緻密晶粒 的英文怎麼說
中文拼音 [zhìmìjīnglì]
緻密晶粒
英文
compact-grain-
It is found that the nano material is distributed not only among general material grains to form inter - granular structure of the coating but also in the general material grains to form intra - granular structure. micro - crack caused by laser will be eliminated greatly. 3 mechanical performances of the ceramic coating manufactured are tested
得到的結論是經過激光熔覆后的塗層緻密化程度有了很大的提高,比單純的激光重熔塗層還高,納米顆粒不僅填充在晶粒之間,而且還嵌入在大晶粒內部,有利於消除激光作用產生的微裂紋。It was concluded that, the structure of ito thin films were influenced by many working parameters such as substrate temperature, oxygenous pressure and substrate and so on. it was indicated by sem spectra of zno thin films that the surface of the sample was leveled off, and the crystals were felsitic
結果表明,對于ito薄膜,薄膜的光電性能薄膜結構的擇優取向性和與襯底溫度、濺射氧氣壓等工藝參數有很大關系, ito薄膜的sem表明,樣品表面較平整,且晶粒也比較緻密。Components, structure and surface morphology of the resulted films were identified by fourier transform infrared ( ftir ) spectroscopy, x - ray diffraction ( xrd ) and scanning electronic microscopy ( sem ). the analyses showed the content of cubic boron nitride in the resultant films on substrates was rather high and crystal particles of c - bn with uniform size, smooth crystal plane and regular shapes ( quadrangle and hexagon ) densely arrayed on the substrate
傅里葉轉換紅外吸收( ftir )光譜儀、 x射線衍射( xrd )儀和掃描電鏡( stm )的測量結果顯示,基底上的bn膜中立方相含量很高,且晶粒大小均勻、排列緻密,晶形呈規則的四角和六角形。W - cu composites prepared from the precipitation w - cu powder have higher sintered density, better mechanical and physical property, more homogeneous and finer microstructure than those prepared from w - cu powder by the balling - reduction method. in chapter 5, a combination of homogeneous precipitation and ball - milling process, namely the mechano - thermochemical process was employed to prepare ultra - fine w - cu powder
其中,球磨w一cu復合粉( hp一m )壓坯在1150下燒結30min后,可獲得相對密度大於99 %的幾乎全緻密的超細晶粒w一cu復合材料, w的顆粒度小於0 . 5林m 。Sem results imply that the surface of thin films deposited by chemical bath method is correlate to the reaction conditions. surface of sns thin films deposited by chemical bath method are coarse than thin films deposited by chemical bath with ultrasonication method and successive ionic layer adsorption and reaction method
Sem結果顯示用常規化學浴方法所制備的薄膜樣品的表面形貌與反應條件有關,而用超聲波輔助化學浴和連續離子反應法制備的薄膜樣品的表面較之常規化學浴方法所得到的薄膜樣品表面晶粒細小均勻,緻密平整。Automatic temperature coutrol can precisely control the crystalization temperature to ensure grain structure, mechanically controlled casting die speed is used to ensure the density of material
自動溫控系統對結晶溫度實施準確控制以確保晶粒結構(金相)符合要求。機械控制恆定的鑄造結晶速度以保證材質的緻密性。It was also the egyptians who pulverized it into powder and mixed it into a paste to apply to the eyelids, one of the first forms of makeup
青金石屬架狀結構硅酸鹽中的方鈉石族礦物,晶體形態呈菱形十二面體,集合體呈緻密塊狀、粒狀結構。The research history of fullerene and cnts was short, but their characteristics have great value in practical application. metallic nano - particles have different crystal orientation with different synthetical techniques. their special mechanical, optical and electrical properties will drive the development of magnetic materials, electronic materials and optical materials et. al
