衍射線條 的英文怎麼說

中文拼音 [yǎnshèxiàntiáo]
衍射線條 英文
diffraction line
  • 衍 : [書面語]Ⅰ動詞（開展; 發揮） spread out; develop; amplifyⅡ形容詞（多餘） redundant; superfluousⅢ名...
  • 射 : Ⅰ動詞1 （用推力或彈力送出） shoot; fire 2 （液體受到壓力迅速擠出） discharge in a jet 3 （放出） ...
  • 線 : 名詞1 （用絲、棉、金屬等製成的細長的東西） thread; string; wire 2 [數學] （一個點任意移動所構成的...
  • 條 : Ⅰ名詞1 （細長的樹枝） twig 2 （條子） slip; strip 3 （分項目的） item; article 4 （層次; 秩序; 條...
  • 線條 : 1. [美術] line （in drawing） 2. （人體等的） lines; figure
  1. The effort of manganese removal was studied and the kinetics of manganese removal was tried to establish. the factors of dissolved oxygen concentration, fe2 + concentration, ph, p concentration and closing of the filter were studied to evaluate their effort for biological manganese removal, and the correlation of residual manganese and oxidation - reduction potential was also discussed. as the iron content of water was high, experiment results showed that the reaction was zero order, as the iron content of water was low, the reaction was first order. the time needed for the cultivation of biological manganese removal was 60 70 days. the filter operated at the filtration rate of 8 10m / h, silica sand of effective size 0. 95 1. 25mm filled the filter to a depth of 1200mm

    試驗結果表明，成熟后濾砂表面濾膜的x射線衍射圖譜與mno _ x ? 5h _ 2o （ x = 1 . 86 ）的x射線衍射圖譜一樣，濾膜成熟后的結構在進水物質不發生變化的情況下不發生變化;合適的碳磷比對生物除錳有明顯的促進作用，試驗條件下的投磷量不會對出水造成二次污染;生物除錳需要亞鐵的參與，亞鐵的存在除了能夠促進微生物分泌胞外酶並刺激其活性外，還通過鐵離子的變價傳遞電子，催化錳離子的氧化反應，從而促進對二價錳的降解。
  2. Then the molybdenum disulfide nanoparticles which size was in the range of 20 - 30 nm were prepared by the desulfuration of molybdenum trisulfide if taking hydrogen as a protection atmosphere at some temperature. the mos2 nanoparticles were then characterized by x - ray diffraction and transmission electron microscope. the mos2 nanoparticles and commercial common mos2 particles ( c. a

    將乾燥后的三硫化鉬粉末在氫氣保護氣氛條件下，加熱脫硫得到粒徑在20 30nm之間的納米二硫化鉬顆粒，用x射線衍射儀（ xrd ）和透射電子顯微鏡（ tem ）對二硫化鉬納米顆粒進行了表徵。
  3. Instrument for straightness measurement using non - diffracting beam and moir 233 ; fringe

    無衍射光莫爾條紋法直線度測量儀
  4. Abstract : the property of silk fabric grafted ( cross - linked ) with hydroxypropyl methacrylate and protein at different rate of weigh gain, by measuring strength and elongation at break, dyeability, elastic, moisturecontent, whiteness, permeability of gas, ir and x - ray diffraction diagrams was studied

    文摘:通過對織物的拉伸特性、吸濕性、彈性、染色性、白度、透氣性、紅外和x射線衍射的研究，探討了在不同增重率條件下甲基丙烯酸羥丙酯在絲蛋白存在下與真絲綢接枝交聯后的結構及其特性的影響。
  5. And then, we measured x - ray diffractive spectrum of samples and investigated the crystal lattice structure of samples treated under different annealing temperature and different implantation condition comparing the diffraction peaks

    然後，通過x射線衍射測量了樣品的衍射譜，通過比較不同樣品衍射峰的形狀，了解了不同退火溫度及注入條件下樣品的晶格結構情況。
  6. The techniques of preparing film buffer layers on si were studied. the sem, tem and xrd were adopted to study the crystal structure of films. the influences of buffer layers, substrate and heat treatment condition on the crystal structure and performance of the ybco films were discussed

