等時退火 的英文怎麼說

中文拼音 [děngshítuìhuǒ]
等時退火 英文
isochronal annealing
  • 等 : Ⅰ量詞1 （等級） class; grade; rank 2 （種; 類） kind; sort; type Ⅱ形容詞（程度或數量上相同） equa...
  • 時 : shí］Ⅰ名1 （比較長的一段時間）time; times; days:當時at that time; in those days; 古時 ancient tim...
  • 退 : 動詞1 （向後移動） retreat; draw back; move back 2 （使向後移動） cause to move back; remove; wit...
  • 火 : fire
  • 退火 : [冶金學] anneal; annealing; back-out
  1. The procedure functions in the compare between partial image of dynamic collection and corresponding image of the airscape. in chapter 5, basing on the analysis of correlative theory of digital image, we introduce the improved fasted - down algorithm and simulative anneal algorithm, which applies to nn calculation, an d bring forward the unique and effective means, correlative original value evaluation. basing on the combination of correlative arithmetic, a stable, high - speed and exact correlative arithmetic is formed, which makes it possible to apply computer vision detection of single - needle quilting in industrial production

    本文展開研究並取得一定成效：構建了基於pci總線的微機實時圖像採集系統；在採集的布料總圖（鳥瞰圖）的基礎上，通過數字圖像的數字濾波、圖像增強、邊緣檢測等處理，提取布料圖像的邊緣，對輪廓的矢量化的象素點進行搜索，得到相應的圖案矢量圖，從而確定絎縫的加工軌跡，生成加工指令；在進給加工過程中，主計算機對動態局部圖像與總圖（鳥瞰圖）的對應部分進行圖像相關的匹配計算，應用數字圖像理論，結合神經網路計算的改進最速下降法和模擬退火演算法，提出獨特而有效的相關迭代初始值賦值方法，形成穩定、高速和準確的相關運算，實現單針絎縫視覺測量和自動控制。
  2. And as for the vague something - was it a sinister or a sorrowful, a designing or a desponding expression ? - that opened upon a careful observer, now and then, in his eye, and closed again before one could fathom the strange depth partially disclosed ; that something which used to make me fear and shrink, as if i had been wandering amongst volcanic - looking hills, and had suddenly felt the ground quiver and seen it gape : that something, i, at intervals, beheld still ; and with throbbing heart, but not with palsied nerves

    至於那種令人難以捉摸的東西那種表情是陰險還是憂傷，是工於心計還是頹唐沮喪，一個細心的旁觀者會看到這種表情不時從他目光中流露出來，但是沒等你探測暴露部分的神秘深淵，它又再次掩蓋起來了。那種神態過去曾使我畏懼和退縮，彷彿徘徊在火山似的群山之中，突然感到大地顫抖，看到地面裂開了，間或我還能見到這樣的表情，我依舊怦然心動，卻並未神經麻木。
  3. The dependence of oxygen precipitation and induced - defects in heavily as - doped silicon on heat treatment process was studied by annealing and ig process, chemical etching, scanning electron micrograph ( sem ) and transmission electron microscopy ( tem ). a developed ig technique was suggested and the mechanism of the influence of as on oxygen precipitation formation in heavily as - doped silicon was discussed

    本文通過化學腐蝕、光學顯微鏡、掃描電鏡（ sem ） 、透射電境（ tem ）等分析技術，對重摻砷硅單晶在單步退火工藝和內吸雜退火工藝中氧沉澱及誘生缺陷的形態，形核與熱處理溫度、時間的關系等進行了研究。
  4. The soi is of crystal quality and the box is uniform in thickness, with the interfaces of si / sioa / si smooth and sharp. we have systematically studied the dependence of the formed soi structure on the process parameters, such as ion energy, implantation dosage, substrate temperature, as well as the annealing temperature. with xtem, sims, srp, rbs, ir, raman, aes, xps and other characterization tools, it was found that a dose window at fixed energy for water plasma ion implantation to form high quality soi structure similar to the conventional simox process exists

