蝕刻劑 的英文怎麼說
中文拼音 [shíkèjì]
蝕刻劑
英文
etchant-
More often, all of the materials exposed to the etchant have a finite etch rate.
通常，所有暴露在刻蝕劑中的材料都具有一定的刻蝕速率。Electron-beam lithography with a novel multilevel resist structure defines the pattern.
採用新型的多層抗蝕劑結構的電子束光刻來形成圖形。Therefore, the imaging characteristics of thick resist photolithograph are investigated in this paper based on the exposing and developing theories of thin film resists. firstly, the influences of nonlinearities in imaging process of thick resist lithography are studied
本論文以抗蝕劑的曝光顯影理論為基礎，深入開展了厚層抗蝕劑的成像特性的研究，可為厚膠光刻實驗提供指導依據。Determining effective adhesion of photoresist to hard - surface photomask blanks and semiconductor wafers during etching
測定在蝕刻期間光致抗蝕劑同硬表面光掩膜坯及半導體片的有效粘附性Testing of materials for semiconductor technology ; determination of etch rates of etching mixtures ; silicium - dioxid coating ; optical method
半導體工藝材料的檢驗.蝕刻混合劑浸蝕率的測定.第2部Testing of materials for semiconductor technology ; determination of etch rates of etching mixtures ; silicium monocrystals ; gravimetric method
半導體工藝材料的檢驗.蝕刻混合劑浸蝕率的測定.第1部Alkaline etching catalyst
鹼性蝕刻活化劑The principle, theory, realizing methods for holographic lithography as well as the pattern transfer mechanism among the traditional photomask - hologram mask - resist have been deeply investigated. an experimental system with total inner reflection wavefront conjugation holographic lithography using right angle prism and refractive index matching liquid is designed and built, and the experimental research is carried out
對全息光刻的原理、理論、實現方法及傳統光掩模?全息掩模?抗蝕劑圖形傳遞機理進行了深入的研究，設計和建立了採用直角棱鏡和折射率匹配液的全內反射波前共軛全息光刻實驗系統，進行了實驗研究。Granule etching additive
紋理蝕刻劑Nuclear particle track - etched anti - counterfeit marking is a new weapon against fake products. the mark is manufactured by intricate high technology in state - controlled sensitive nuclear facilities which ensures that the mark can not be copied. the pattern of the mark is characterized by its permeability, and can be distinguished from fakes by using a transparent liquid ( e. g. water ), colored pen or chemical reagent. the technique has passed the official health safety examination and poses no danger of nuclear irradiation
用核粒子照射塑料薄膜形成徑跡，再經化學試劑蝕刻和成像技術，得到由微米級微孔組成的圖案.這種圖案具有物質透過特性.用這種方法生產的核徑跡防偽標志，具備核尖端技術不易擴散，製作設備不易得到，產品用其他方法難以偽造，防偽識別簡單、快速、可靠等特點.此種標志已經通過放射性安全檢測，可以用於各種商品（包括食品）的包裝The studies expressed that the tensile - strength declined with the growth of dose rate after the radiation treatment, and at the same time, the gel content had extreme value with the change of the dose rate. the surface of uhmwpe fibers showed some irregular micro - pits and dents after radiation treatment, narnely rough degree increasing. their number and deepness increased with increase of dose. and this phenomenon is the most obvious when the dose rate was 8. 5kgy / s and the dose was 400kgy. at the same time some containing oxygen groups, including hydroxyl group, carbonyl group and carboxyl group, were introduced into the fiber surface which was exposed to the air
研究表明， uhmwpe纖維經電子束輻照處理后，纖維的拉伸斷裂強度隨劑量率的增加呈下降趨勢，凝膠含量隨著劑量率的變化存在極值。纖維表面出現了不規則的微裂紋和凹痕，隨著劑量的增大，電子束對纖維表面的刻蝕程度增加，在本研究中以劑量為400kgy劑量率為8 . 5kgy s時刻蝕效應最為明顯。同時，在空氣中進行輻照時，纖維表面被引入了一些含氧基團，包括羥基、羰基和羧基。Testing of materials for semiconductor technology - determination of etch rates of etching mixtures - part 3 : aluminium, gravimetric method
半導體技術試驗.蝕刻混合劑浸蝕率測定.第3部分:鋁.測It has broad application prospect in the following fields such as microelectronics, photoelectronic devices, large screen flat panel display, field emitter array, acoustic surface wave device, photon crystal, light waveguide array, holographic honeycomb lens and micro - optical element array, micro - structure manufacture, fabrication of large area grating and grid of high resolution, photoresist performance testing, profile measurement and metrology, etc. the paper only involves the primary research of interferometric lithography
在微電子、光電子器件、大屏幕平板顯示器、場發射器陣列、表面聲波器件、光子晶體、光波導陣列、全息透鏡和微光學元件陣列、微結構製造，高分辨、大面積光柵和網格製造，在抗蝕劑性能測試、面形測量和計量等領域，干涉光刻技術都具有廣闊的應用前景。From the simulation of peb process, we prove that peb could reduce standing wave effects and improve resist development profile. after analyzing the effects of standing wave effects on resist profiles, we bring forward a certain thickness and these effects could be ignored when resist is beyond that value. finally, the characters of thick resist profile are analyzed, and experiment results are also given
同時，在論文中還深入討論了抗蝕劑折射率變化對光場計算帶來的誤差；模擬了后烘過程對駐波效應的改善作用，論證了採用適當的后烘工藝改善抗蝕劑光刻質量的作用；分析了駐波效應對厚層抗蝕劑顯影輪廓的影響，提出了一個可以忽略駐波效應影響的抗蝕劑厚度條件值；最後還模擬和分析了厚層抗蝕劑顯影輪廓特點並給出了實驗結果。A lot of micro machining technologies are developed to fabricating memss. recently, lithograph of thick resist has been regarded as an effective and economical technology for manufacturing excellent high - aspect - ratio microstructures ( harms )
近年來，作為製作優質大高寬比微結構的厚層抗蝕劑光刻術以其工藝簡單、製作成本低等優點受到國際上廣泛重視。Regular arrays of gan nanorods have been synthesized by reacting gallium and ammonia using au as a catalyst on mgo single crystal substrate treated by chemical etching
通過金屬鎵與氨氣反應，在經化學刻蝕后的mgo單晶基片表面，以金作催化劑制備出規則排列的gan納米棒陣列。Pilot - scale evaluation of corrosion and fouling control additives for open recirculating cooling water systems
再循環冷卻水系統的腐蝕性和污垢控制添加劑的導柱刻度評價分享友人