硅氣體源 的英文怎麼說
中文拼音 [guīqìtǐyuán]
硅氣體源
英文
silicon source gas-
9 series pressure cavity is made of stainless steel single unit integration structure by processing so may guarantee for the better seal performance. the characteristic of product are no o - ring, no welded, no silicon oil or other organic, structural durability ; the most apply to pump and compressor, liquid pressure and pneumatic system, go - anywhere vehicle, energy and water processing system, pressure instrument, refrigerating equipment, agricultural machinery device, locomotive braking system
9系列壓力腔採用不銹鋼單件一體式結構加工而成,因而可以保證較好的密封性能, 9系列產品的特點是無o形圈無焊縫無硅油或其它的有機物,經久耐用,主要應用於泵及壓縮機,液壓及氣動系統越野車能源及水處理系統壓力儀表冷凍設備農機設備機車剎車系統。In this paper , first, the author drew some important conclusions by analyzing several technical factors and experimental conditions which would have great influence on the quality of diamond thin films during mpcvd process , including gas proportion , the power of microwave , the plasma ' s location, the nucleation technique, etc. finally , the author has successfully deposited nanocrystalline diamond thin films with 300nm crystal particles on the slick surface of silicon by using ch4 / h2 gases in the mpcvd system , and the nanocrystalline diamond thin films was proved to have good field emission performance. all these researches will make the foundation for the field emission cathode of diamond films
本論文中,作者分析了mpcvd方法中氣源成分比、微波功率、等離子體球的位置、成核技術等各種工藝條件對金剛石薄膜質量的影響,並總結得到了一些有意義的結論;同時,在自行研製的mpcvd沉積系統上,於4 - 7kpa 、 1000左右的熱力學條件下,採用ch4 / h2氣源氣氛在光滑的硅襯底上制備出了晶粒尺寸在300納米以下的納米晶金剛石薄膜,測試得到了較好的薄膜場致電子發射性能,為金剛石薄膜場致發射冷陰極的研究工作打下了實驗基礎。
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