    本論文還系統地研究了不同注入劑量、注入能量、注入時基底溫度以及退火溫度對所形成soi結構性能的影響，藉助xtem 、 sims 、 srp 、 rbs 、 ie 、 raman 、 aes 、 xps等測試分析手段，我們發現，與傳統注氧隔離（ simox ）技術類似，存在著「劑量窗口」形成優質的soi材料，但在水等離子體離子注入方式中soi材料結構質量對劑量變化更為敏感，隨著注入劑量的增大， soi材料的埋層厚度增大而表層硅厚度減小。
  5. In spite of these advantages, we should concentrate on how to extend the representation of modes, how to apply to unstructured grids, etc. and when combining pod and saa, it is necessary to know how to represent the shape and how to control the range of seeking and iteration number

    但在研究的過程中，我們發現正交分解方法也存在如下問題:如何增強基模態的表達能力，如何將該方法應用於非結構網格的計算等。在利用模擬退火演算法結合解算器進行翼型反設計時，則需要考慮如何表達幾何外形形狀，怎樣控制搜索范圍以及如何減小搜索次數等實際問題。
  6. The first one was called one step process or isothermal deposition and annealing process. in this process, the ceo _ 2 layers were formed at high temperature and oxidative atmosphere and then annealed at the same temperature. the relationship between the growth parameters and the textured degree of ceo _ 2 thin film was systematically studied, and the optimal growth parameters were summaried

    採用等溫退火法（或稱「一步法」 ）沉積ceo _ 2 ，即:先在氧化性氣氛下直接反應生長ceo _ 2薄膜，再在與沉積溫度相同的溫度下對薄膜進行退火處理，系統研究了沉積溫度、退火時間、水蒸汽分壓對薄膜c軸織構程度的影響。
  7. The main topic of this thesis is to deposit the lacamno3 films using the pulsed laser deposition ( pld ) technique, and to improve the properties of the films through a serials of processes including the post annealing treatments. at last, the relation between the physical properties and the film making processes of the materials are discussed and some possible applications explored

    本論文的任務就是利用脈沖激光沉積lacamno _ 3薄膜，並通過退火等一系列工藝處理提高薄膜性質，最終製作測輻射熱儀的敏感元件，同時也對材料的物性展開討論，以探尋更多的應用。
  8. The company deals with the heat treatment processing of various specification, type and kind of ferrous nonferrous metal, including anneal, quenching, hardening tempering, carburizing, solid solution, aging, vacuum heat treatment, high frequency treatment, blueing, nitriding and ion nitriding etc, the annual capacity of which is more than 18, 000t

    我公司可以承攬各種規格型號品種的黑色金屬有色金屬熱處理加工業務，包括：退火正火回火淬火調質滲碳固溶時效真空熱處理高頻處理發藍氮化離子氮化等。年加工能力22000餘噸，年加工產量出口佔70 % 。
  9. The new vibrational infrared absorption band at about 485cm - 1 was annealed at about 400. it was difficult to annealing v - o complex in fast neutron irradiated si under 600 for 1h

    同時快中子輻照后硅中產生v - o復合體等缺陷，在低於600 、 1小時的退火也難以消除，表明快中子輻照直拉硅中的氧相關缺陷更加復雜。
  10. The relationship between sputtering conditions and the depositional speed shows : with working pressure 1. 2 pa, sputtering power 180w, the depositional speed of tio2 thin film is 40nm / h, and increases with the increasing of sputtering power. it can be also founded that the depositional speed is nearly proportional to the working pressure : within the range of 0. 3pa to 1. 6pa, the depositional speed increases linearly with the increase of ar pressure. with the enhancement of the substrate ' s temperature of sputtering or annealing, the resulted thin films show a tendency of decreasing in thickness, and increasing in refractivity