納米金屬粒子在不同的制備工藝下具有不同的結晶形態,而且其具有的特殊的力、熱、光、電、磁的性質,引起了在磁性材料、電子材料、光學材料、高緻密度材料等方面的應用。The x - ray diffraction, scanning electronic microscope and the squid were used to characterize the properties of the mgb2 core in mgb2 / fe tapes and wires. the effect of the proportion of mg, b and sic as well as the sintering parameters on the phase formation, microstructure and the critical current densities of mgb2 / fe tapes and wires was discussed in details. the results showed that the high purity of mgb2 core could be synthesized by both the traditional vacuum sintering and the sparking plasma sintering and the vacuum sintering environment restrained the oxidation of mg effectively
相對于傳統真空燒結, sps燒結方式成相速度快、樣品晶粒細小均勻、 mgb2超導芯緻密性好、晶間連接優良,因而sps燒結樣品的臨界電流密度明顯高於傳統真空燒結樣品,其中未摻雜的帶材樣品經過sps800 , 15分鐘燒結后,自場下的臨界電流密度jc值在10k時達到8 . 64 105a / cm2 ,而且隨著測量溫度和外加磁場的增加, sps燒結樣品的臨界電流密度下降率比傳統真空燒結樣品緩慢,在20k ,自場時為5 . 97 105a / cm2 , 20k , 3t時,臨界電流密度值仍大於104a / cm2 。The one deposited at 300 substrate temperature owns denser crystallites. during the annealing process, with the increasing of annealing temperature, the crystallites become bigger, and crystalline phase begins to transfer. when the annealing temperature gets to 800, tio2 transfers to rutile structure completely
( 2 )常溫下制備的tio _ 2薄膜是無定型的, 300濺射薄膜表面有緻密的晶粒,熱處理溫度升高,晶粒變大,晶相開始轉化, 800退火tio _ 2完全轉化為金紅石結構。Determined by dsc. whereafter, the surface micro - morphology of both sides of tini sma thin film deposited on glass was investigated by atomic force microscope ( afm ), and the difference of morphology between the two sides is observed. it has been shown that, in the growing surface of sputtered tini film, the trend of grain to accumulating along the normal direction like a column is clearly observed, and the grain is very loose which resulted in more microcavities, but in the surface facing to glass substrate, grain is so compact that there are hardly microcavities
通過濺射法,在玻璃襯底上淀積了tini薄膜,並在600進行了真空退火, dsc法測得其馬氏體逆相變峰值溫度為75 ,利用原子力顯微鏡,對玻璃基tini形狀記憶合金薄膜的襯底面與生長面進行了表面微觀形貌分析,發現:生長面晶粒呈現出沿薄膜法線方向柱狀堆積的趨勢,晶粒緻密性差,微孔洞多;而襯底面晶粒緻密,幾乎沒有微孔洞存在。The results show that a certain extent, the other parameters constant, increasing power, increasing scanning speed, small grains become more dense ; the good and bad of metallurgical belt, the cellular crystal thickness and the availability and distribution of inclusions are affected by the parameters
結果表明:在一定范圍內,其它工藝參數不變,增加功率,增大掃描速度,晶粒更趨緻密細小;工藝參數影響冶金結合帶的優劣、胞狀晶區的厚薄以及夾雜物的有無和分佈。Sem results show tin films appear compact and plane in different n2 partial pressure, and there is no big crystal grain appearance on the surface of tin films. tem and afm results tin films have the column structure, and the surfaces of the films are accumulated by crystal grain. in the second part of the thesis the effect of heat treatment processing on the optical properties and structure of the tin films is studied
Tem測試結果顯示,薄膜表面是由tin晶體顆粒堆積在一起,呈柱狀結構afm測試結果表明, tin薄膜呈柱狀結構;在氮氣分壓較小時, tin薄膜表面比較平整,顆粒細小;隨著氮氣分壓的增加, tin薄膜表面顆粒逐漸增大;相同氮氣分壓下,氬氣分壓較小時制備的tin薄膜較為緻密。In addition, the nb ( oc2hs ) 5 - precursor sbn thin films doping the k + were crystallized with preferred c - axis orientation which is similar with the orientation of the nbcl5 - precursor sbn films
