等離子體參數 的英文怎麼說

中文拼音 [děnglízitǐshēnshǔ]
等離子體參數 英文
plasma parameter
  • 等 : Ⅰ量詞1 （等級） class; grade; rank 2 （種; 類） kind; sort; type Ⅱ形容詞（程度或數量上相同） equa...
  • 離 : Ⅰ動詞1 （離開） leave; part from; be away from; separate 2 （背離） go against 3 （缺少） dispens...
  • 子 : 子Ⅰ名詞1 （兒子） son 2 （人的通稱） person 3 （古代特指有學問的男人） ancient title of respect f...
  • 體 : 體構詞成分。
  • 參 : 參構詞成分。
  • 數 : 數副詞（屢次） frequently; repeatedly
  • 離子 : [物理學] ion
  1. Experimental results show that the bistable of tuned substrate self - bias was determined by discharge gas pressure, discharge power and tuning circuit parameters etc. the bistable exists is because of there is capacitive coupling in icp system and sheath capacitance is nonlinear

    實驗結果表明這種跳變回滯現象與等離子體的放電氣壓、射頻功率以及調諧外電路的參數等多種因素密切相聯系。而產生跳變回滯現象的原因是icp中存在容性耦合以及鞘層電容具有非線性特性。
  2. Influence of process parameters on the etching rate in inductively coupled plasma etcher

    等離子體刻蝕中工藝參數對刻蝕速率影響的研究
  3. In this paper, firstly, the mechanism of laser plasma shock wave ' s form, the basic formula of the theory of shock wave, the state equation of the shock wave in the water and the relation of the parameters of the shock front are studied

    本文首先討論了激光等離子體沖擊波的形成機理、沖擊波理論的基本關系式、水中沖擊波的狀態方程模型以及沖擊波波前參數的關系。
  4. The floating potential, electron temperature, ion density and flux density are all varied with the system parameters. the identical parameters we measured in our system is as follows, the electron temperature is from 1 to 4ev, ion density is among the magnitudes of i09 - io

    文中重點研究了ecr等離子體的特性，並對我們的系統進行了langmuir探針和faraday筒測試，研究了等離子體參數隨氣壓、微波功率、偏壓、氣體種類等的變化。
  5. Finally, the characteristics of ion curren extraction in different conditions are simulationed with magic software, and the parameter of best emission surface is obtained

    最後，採用magic程序對高頻離子源不同引出參數下的束流引出特性進行了數值模擬，得到了獲得最佳的引出離子束所要求的等離子體發射面參數。
  6. Electron density is one of basic parameters of laser - produced plasma, so it has a important role in diagnosis of laser - produced plasma

    電子密度是激光等離子體最重要的基本參數之一，因此在激光等離子體診斷中佔有重要位置。
  7. Despite these laser - produced plasmas are small - size ( ~ 100urn ) and short - lived, with parameters changing on the scale of tens to hundreds of picoseconds, they have quite important science and practical effect

    盡管激光等離子體尺寸極小（ 100 m ）壽命短且參數以幾百皮秒的量級變化，但卻有相當重要的科學和實際作用。
  8. The main research contents of the physical design include : presenting the domestic and international status of space weather and expanding on the need and the importance about the space weather forecast ; sorting the disastrous space weather and discussing their effects and adapted prediction methods ; analyzing the solar disturbing resources of space weather and the precursor or concomitant phenomena of solar eruption based on the newest observational results ; probing into the radiation principle of solar short - wave ray and presenting the computing methods about solar continuum and line spectrum radiation ; extrapolating physical methods of reconstructing the temperature and the emission measure of coronal plasma ; argumenting the effective observing spectrum for space weather empirical forecast and space weather numerical forecast

    物理設計的主要研究內容包括：分析目前國內國際空間天氣預報的發展現狀及開展空間天氣預報的必要性和重要性；分類討論了災害性空間天氣的種類、影響及目前國際上的預報方法：分析了空間天氣太陽擾動源及擾動源爆發的先兆現象或者伴生現象；討論了太陽短波輻射線譜和連續譜輻射強度的計算方法：推導了利用望遠鏡多波段的觀測結果反演日冕等離子體溫度、發射量等參數的物理方法：論證了開展空間天氣經驗預報和發展數值預報有效的成像譜段。
  9. The influence of capability of yak hairs treated with different plasma was studied

    研究了各等離子體參數對氂牛毛纖維性能的影響。
  10. This paper studies the application of inductively coupled plasma ( icp ) technology to the etching compound semiconductor insb - in film. by means of single probe and double probe, the ion density and electron temperature of chamber ( 30mm and 50mm in height respectively ) under varied process condition were diagnosed. the spatial distribution of the axial position of the two parameters and the varied curve that the two parameters varies with the power and air pressure are obtained