    本實驗是採用磁控濺射方法，在不同的溫度下制備了tio _ 2薄膜，並對薄膜進行了不同溫度和時間的退火處理，通過原子力顯微鏡（ afm ） 、 x射線衍射（ xrd ） 、掃描電鏡（ sem ）等檢測手段對薄膜的表面形貌和組成結構進行了分析，結果如下： （ 1 ）濺射工藝條件與薄膜沉積速度的關系表明：採用1 . 2pa工作氣壓， 180w的射頻功率tio _ 2薄膜的沉積速率為40nm h ，並隨射頻功率的增加而提高，呈近似的線性關系，在0 . 3pa 1 . 6pa氣壓范圍中，氬氣壓強升高沉積速率迅速增加，濺射溫度提高和退火處理能使薄膜的厚度減小和折射率提高。
  11. The paper exploits then method of combining the simulated annealing algorithm with genetic algorithm for the question and designs the coding way which based on ordinal characters, builds up fitness function on the basis of penalty function, adopts the basal technology, such as crossover, mutation etc. to deal with the model and put forward adjustable algorithms for trains occupying time sets

    將模擬退火演算法和演化演算法混合起來運用於該問題，設計有序的字元串編碼方法，構造了基於罰函數的適應度函數，採用交叉和變異等技術，求解該模型。並提出了車列佔用時區調整的相關演算法。
  12. Carbon plasma immersion ion implantation ( piii ) into the porous silicon has been studied for the first time, and obtained intense blue light. the effect of annealing temperature on the luminescence has been investigated and results show that the luminescence intensity of sample reaches maximum after annealed at 4000c

    首次研究了碳等離子體注入對多孔硅的改性，得到了強藍光發射，詳細研究了退火溫度對發光強度的影響，發現在400時達到最大值，並探討了相關的機理。
  13. We have our clothes, some more splendid than others, - this is our credit ; but when a man dies he has only his skin ; in the same way, on retiring from business, you have nothing but your real principal of about five or six millions, at the most ; for third - rate fortunes are never more than a fourth of what they appear to be, like the locomotive on a railway, the size of which is magnified by the smoke and steam surrounding it

    但當一個人死了以後，他就只剩下了皮肉。同樣的，當退出商場的時候，您最多也不過只剩下了五六百萬的真本錢，因為三等富翁的實際資產決不會超過他表面上看上去的四分之一。這就象鐵路上的火車頭一樣，由於四周有煤煙和蒸氣包圍著它的體積，才顯得特別龐大。
  14. The furnaces can be used for vacuum braze welding of aluminum alloy production, such as aluminum alloy heat exchanger, braze welding of stainless steel, titanium alloy, super - alloy, cemented carbide and nonferrous metals, vacuum temper of high - speed steel, tool and mould steel, bearing steel, stainless steel etc, ageing and annealing of nonferrous metals

    實現的基本工藝高溫合金真空釬焊實例：主要用於不銹鋼鈦合金高溫合金硬質合金有色金屬的釬焊及高速鋼工模具鋼軸承鋼不銹鋼等材料的真空回火，以及有色金屬的時效和退火處理。
  15. Anneal treating has different influence on the films " electrical properties. at lower treating temperature, treating time and treating atmosphere ' s influence on electrical properties are not obvious : at higher treating temperature, the sheet resistance increases with the treating temperature and the treating time ' s increasing because of o ion and na ion ' s permeating into the films. based on the above study, semi - industrial experimentation on line has been done in the float glass line

    退火處理對薄膜電性能也有較大影響，在較低退火溫度下，退火時間和退火氣氛對薄膜電性能影響不是很大；在較高退火溫度下，玻璃基板中的na ~ +等堿金屬離子和退火氣氛中的o對薄膜電性能影響很大，退火溫度越高，退火時間越長，薄膜電阻率越大。
  16. Taking at89c52 as the microprocessor, it can record the time when the temperature reached the material was put in and the alert happened

    可記錄下退火過程的各區溫度到達、進料、報警等事件的發生時間。
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