very narrow, meanwhile the specific surface area is the smallest before 160 c. the polymer template is removed at 350 c, so the pore structure of sio2 particles has a big change which involve the increase of specific surface area and the broaden of pore size distribution peak. with the continuous raise of temperature the sio2 network will shrink little, as a result the average pore size will decrease, but the specific surface area has no obvious change

    結果發現：二氧化硅膠體顆粒均勻分佈於脲醛聚合物網路中，煅燒去除有機模板后微球表面變粗糙，而粒徑沒有明顯變化； ph值較小時，復合微球中聚合物含量較大，而ph值較大時，得到復合微球結構鬆散，因此熱處理后的二氧化硅微球孔容及平均孔徑都較大，而在ph = 0 . 8時，得到最小值；武漢理工大學碩士學位論文隨著熱處理溫度的變化，小於160時，空分佈較窄，而比表面積較小，在350時，由於有機模板的去除，微球孔結構發生突變，比表面積明顯增大，而孔徑分佈變寬，溫度繼續升高時，二氧化硅網路發生收縮，平均孔徑變小而比表面積由於有機炭化物的完全去除沒有太大變化;微球中的微孔在熱處理過程中處于平衡狀態，分佈沒有太大變化。
  3. Two kind of ordered macroporous polymethylmetacrylate structures with different pore morphologies were fabricated from colloidal templates of the same silica microspheres, which was assembled by using centrifugation as driving force

    摘要以離心沉降技術組裝的二氧化硅膠體晶體為模板，從同種尺寸的二氧化硅微球出發，合成了孔的結構和形貌不同的兩種有序大孔聚甲基丙烯酸甲酯。
  4. In this paper ， first, the author drew some important conclusions by analyzing several technical factors and experimental conditions which would have great influence on the quality of diamond thin films during mpcvd process ， including gas proportion ， the power of microwave ， the plasma ' s location, the nucleation technique, etc. finally ， the author has successfully deposited nanocrystalline diamond thin films with 300nm crystal particles on the slick surface of silicon by using ch4 / h2 gases in the mpcvd system ， and the nanocrystalline diamond thin films was proved to have good field emission performance. all these researches will make the foundation for the field emission cathode of diamond films

    本論文中，作者分析了mpcvd方法中氣源成分比、微波功率、等離子體球的位置、成核技術等各種工藝條件對金剛石薄膜質量的影響，並總結得到了一些有意義的結論；同時，在自行研製的mpcvd沉積系統上，於4 - 7kpa 、 1000左右的熱力學條件下，採用ch4 / h2氣源氣氛在光滑的硅襯底上制備出了晶粒尺寸在300納米以下的納米晶金剛石薄膜，測試得到了較好的薄膜場致電子發射性能，為金剛石薄膜場致發射冷陰極的研究工作打下了實驗基礎。
  5. Polystyrene beads, silicon dioxide spheres were successfully manipulated with the optical tweezers system. the construction of optical tweezers is the foundation optical micromanipulation of photonic crystals

    本實驗成功地實現了微米聚苯乙烯球體、二氧化硅球體樣品的操縱，為光鑷在光子晶體領域的應用奠定了必備基礎。
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