    進一步用掃描電鏡、透射電鏡和x射線衍射儀研究了薄膜組織結構和結晶情況，分析了緩沖層和襯底對ybco薄膜制備的影響、以及不同熱處理條件對薄膜結晶結構及性能的影響。
  7. Furthermore, the growth and the study of self - organized quantum dots structures become more and more important recently, and the application of self - organization technique become wider and wider in this thesis, we address the theory of film growth and the growth technique firstly more, the ways and characteristics of surface detection are prescribed we mainly report the growth process, results and discuss of self - organized quantum dots structures in the a12o3 substrates by s - k mode using ecr - mocvd, in the espd - u device the growth art of ain epilayer which is the preliminary foundation of self - organized gan / ain quantum dots structures, including the substrate cleaning, nitridation, the growth of buffer and the growth of gan and ain epilayer, is discussed we deliberately compare the test result of rheed xrd and afm and achieved the optimalized condition of ain at last we have successfully realized the growth of ain which is much smooth and better crystal quality moreover, we grow the self - organized gan / ain quantum dots structure in s - k mode because the limits of the heater temperature, we can not grow the atom - smooth epilayer of ain until now so we could not grow better quantum dots which have small diameter and big density but the self - organized quantum dots structures with better quality will be realized successfully if the substrate temperature is increased the thesis study belong to my tutor subject of national nature science foundation ( 69976008 )

    本論文主要論述了在espd - u裝置上，採用電子迴旋共振等離子體增強mocvd （ ecr - pamocvd ）方法，在藍寶石襯底上通過s - k模式自組裝生長gan aln量子點結構的生長工藝、結果及討論。而重點分析了自組裝生長量子點之前的aln外延層生長工藝，包括襯底清洗、氮化、緩沖層的生長和gan 、 aln外延層的生長；通過高能電子衍射、 x射線衍射和原子力顯微鏡測試，並且對這些測試結果進行了詳細的比較研究，得出了較優化的工藝條件，生長出了晶質較好、表面較平整的aln外延層；進而採用s - k模式自組裝生長了gan aln量子點結構。由於實驗裝置加熱爐溫度的限制，我們沒有能夠生長出原子級平滑的aln外延層表面，因而沒能夠生長出密度比較大和直徑比較小的量子點。
  8. Current researches, applications, preparation and structure of si3n4 are summarized in this paper. a new conclusion is drawn that silicon wafer can react with nitrogen at the temperature higher than 1100 and in super - pure nitrogen by direct - nitridation of silicon at the temperature from 800 to 1200. the prepared silicon nitride samples are tested by xps ( x - ray photoelectron spectroscopy ), sem ( scanning electron microscopy ), optical microscopy, xrd ( x - ray diffraction ) and edx ( energy dispersive x - ray analysis )

    通過矽片在800到1200各個溫度和各種氮氣氣氛下的氮化處理的實驗結果，報道了不同與其他研究者的氮化條件，矽片在氮氣保護的熱處理中的氮化條件為：高於1100的溫度和高純氮的氣氛條件，同時對該氮化硅薄膜進行了金相顯微鏡、掃描電鏡（ sem ） 、 x射線衍射儀（ xrd ） 、 x射線光電子譜（ xps ） 、 x射線能譜儀（ edx ）和抗氧化性等測試和分析。
  9. And then, zno thin films were synthesize on quartz and silicon substrates by sol - gel dip - coating and spin - coating. the properties of the films and the effects of growth parameters on the quality of zno films were studied using x - ray diffraction, optical absorption, photoluminescence techniques, etc. to modify the energy gap of the zno, mg2 + was added in the sol - gel solution, and mgxzn1 - xo films were prepared by the same method as that for zno films

    利用溶膠凝膠法成功地在石英玻璃和單晶矽片等襯底上制備出了c軸擇優取向的zno薄膜，並利用x射線衍射儀、紫外-可見光光譜儀、熒光光譜儀等對zno薄膜的結構和性能進行了測試、分析，並研究了熱處理參數等條件對zno薄膜性能的影響。
  10. In this paper the formula, the technics, the dosage of the filler and the macromolecule coupling agent are studied which influence the technics condition, mechanical properties, structure configuration. also x - ray large angle diffraction, scan electron microscope, dta etc are used to analysis and test the properties of the pp / talc composites. conclusions as follows : 1

    本文系統地研究了復合體系配方、工藝方法、填料及偶聯劑用量對復合體系工藝條件、力學性能及結構形態的影響，同時利用廣角x射線衍射、掃描電鏡、 dta等對復合體系的性能進行了測試與分析，主要研究內容及結論如下： 1滑石粉的加入，雖然使pp的熔化時間增加，但是混煉能耗下降，有利於pp的加工；偶聯劑的加入，使pp的熔化時間增加，能耗略有降低，總體而言，對加工無不利影響。
  11. The constitutive equations were gained by regression analysis and some material constants were derived from that with the aid of om, x - ray, sem and tem, the deformation structure of the mid - strength weldable 1420aluminum - lithium alloy on different hot deformation conditions was studied and the soften mechanism was discussed. at the same time, the fracture behavior has been studied as an important part. the fracture mechanism of 1420 aluminum - lithium alloy was confirmed