    利用單探針和雙探針診斷30mm高反應室和50mm高反應室在各種工藝條件下的離子密度和電子溫度，得到這兩個參數在反應室軸向位置的空間分佈、隨功率和氣壓的變化曲線、頂蓋接地和反應室體積對它們的影響，結果表明離子密度為10 ~ 8 10 ~ （ 10 ） cm ~ （ - 3 ） ，電子溫度在4 10ev之間；當頂蓋接地時，該處的等離子體密度明顯大於不接地；在同樣條件下， 50mm高反應室內的離子密度明顯大於30mm高反應室。
  11. This paper mainly study on the technics of preparing nano - si3n4 and icpecvd. seeking for the proper parameter and technics, crystallization of nano - si3n4 powder with muffle furnace, probe the new effective way of improving the properties of nano - si3n4 powder the ion density in the reaction chamber was diagnosed by a langmuir probe. the rules were obtained under different air pressure, different radio frequency power and different position which the ion density changes about from 1010cm - 3 to 1010cm - 3 decreasing as the pressure increases and increasing as the power decreases

    利用朗繆爾探針診斷了反應室內等離子體參數，得到不同位置、不同功率和不同氣壓下等離子體密度的變化規律，結果表明離子密度為10 ~ 8 10 ~ （ 10 ） cm ~ （ - 3 ） ，等離子體密度隨著功率的增大而增大，隨著氣壓的升高而減小，由於離子鞘層的存在，在一定條件下提供了局部等離子體密度穩定的區域。
  12. The common path defocusing 4f shearing interferometer in the system was constructed, which is fit for the dense plasma measurement. the advantages of this system consist in its stability and easy adjustment as the common path system and respective adjustability of shearing amount and stripe spatial frequency as m - z interferometer as well

    設計了基於共光路結構的離焦4f剪切差分干涉儀，該干涉儀同時具有m - z型干涉儀的剪切量和條紋空間頻率分別可調的優點以及共光路結構的穩定性和易於調節的優點，使得在稠密等離子體的測量中，系統參數可以兼顧小的剪切量和大的條紋空間頻率。
  13. The main research contents of the technical design include : analyzing the necessary parts of the solar x - euv telescope and the method of imaging x and euv ray ; developing the optic, electronic and mechanical design of this instrument ; computing solar x - euv imaging telescope ' s response to different temperature plasma, analyzing combination application of telescope filters for reconstructing the plasma paramaters and apprasing the telescope ' s response to the solar activities

    技術設計的主要內容包括：分析瞭望遠鏡的系統組成及成像方式選擇；完成太陽x - euv成像望遠鏡光學、電子學、機械等方面的技術設計：計算分析了太陽x - euv成像望遠鏡對不同溫度的等離子體響應、反演高低溫等離子體參數的最佳過濾片組合利用及望遠鏡對不同太陽活動現象的響應。
  14. The method of preparing the uniform coating, the techniques of thermal bonding and hydrogen plasma treatment was investigated experimentally. the optimum coating method and technological parameters was summarized

    重點探索了塗覆金剛石納米塗層的方法、實現金剛石與金屬鈦的熱粘接工藝以及氫等離子體處理的工藝參數，篩選出了在本實驗系統中的最佳方法和工藝條件。
  15. Analyzing the treated yak hairs with sem, xps and et al, it showed under the same conditions, the effect of etching is enhanced with the increasing of power of wave, and the hydrophilicity and dyeing rate enhanced obviously

    通過sem 、 xps及吸附性能等的分析，結果表明，在相同參數的等離子體條件下，隨著產生等離子體的微波功率的增大，對氂牛毛纖維表面的刻蝕效果增強；經過等離子體處理過的氂牛毛纖維的親水性，上染率等都有明顯的提高，說明該方法是一條切實可行的路線。
  16. The numerical results of the dispersion relation show some nonlinear effects : for a fixed geometry of a waveguid, beam parameters and plasma density, the increment of the modulation parameter may lead to a slight increment of the operating frequency, however, as the modulation parameter increases further, saturation may occur and the dispersion relations are hard to be separated, it is due to the overmodulation of the microwave power, this phenomenon itself belongs to the nonlinear effects

    對於一定的波導、電子注參量和等離子體密度值，等離子體調制系數的增加，使工作頻率略微升高。但是，隨著等離子體調制系數的進一步增加，色散曲線變得彼此之間不可分辨，可以認為是等離子體的過調制導致了柵的飽和。這一現象是非線性的，可見，等離子體柵和調制場中文摘要是非線性關系，等離子體柵是非線性j 。
  17. Plasma characteristics of a rf ion source are investigated by emission spectroscopy. the spatiotemporal spectral line intensities of the first three atomic lines in hydrogen bahner series ( = 656. 28, 486. 13, 434. 05nm ) of rf ion source plasma, are measured with calibrated optical multichannel analyzer ( oma ). some plasma parameters, including electron temperature, hydrogen atom density and hydrogen ion density, are calculated and analyzed using partial local thermodynamic equilibrium ( plte ) theory and abel transform