Sbn薄膜表面粗糙度ra為12nm ;加了mgo緩沖層的sbn薄膜更加緻密,結晶顆粒更小,表面也更平整, ra為4nm 。The surface of ceramic is smooth, densification and no crackle
由sem分析可知其晶粒分佈均勻、表面平整、緻密、無裂紋。The analysis of microstructure of samples showed that the grain of tio2 were very small under 700, the distance of grain became small with temperature increasing, the rate and size of pore was decreasing. the relative density of sample at 900 was 97 % and the grain size of sintered body was about 200nm. when the temperature exceeded 1100, the grain size of body grew up several times ( > 2 m )
Tio _ 2燒結體sem顯微形貌分析表明:低溫( 700 )時坯體內顆粒無明顯長大,燒結體緻密度不高( 80 )晶粒間距隨溫度升高而變小,氣孔率也隨之降低,氣孔尺寸變小;當溫度超過900時,晶粒間連接緊密,燒結體內出現大量絮狀物質,緻密度大幅度提高,達97以上,小氣孔已聚集成大孔洞且分佈均勻,晶粒長大不明顯( 200nm左右) ;當溫度超過1100時,燒結體緻密度有所提高,但晶粒尺寸出現異常長大,長大了十幾倍(達2 m以上) 。Prepared technical parameters were optimized by l9 ( 34 ) experiment analysis. a unique method for cleaning and drying of substrate - cleaning used by scour, drying used by infrared light was fished out by large numbers of experiment. chemical mechnism of zno thin film prepared by sol - gel technique was discussed by dta for the first time. by the measurements of sem, xrd and uvs, the thin film was analysed. the result proved that the thin film with strongly preferred orientation of c - axis perpendicular to the substrate surface which surface was homogenous, dense and crackfree was the crystalline phase of hexagonal wurtzite. the thin film was composed of plentiful asteroidal crystal which crystal dimension approximately 10 30nm. the average transmittance of thin film in visible region was above 90 %. the results of measurements else also proved that the thickness of single dip - coating was 75 240nm, this films resistivity was found to be 3. 105 102 3. 96 105 ? cm. the thickness and resistivity of thin film influenced by dope - content, withdrawal speed, pre - heat - treatment, anealing were reseached respectively
利用xrd 、 sem以及uvs光譜儀等分析方法對薄膜進行了研究,結果顯示,所制備的薄膜為六方纖鋅礦型結構,具有高c軸擇優取向性;表面均勻、緻密,薄膜材料由許多星狀晶粒組成,晶粒尺寸大約為10 - 30nm左右;薄膜可見光透過率平均可達90 % ;對薄膜厚度以及電學性能進行了測定后發現:單次鍍膜厚度約為75 - 240nm , al ~ ( 3 + )離子摻雜型氧化鋅薄膜的電阻率在3 . 015 102 - 3 . 96 103 ? cm范圍內;分別研究了摻雜濃度、提拉速度、預燒溫度、退火溫度等工藝參數對薄膜厚度和電阻率的影響。Uniform micro - structure, compacted grain : melting iron is solidified by heavy spin force at right temperature, which effectively avoid the failures like blowhole, slag enclosure, pinholes and etc
組織均勻,晶粒緻密:溫度精確的合金溶液在上百倍的離心重力作用下凝固成型,得到緻密的組織;並有效克服了氣孔、夾渣、疏鬆等缺陷。Dense microstructure was detected in the pmzn piezoelectric ceramics with the sol - gel method synthesized pzt and the sol - self - combustion method synthesized pzt as matrix respectively, exhibiting homogeneous grain sizes less than 1 u m
而且採用溶膠-凝膠法和溶膠-自燃燒法合成的pzt為基體制備的pmzn壓電陶瓷具有完全的四方相鈣鈦礦結構、燒結緻密度較好、晶粒分佈均勻、平均粒徑在1 m以下。The results show that the improved structure has obviously reduced pressure drop and increased axial speed of the nozzle, as a result the wallop of electroplating solution is improved and the thickness of diffused layer reduced, the electrodeposition process improved, and what is more, the coating structure has been compacted, crystalline particles fined and the performance improved
結果表明,結構改進后,明顯減小了壓力損失,提高了噴嘴的抽向速度,電鍍液沖擊鍍件的沖擊力得到提高,有效地減少了擴散層的厚度,改善了電沉積過程,而且使鍍層組織緻密,晶粒細化性能得到提高。分享友人