磁控 的英文怎麼說

中文拼音 [cíkòng]
磁控 英文
magnetron
  • 磁 : 名詞1. [物理學] （磁性; 能吸引鐵、鎳等的性質） magnetism 2. （瓷） porcelain; china
  • 控 : 動詞1 （告發;控告） accuse; charge 2 （控制） control; dominate 3 （使容器口兒朝下 讓裏面的液體慢...
  1. Excellent results have been obtained by using dc magnetron sputtering technology. a solar absorptance of 0. 94 - 0. 96 with an emittance of 0. 04 - 0. 06 at 100 has been achieved

    磁控濺射技術的準確結果顯示這種真空管在100時能夠達到吸收率： 0 . 94 - 0 . 96
  2. Its current products include : top oscillation electrical precipitator, side electrical oscillation precipitator, magnetism controlled static electricity precipitator, wet electrical precipitator, honeycomb electric catching tar instrument, high - pressur silicon rectifier equipment and plc low - pressure controlling system, blast furnace gas impulse precipitator, high concentration pulverized coal collector, coke oven and boiler flue gas low pressure impulse precipitator, blower fan inhaler, crossing piping gas cooler, high temperature fume cooler, gyre - orientation impulse hop - pocker and all sorts of molded sections

    目前主要產品有：頂部振打臥式電除塵器、側部振打電除塵器、磁控靜電除塵器、濕式電除塵器、蜂窩電捕焦油器、高壓硅整流裝置及plc低壓控制系統、高爐煤氣脈沖除塵器、高濃度煤粉收集器、焦爐及鍋爐煙氣用低壓脈沖除塵器、風機空氣過濾器、橫管式煤氣冷卻器、高溫煙氣冷卻器、回轉定位脈沖大布袋及加工各種冷彎型鋼。
  3. And the interfaces have analog input, analog output and digital input / output. we have used differently cards, such as pc - 6330d a / d card, pcl - 728 d / a card based isa bus, ipc - 5375 i / o card and so on. in addition, we select micro - stir switches and pressure sensors as sensor elements to inspect the system and choose relays and induction valves to control the bicycle pump and the motor

    總線採用isa內部總線；介面主要有模擬量輸入介面、模擬量輸出介面、開關量輸入輸出介面等，課題分別選用pc - 6330d型a d板卡、基於isa總線的型號為pcl - 728的d a板卡、型號為ipc - 5375的i o板卡；另外，課題選用了微動式行程開關、壓力變送器作為傳感元件檢測系統，選用繼電器、電磁控制換向閥實現對氣缸、電機的控制；採用vc + + 6 . 0編制控制軟體，實現了纖維鋪放技術的計算機控制。
  4. Copper has been deposited on surface of the al mmcs as interlayer by magnetron sputtering, tlp bonding of al mmcs with these interlays, the joints shear strength of tlp bonding using deposited film was as much as the joint shear strength of tlp bonding using cu foil. removing the oxidation on the surface before deposition, copper was coated by magnetron sputtering as tlp bonding interlayer

    待連接表面通過磁控濺射法沉積銅膜作為中間層進行瞬間液相連接，得到的接頭強度與銅箔中間層進行瞬間液相連接得到的接頭強度相當，而使用磁控濺射法去除待連接表面氧化膜后沉積銅膜作為中間層進行瞬間液相連接的接頭強度提高7 . 6左右。
  5. Techniques of clinical linac magnetron replacement

    醫用直線加速器磁控管更換技術探討
  6. Using jgp560c magnetron sputtering equipment, cu / ag film are deposited on cd1 - xznxte substrate by dc magnetron sputtering in order to get the influences of the main experiments parameters such as sputtering power, gas flow, vacuum air pressure, magnetoelectricity power and substrate temperature on deposition rate of film, discovered that dc sputtering power is the most key factor influencing the deposition rate

    在jgp560c型超高真空多功能磁控濺射鍍膜機上，採用直流磁控濺射法在cdznte晶體上制備出cu ag合金薄膜，揭示了氣體流量、直流濺射功率、勵磁電源功率、工作氣壓和襯底溫度等工藝參數對沉積速率的影響規律。結果表明濺射功率對沉積速率的影響最大，隨濺射功率的增大沉積速率快速增大。
  7. Magnetron enhanced reactive ion etaching system

    磁控管增強型反應性離子蝕刻系統
  8. Blank detail specification for continuous wave magnetrons

    連續波磁控管空白詳細規范
  9. Research of unbalanced magnetron sputtering system

    非平衡磁控濺射系統的研究
  10. Blank detail specifications for pulsed magnetrons

    脈沖磁控管空白詳細規范
  11. Detail specification for coail magnetron of type ckm - 2936

    Ckm - 2936型同軸磁控管詳細規范
  12. Detail specification for pulse magnetron of type ckm - 6951

    Ckm - 6951型脈沖磁控管詳細規范
  13. Pulased mode of inverted - magnetron cold - cathode gauge

    一種反磁控冷陰極真空規的脈沖操作模式
  14. Magnetron sputtering target source and sputtering procedure

    磁控濺射靶源設計及濺射工藝研究
  15. Compound medium wave - guide film on columned li - ferrites was made by magnetron sputtering system

    用磁控濺射的方法在圓柱鋰鐵氧體表面鍍覆了復合介質波導薄膜。
  16. The 3d electrons increased with the content of mn doping increasing, and the electrical property increased accordingly as the electron transport path improved. it is confirmed that all the orthorhombic perovskite phase which is formed initially at the heat treatment temperature of about 600c and thoroughly above 850c are observed in the lcmto thin film deposited on si ( 100 ) substrate by rf magneto - controlled sputtering

    確認了採用射頻磁控濺射法于si （ 100 ）基板上生長的薄膜至多在600熱處理已開始形成晶相，形成的晶相全部是正交晶系鈣欽礦相，提高熱處理溫度，薄膜中晶相含量相對增大，高於850后晶相基本形成完畢。
  17. The magswitch electronic pressure switch is used in locations where mechanical pressure switches have long since been overtaxed

    磁控電子壓力開關可用於很久以來對機械式壓力開關來說負擔過重的地方。
  18. Magnetron management of target capacity and stabilization of an anodi current with the help of the built - in electromagnet, an opportunity of a parallel feed several magnetrons from one rectifier, a low level of the shf radiation from a cathodic leg is characterized effective

    該磁控管可有效控制輸出功率，內建電磁石使提高了它的陽極穩定性，一個整流器可同時供幾個磁控管，具有低的陰極超高頻輻射。
  19. Firstly, the tio2 thin films are deposited by dc reactive magnetron sputtering apparatus, and characterlized by n & k analyzer1200, x - ray diffraction spectroscopy ( xrd ), scanning electronic microscopy ( sem ), alpha - step500. and it was analyzed that the effect on performance and structure of films with the change of argon flow, total gas pressure, the substrate - to - target distance and temperature

    第一、應用穩定的直流磁控濺射設備制備tio2減反射薄膜並通過n & kanalyzer1200薄膜光學分析儀、 x射線衍射分析（ xrd ） 、掃描電子顯微鏡（ sem ） 、 alpha - step500型臺階儀等儀器對薄膜進行表徵，分析氧分壓、總氣壓、工作溫度、靶基距等制備工藝參數對薄膜性能結構的影響。
  20. Third, modulate the double - anode mig and obtain a series of significative inclusions

    對雙陽極磁控注入槍進行數值模擬，研究獲得了一系列有意義的結論。
分享友人
分享到 Line

分享到臉書