    實驗採用絕對定標后的光學多道分析系統（ oma ）測定了離子源等離子體不同時間和空間位置的氫原子巴耳末譜線系中前三條譜線（ = 656 . 28 ， 486 . 13 ， 434 . 05nm ）的強度，並採用plte的理論和abel變換方法，計算出了高頻離子源等離子體的電子溫度、氫原子濃度、氫離子濃度等參數在放電的不同階段和徑向分佈情況，並進行了簡要分析。
  18. Using the microwave selective heating property for materials, by setup equivalent equation, and first time inducing the electromagnetic field perturbation theory to the design of heating materials for substrate in mpcvd, three temperature distribution modes were established, including temperature distribution comprehensive mode of inhomogeneous plasma, temperature distribution composite mode of composite substrate materials, temperature distribution perturbation mode of composite materials, which ii provided an whole new technology route to the design of substrate heating system in mpcvd and guided the preparation of heating materials for substrate. and then the heating materials for substrate were designed and optimized to obtain large area homogeneous temperature distribution even larger than substrate holder ' s diameter. as an important part, this thesis researched the nucleation and growth of diamond films in mpcvd, systematically researched the effects of substrate pretreatment, methane concentration, deposition pressure and substrate temperature etc experimental technologic parameters on diamond films " quality on ( 100 ) single crystal silicon substrate in the process of mpcvd, characterized the films qualities in laser raman spectra ( raman ), x - ray diffraction ( xrd ), scanning electron microscopy ( sem ), infrared transmission spectra ( ir ), atomic force microscopy ( afm ), determined the optimum parameters for mpcvd high quality diamond in the mpcvd - 4 mode system

    該系統可通過沉積參數的精確控制，以控制沉積過程，減少金剛石膜生長過程中的缺陷，並採用光纖光譜儀檢測分析等離子體的可見光光譜以監測微波等離體化學氣相沉積過程；利用微波對材料的選擇加熱特性，通過構造等效方程，並首次將電磁場攝動理論引入到mpcvd的基片加熱材料的設計中，建立了非均勻等離子體溫度場綜合模型、復合介質基片材料的復合溫度場模型及復合介質材料溫度場攝動模型，為mpcvd的基片加熱系統設計提供了一條全新的技術路線以指導基片加熱材料的制備，並對基片加熱材料進行了設計和優選，以獲取大面積均勻的溫度場區，甚至獲得大於基片臺尺寸的均勻溫度區；作為研究重點之一，開展了微波等離體化學氣相沉積金剛石的成核與生長研究，系統地研究了在（ 100 ）單晶硅基片上mpcvd沉積金剛石膜的實驗過程中，基片預處理、甲烷濃度、沉積氣壓、基體溫度等不同實驗工藝參數對金剛石薄膜質量的影響，分別用raman光譜、 x射線衍射（ xrd ） 、掃描電鏡（ sem ） 、紅外透射光譜（ ir ） 、原子力顯微鏡（ afm ）對薄膜進行了表徵，確立了該系統上mpcvd金剛石膜的最佳的實驗工藝參數。
  19. The fourier transform infrared ( ftir ) spectrum is an effective technology for studying the hydrogen content ( ch ) and the silicon - hydrogen bonding configuration ( si - hn ) of hudrogenated amorphous silicon ( a - si : h ) films. in the paper, ch and si - hn of a - si : h films, fabricated at different ratio of h2 / sih4 by microwave electron cyclotron resonance plasma chemical vapor ( wmecr cvd ) method, have been obtained by analyzing their ftir spectra that are treated by baseline fitting and gaussian function fitting. the effects of ratio of h2 / sih4 on ch and si - hn are studied

    Fourier紅外透射（ ftir ）譜是研究氫化非晶硅（ a - si : h ）薄膜中氫含量（ c _ h ）及硅-氫鍵合模式（ si - h _ n ）最有效的手段，對于微波等離子體化學氣相沉積（ mwecrcvd ）方法在不同h _ 2 sih _ 4稀釋比下制備出的氫化非晶硅薄膜，我們通過紅外透射光譜的基線擬合、高斯擬合分析，得出了薄膜中的氫含量，硅氫鍵合方式及其組分，並分析了這些參數隨h _ 2 sih _ 4稀釋比變化的規律。
  20. With the fdtd method to solve the maxwell equations, with the finite - volume method to solve the n - s equations and with the single temperature local thermal equilibrium to solve plasma, first time to adopt the method of all numerical simulation, the coupling flow field of microwave plasma within resonant cavity of mpt was analyzed. for tm011 model and tem model, the matching relation between various parameters and its influence on the coupling flow field of microwave plasma within resonant cavity of mpt was studied separately. the reasonable selection of miniaturization design parameters was pointed out in the numerical simulation to be used in mpt miniaturization, i. e. throat, gas flux and microwave power should be smaller suitable after miniaturization

    採用fdtd法求解maxwell方程、有限體積法求解n - s方程、單溫度局域熱平衡模型求解等離子體參數，首次用全數值方法對mpt諧振腔進行了微波等離子體耦合流場的數值模擬，分別分析了tm _ （ 011 ）和tem兩種模式各自的參數匹配關系及其對微波等離子體流場的影響；應用於小型化mpt時，指出了小型化設計參數的合理選取，即：小型化后的mpt ，喉徑小、工質流量小，消耗的微波功率也小。
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