    結合金相顯微鏡、 x -射線衍射、掃描電鏡、透射電鏡等現代化的試驗手段，研究了中強可焊1420鋁鋰合金熱變形不同變形條件下的組織變化及軟化機制，分析了不同變形條件對合金材料組織變化的影響，確定了合金材料的軟化行為機理；同時，結合合金材料的熱變形高溫拉伸試驗，重點研究了材料的斷裂行為，分析了合金材料的斷裂現象，探討了合金材料的斷裂機理。
  12. The molecular structure of the sputtered titanium oxide films were investigated by xps and x - ray diffraction. it was found that the ratio of ti / o increases when pressure increases, and there is a optimum ratio of ar / o2 for the sake of obtaining more tio2 on pet surface

    利用x射線衍射法（ x - ray ）對濺射沉積膜的表面物相結構進行了研究，發現在本實驗室條件下濺射生成的膜均是無定型結構。
  13. Using the microwave selective heating property for materials, by setup equivalent equation, and first time inducing the electromagnetic field perturbation theory to the design of heating materials for substrate in mpcvd, three temperature distribution modes were established, including temperature distribution comprehensive mode of inhomogeneous plasma, temperature distribution composite mode of composite substrate materials, temperature distribution perturbation mode of composite materials, which ii provided an whole new technology route to the design of substrate heating system in mpcvd and guided the preparation of heating materials for substrate. and then the heating materials for substrate were designed and optimized to obtain large area homogeneous temperature distribution even larger than substrate holder ' s diameter. as an important part, this thesis researched the nucleation and growth of diamond films in mpcvd, systematically researched the effects of substrate pretreatment, methane concentration, deposition pressure and substrate temperature etc experimental technologic parameters on diamond films " quality on ( 100 ) single crystal silicon substrate in the process of mpcvd, characterized the films qualities in laser raman spectra ( raman ), x - ray diffraction ( xrd ), scanning electron microscopy ( sem ), infrared transmission spectra ( ir ), atomic force microscopy ( afm ), determined the optimum parameters for mpcvd high quality diamond in the mpcvd - 4 mode system

    該系統可通過沉積參數的精確控制，以控制沉積過程，減少金剛石膜生長過程中的缺陷，並採用光纖光譜儀檢測分析等離子體的可見光光譜以監測微波等離體化學氣相沉積過程；利用微波對材料的選擇加熱特性，通過構造等效方程，並首次將電磁場攝動理論引入到mpcvd的基片加熱材料的設計中，建立了非均勻等離子體溫度場綜合模型、復合介質基片材料的復合溫度場模型及復合介質材料溫度場攝動模型，為mpcvd的基片加熱系統設計提供了一條全新的技術路線以指導基片加熱材料的制備，並對基片加熱材料進行了設計和優選，以獲取大面積均勻的溫度場區，甚至獲得大於基片臺尺寸的均勻溫度區；作為研究重點之一，開展了微波等離體化學氣相沉積金剛石的成核與生長研究，系統地研究了在（ 100 ）單晶硅基片上mpcvd沉積金剛石膜的實驗過程中，基片預處理、甲烷濃度、沉積氣壓、基體溫度等不同實驗工藝參數對金剛石薄膜質量的影響，分別用raman光譜、 x射線衍射（ xrd ） 、掃描電鏡（ sem ） 、紅外透射光譜（ ir ） 、原子力顯微鏡（ afm ）對薄膜進行了表徵，確立了該系統上mpcvd金剛石膜的最佳的實驗工藝參數。
  14. With sem, x - ray diffraction analysis, magnetic measurement by magnetic property measurement system, the effects of growth and annealing conditions are analyzed

    超導薄膜，採用磁測量m - t x射線衍射掃描電子顯微鏡技術分析了各種沉積及退火條件對mgb
  15. In the process of the deposition of the pyrolytic graphite grid ’ s rough, experiment which adopts same discharge and proportion of those gases at different temperature has been done, the test which adopts different discharge and proportion of those gases at same temperature to deposit grid ’ s rough has also been done. at same time, the test which adopts different dilute gases at same technological condition to deposit the grid ’ s rough has been done. in order to obtaining the grid ’ s rough which thickness is able to use, the test has been done at different temperature and depositional time

