膜片的放置 的英文怎麼說

中文拼音 [mópiāndefàngzhì]
膜片的放置 英文
anlegen der membranen diaphragm contact
  • 膜 : 名詞1. [生物學] （像薄皮的組織） membrane 2. （像膜的薄皮） film; thin coating
  • 片 : 片構詞成分。
  • 的 : 4次方是 The fourth power of 2 is direction
  • 放 : releaseset freelet go
  • 置 : 動詞1. （擱; 放） place; put; lay 2. （設立; 布置） set up; establish; arrange; fix up 3. （購置） buy; purchase
  • 放置 : lay up; lay aside; place
  1. Promax tension ind corp has long sold and manufactured a variety of custo mized air shafts / air chucks / safety chucks, edge position control systems / epc, powder / air / disk brakes and clutches, ac / dc motor control systems, re - winding / un - winding systems, tension control systems, web inspection systems, automatic color register systems, servo - vector control systems, mmi interface and supervisory control and data acquisition ( scada ) systems and others such as slitting, winding, laminating, extruding, coating, and gravure printing machines, even other auxiliary devices etc. for webs such as paper, films, rubber, textiles and foils

    本公司長久以來已經從事製造及銷售有關紙類，薄膜，膠片，紡織品，橡膠等薄片卷材的捲筒物控制糸統周邊設備，諸如氣漲軸，氣漲/安全夾頭，邊緣追蹤器裝置，磁粉/氣壓/碟式煞車器及離合器，交直流轉矩馬達控制系統，收放料車動系統，張力控制裝置，印刷機靜態觀測器，自動套色控制裝置，伺服向量控制系統，人機介面及監控系統及其他有關印刷，貼合，分條，復? ，塗布，上膠，押出，淋膜等產業機械
  2. ( 2 ) compared with control sample, naf treatment can reduce the quantity of both chlorophyll ' s fm and membrance proteins " fem ecited at 278nm and 295nm

    （ 2 ）弱光放置相同時間， naf處理葉片的葉綠素和類囊體膜蛋白內源熒光強度熒光強度均小於參照樣的熒光強度。
  3. We confer naf treatment may inhibit the recovery of chlorophyll ' s capacity of electronic transportation and effect the change of the influorescence of membrance proteins under the lowlight

    表明naf處理不但對弱光放置樣品的葉綠素傳遞電子能力有阻礙作用，還影響弱光修復中葉片類囊體膜蛋白內源熒光的變化。
  4. Samples are prepared at 1100 and 1200 for different time from 5 minutes to 4 hours to study direct - nitridation kinetics. the thickness of the silicon nitride films is measured by single - spot thickness system produced by filmetrics co. ltd. the direct - nitridation kinetics curve is attained and the maximum thickness of the silicon nitride film is about 50nm

    為研究矽片氮化動力學，在1100和1200的溫度下制備了從5分鐘到4小時的各個氮化時間的樣品，並採用了不同晶面取向的矽片和不同的矽片放置位置，用filmetrics公司生產的f20型膜厚測量儀測得各個樣品的厚度，得到了實際的氮化動力學曲線和氮化薄膜的最終膜厚約為50納米，氮氣曲線較好地符合了氣固反應類型的動力學曲線。
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