移相掩模 的英文怎麼說

中文拼音 [yíxiāngyǎnmó]
移相掩模 英文
phase-shift masks
  • 移 : Ⅰ動詞1. （移動） move; remove; shift 2. （改變; 變動） change; alter Ⅱ名詞（姓氏） a surname
  • 相 : 相Ⅰ名詞1 （相貌; 外貌） looks; appearance 2 （坐、立等的姿態） bearing; posture 3 [物理學] （相位...
  • 掩 : 動詞1 （遮蓋; 掩蔽） cover; hide 2 （關; 合） shut; close 3 [方言] （被卡住） get squeezed [pinch...
  • 模 : 模名詞1. （模子） mould; pattern; matrix 2. （姓氏） a surname
  1. The second is about verification of alternating psm manufacturability and this part introduces a new method based on standard cells to resolve the phase conflicts, including for dark field and for clear field. the method has the capabilities of verifying standard cell layout, locating features with phase conflicts and giving out suggestion for modification

    第二部分針對由傳統方法設計出的版圖不能滿足交替移相掩模要求的問題，介紹了一種基於標準單元的交替移相掩模可製造性驗證與設計的演算法，包括針對暗場和亮場兩種不同環境版圖的演算法。
  2. Before more advanced lithography tool is produced, in order to use current tools to manufacture vdsm ic, reticle correction methods such as perturbing the shape ( via optical proximity correction ( opc ) ) or the phase ( via phase - shifting masks ( psm ) ) of transmitting aperture in the reticle are proposed by the industry

    在波長更小的光刻系統出現前，為了能利用現有設備解決集成電路的可製造性問題，工業界提出了對掩模作預失真（光學鄰近校正）和在掩模上加相位轉移模（移相掩模）等的掩模校正方法。
  3. A phase - compatibility rule checker for standard cell layout designed with alternating psm

    一種用於標準單元版圖交替移相掩模相位兼容性規則檢查的工具
  4. The paper is for verification and design of manufacturability of opc and psm as these two ways have become the most important correction ways

    由於光學鄰近校正和交替移相掩模已經成為最主要的掩模校正方法，因此本文主要針對這兩種方法進行可製造性的驗證和設計。
  5. A soft - ware implementing this method is presented as well, which has the capabilities of verifying standard cell layout, locating features with phase conflicts and giving out suggestions for modification

    基於此方法的軟體工具能夠檢查標準單元版圖，找出不符合交替移相掩模設計要求的圖形，並給出相關的修改建議。
  6. However, in current design flow, designers do not consider whether designs are friendly to opc before they are sent to foundries. in fact, a lot of features in such designs can not be corrected enough because of many factors such as the constraints of environments. so even though such designs are corrected, many lithographic errors still exist

    然而，由於在當前的集成電路設計流中，在設計出的版圖送到製造廠商前，電路的設計者並沒有考慮版圖對光學鄰近校正和交替移相掩模的友好性問題，這使得版圖中的一些圖形由於周圍條件的限制，如無法充分進行光學鄰近校正，無法進行交替移相掩模的處理等，從而使得版圖設計即使進行了校正處理，還存在大量光刻故障的可能性。
  7. For the coordination of the contradictory, the wavefront technique has been regarded as an effective method to improve the image quality in photolithography by optimizing the image of the mask. it includes : pupil filtering, phase shift mask, off - axis illumination, optical proximity correction, and so on

    為了協調這種矛盾，利用波前工程來改善光刻圖形的質量以提高光刻解析度，已廣泛地應用於光學光刻中，如：瞳孔濾波、相移掩模、離軸照明、光學鄰近效應校正等。
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