    在研究過程中，試驗了在不同溫度下採用相同的氣體比例和流量沉積熱解石墨柵極毛坯;還試驗了在相同溫度下，採用不同的氣體比例、不同的流量沉積熱解石墨柵極毛坯;同時，試驗了在相同工藝條件下採用不同的稀釋氣體沉積石墨柵極毛坯;為了獲得厚度合適的石墨柵極毛坯，試驗了不同溫度下採用不同的沉積時間來沉積毛坯;對不同溫度下沉積的毛坯進行了x射線衍射分析、密度分析及晶相分析。
  16. The relationship between sputtering conditions and the depositional speed shows : with working pressure 1. 2 pa, sputtering power 180w, the depositional speed of tio2 thin film is 40nm / h, and increases with the increasing of sputtering power. it can be also founded that the depositional speed is nearly proportional to the working pressure : within the range of 0. 3pa to 1. 6pa, the depositional speed increases linearly with the increase of ar pressure. with the enhancement of the substrate ' s temperature of sputtering or annealing, the resulted thin films show a tendency of decreasing in thickness, and increasing in refractivity

    本實驗是採用磁控濺射方法，在不同的溫度下制備了tio _ 2薄膜，並對薄膜進行了不同溫度和時間的退火處理，通過原子力顯微鏡（ afm ） 、 x射線衍射（ xrd ） 、掃描電鏡（ sem ）等檢測手段對薄膜的表面形貌和組成結構進行了分析，結果如下： （ 1 ）濺射工藝條件與薄膜沉積速度的關系表明：採用1 . 2pa工作氣壓， 180w的射頻功率tio _ 2薄膜的沉積速率為40nm h ，並隨射頻功率的增加而提高，呈近似的線性關系，在0 . 3pa 1 . 6pa氣壓范圍中，氬氣壓強升高沉積速率迅速增加，濺射溫度提高和退火處理能使薄膜的厚度減小和折射率提高。
  17. ( 2 ) computational simulations on in - line holography of single particle, multi - particle in one plane and particle field ( multi - layer ) are performed. a technique to find the focal plane is given according to the gray - gradient curve of the particle image. an improved numerical reconstruction method is proposed, which can eliminate the border diffraction

    （ 2 ）對同軸粒子全息圖的記錄和再現過程進行了數值模擬，提出了根據灰度梯度曲線判斷粒子成像平面的方法，同時提出了一種可有效消除全息圖邊框衍射條紋的改進演算法。
  18. Specification for x - ray diffractometer

    X射線衍射儀.技術條件
  19. Based on the experiment and analysis, the optimum conditions for preparation of si02 films have been studied. furthermore, using the inverse designing idea of fgms, fe / mo and mo / sio2 fgms have been successfully prepared. finally, the composition and microstructure of the materials have been measured by x - ray debey powder diffraction ( xrd ), x - ray photoelectron spectroscopy ( xps ), scanning electon microscope ( sem ), step instrument and metallgical microscope

    在系統實驗的基礎上探討sio _ 2薄膜沉積工藝條件及其影響因素，獲取了sio _ 2薄膜的最佳工藝條件；採用功能梯度材料（ fgm ）的逆設計思想，在最佳沉積條件的基礎上成功制備出fe mo和mo sio _ 2功能梯度材料，並以x射線衍射， x射線光電子能譜，電鏡掃描，膜臺階儀，金相顯微鏡等手段對材料進行成分測定和表面形態結構分析。
  20. The tuning curve of type - i phase matching of bbo opo are measured with accuracy ; the maximum conversation in total of the system is about 31 % at 615. 6 nm, and it is fitted well with the gtp formula ; in the end we compared the output linewidth and unstable cavity far field beam qua lity of the bbo opo under the condition of type - i phase matching and type - ii phase matching, it is proved that we can obtain the parametric output of linewidth less than 0. 3 nm and the beam divergence angle approaching diffraction limits by take the advantages of type - ii phase matching and unstable cavity designs

    測量了該系統的轉換效率最大為31 ，並能與理論公式極好地吻合，最後比較了在類相位匹配條件下和類相位匹配條件下的bbo - opo的輸出線寬，以及非穩腔的遠場光束質量，實驗結果表明，利用類相位匹配以及非摘要穩腔設計可以獲得線寬小於0 3nlm 、光束發散角接近衍射極限的參量光輸出。
分享友人
分享到 Line

分享到臉書