離子電鍍法 的英文怎麼說

中文拼音 [lízidiàndùfǎ]
離子電鍍法 英文
ion plating
  • 離 : Ⅰ動詞1 （離開） leave; part from; be away from; separate 2 （背離） go against 3 （缺少） dispens...
  • 子 : 子Ⅰ名詞1 （兒子） son 2 （人的通稱） person 3 （古代特指有學問的男人） ancient title of respect f...
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 鍍 : 動詞（用電解或其他化學方法使一種金屬附著到別的金屬或物體表面上） plate
  • 法 : Ⅰ名詞1 （由國家制定或認可的行為規則的總稱） law 2 （方法; 方式） way; method; mode; means 3 （標...
  • 離子 : [物理學] ion
  • 電鍍 : electroplate; electroplating; electrofacing; （electric） plating; electrocladding; galvanize; ga...
  1. This product is the newest filming technique, the latest achievement of usa electronic magic, it utilizes decomposition principle of electronic material to form a positive negative ions film on the surface of car coating, which has high water repellency and makes the surface of coat has more than 95 % brightness of mirror surface, lt has preeminent performance on weathering resistance, ageing resistance, oxidation resistance static resistance and wear resistance, with the force of charged ions, this product can easy removes the dirt, water drop acid rain and grease on the surface of the film and perennially and effectively protect coat surface, lt is the fourth generation car beauty and protective product which replaces glaze sealing products

    本品屬于當今最新的鍍膜技術，屬美國電子工學魔法的最新成果，它利用電子物質的分解原理，在車漆表面生成持有高撥水性的正負離子覆膜，使漆面光亮度可達鏡面光澤的95 %以上，並具有超強的耐候性、抗老化、防氧化、防靜電、耐磨性極好的功能，它利用電離子的力量，可輕松彈去覆膜表面的污垢、水滴、酸雨、油脂等，平時只需清水沖洗，便可立即使之恢復離子效應，達到長期保護漆面的目的，是取代封釉的第四代汽車美容保護產品。
  2. Removal and recovery chromic acid from electroplating waste by ion exchange

    離子交換法去除與回收電鍍廢水中鉻酸的實驗研究
  3. J. r. stevens et al., “ electrochromism of wo3 - based films in contact with a solid li - doped siloxane elastomer electrolyte, ” applied optics, 26, pp. 3489 - 3490, 1987

    鄭耀爵， 「以離子束濺鍍法制備氧化銦錫薄膜之光學、電學及可靠性質之研究， 」國立成功大學，碩士論文， 2003 。
  4. Methods for analysis of plating black nickel solutions part 1 : determination of ammonium nickel sulfate content by ion selective electrode method

    電鍍黑鎳溶液分析方法第1部分:離子選擇電極法測定硫酸鎳銨的含量
  5. Least sweep voltammetry method was employed to study h2po2 - anodic oxidation and ni2 + cathodic reduction in electroless nickel plating solutions containing different complexing agents

    運用線性電位掃描法，研究了含有不同絡合劑的化學鍍鎳溶液中鎳離子陰極還原行為和次磷酸鹽陽極氧化行為。
  6. Prepared technical parameters were optimized by l9 ( 34 ) experiment analysis. a unique method for cleaning and drying of substrate - cleaning used by scour, drying used by infrared light was fished out by large numbers of experiment. chemical mechnism of zno thin film prepared by sol - gel technique was discussed by dta for the first time. by the measurements of sem, xrd and uvs, the thin film was analysed. the result proved that the thin film with strongly preferred orientation of c - axis perpendicular to the substrate surface which surface was homogenous, dense and crackfree was the crystalline phase of hexagonal wurtzite. the thin film was composed of plentiful asteroidal crystal which crystal dimension approximately 10 30nm. the average transmittance of thin film in visible region was above 90 %. the results of measurements else also proved that the thickness of single dip - coating was 75 240nm, this films resistivity was found to be 3. 105 102 3. 96 105 ? cm. the thickness and resistivity of thin film influenced by dope - content, withdrawal speed, pre - heat - treatment, anealing were reseached respectively

    利用xrd 、 sem以及uvs光譜儀等分析方法對薄膜進行了研究，結果顯示，所制備的薄膜為六方纖鋅礦型結構，具有高c軸擇優取向性；表面均勻、緻密，薄膜材料由許多星狀晶粒組成，晶粒尺寸大約為10 - 30nm左右；薄膜可見光透過率平均可達90 % ；對薄膜厚度以及電學性能進行了測定后發現：單次鍍膜厚度約為75 - 240nm ， al ~ （ 3 + ）離子摻雜型氧化鋅薄膜的電阻率在3 . 015 102 - 3 . 96 103 ? cm范圍內；分別研究了摻雜濃度、提拉速度、預燒溫度、退火溫度等工藝參數對薄膜厚度和電阻率的影響。
  7. Determination of impurity cu and fe in electroplating solution by faas

    火焰原子吸收法直接測定電鍍液中銅和鐵離子
  8. With the development of thin film science and technology, various thin film preparation techniques developed rapidly, as a result, conventional so - called filming has developed from single vacuum evaporation to many new film preparation techniques, such as ion plating, sputtering, laser deposition, cvd, pecvd, mocvd, mbe, liquid growth, microwave and mtwecr, etc., of which vacuum evaporation is the common technology for thin film preparation, because it has the distinct advantage of high quality of film deposition, good control - ability of deposition rate and high versatility

    隨著薄膜科學與技術的發展，各種薄膜制備方法得到了迅速發展，傳統的所謂鍍膜，已從單一的真空蒸發發展到包括蒸鍍、離子鍍、濺射鍍膜、化學氣相沉積（ cvd ） 、 pecvd 、 mocvd 、分子束外延（ mbe ） 、液相生長、微波法及微波電子共旋（ mwecr ）等在內的成膜技術。其中電子束蒸發技術是一種常用的薄膜制備技術，它具有成膜質量高，速率可控性好，通用性強等優點。
  9. Coating metal such as cu, ni, ti, mo, w or compound coating on diamond grain ( dg ) surface by coating ( chemical, electronic plating ) and vacuum plating method ( evaporating, sputtering, ionization ) was studied

    摘要採用濕法鍍（化學鍍、電鍍）或真空鍍（蒸發鍍、濺射鍍、離子鍍）方法，在金剛石表面鍍覆一層銅、鎳、鈦、鉬、鎢等金屬，或者它們的復合鍍層。
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