電子束分析 的英文怎麼說

中文拼音 [diànzishùfēnxī]
電子束分析 英文
electro-beam analysis
  • 電 : Ⅰ名詞1 （有電荷存在和電荷變化的現象） electricity 2 （電報） telegram; cable Ⅱ動詞1 （觸電） give...
  • 子 : 子Ⅰ名詞1 （兒子） son 2 （人的通稱） person 3 （古代特指有學問的男人） ancient title of respect f...
  • 束 : Ⅰ動詞1 （捆; 系） bind; tie 2 （控制; 約束）control; restrain Ⅱ量詞（用於捆在一起的東西） bundle;...
  • 分 : 分Ⅰ名詞1. （成分） component 2. （職責和權利的限度） what is within one's duty or rights Ⅱ同 「份」Ⅲ動詞[書面語] （料想） judge
  • 析 : Ⅰ動詞1. （分開; 散開） divide; separate 2. （分析） analyse; dissect; resolve Ⅱ名詞（姓氏） a surname
  • 電子 : [物理學] [電學] electron
  1. Influence of multipole deflection field on electron beam defocus

    多極偏轉場對電子束散焦的影響分析
  2. It was found that the schorl or dravite in schorl - dravite group that is produced from pegmatite and has good crystal degree had a strong intensity of spontaneous polarity by electron - beam bombardment and x - ray diffraction of varying the temperature

    利用電子束轟擊結合變溫xrd分析發現在schorl - dravite系列電氣石中，產于偉晶巖的，結晶度比較高的mg電氣石或fe電氣石具有較高的自發極化強度。
  3. Part 2 analyses beam landing shifts made by thermal deformations of a shadow mask and vibration of a new type of shadow mask - aperture grille. an automatic measurement system for cpt decolorization and a vibration measurement system for aperture grille are established. part 3 analyses the difference of perception and discrimination to color between the human eyes and ccd system, and develops a new method based on ccd technology to evaluate the screen white - balance

    主要內容分為三部分： （ 1 ）分析著屏電子束分佈與電子槍、偏轉系統及蔭罩之間的關系，研製自動測試裝置，為設計和改進相關結構提供依據； （ 2 ）分析蔭罩熱變形和振動對顯示屏色純度影響，建立了色純漂移自動測試裝置和張緊式蔭罩振動測試系統； （ 3 ）分析了人眼與ccd對彩色刺激的不同響應，建立了基於ccd的顯示器全屏色純均勻性測試方法。
  4. Aberration of electronic lens made by electron gun and aberration of magnetic deflection system made by dy are comprehensively investigated, so is the shadow mask ' s effect on electron beam landing screen error. the conclusion can be get that, because the distribution of electron beam landing screen ( distribution of luminance ) is affected by many kinds of factors, it cannot get the correct function by calculation, and should be get by measurement instead

    全面分析了cpt電子槍發射系統形成的電子透鏡像差與磁偏轉系統形成的偏轉像差；分析了蔭罩的自身厚度與位移對電子束著屏的影響，並由此得出結論，著屏電子束分佈（即亮度分佈）受著許多因素的影響，理論分析是半定量的，著屏電子束分佈需要用精確的測量儀器來測量。
  5. The effect on display characteristic made by thermal deformations of the shadow mask is comprehensively investigated. by using the electron beam distribution automatic measurement system with a micro - deflective coil, a concave spot in luminance distribution can be get. it changes its position when the shadow mask changes its form

    本文系統全面地分析了傳統蔭罩的各類熱變形對顯示屏特性的影響，利用本文研製的電子束亮度分佈自動測試系統，附加一個微偏轉磁場，使相鄰兩電子束打在同一顏色的熒光粉條，並形成一個亮度凹點，當蔭罩變形時，凹點位置作相應的位移，以此原理跟蹤測量凹點位移量，即可得到色純漂移動態變化曲線。
  6. Using the particle - in - cell ( pic ) model, a 8 millimeter relativistic backward wave oscillator underlying superradiance mechanism was gotten, the influence on both operation frequency and radiation efficiency of the guiding magnetic field, the diode voltage, the beam current and the beam radius as well as the corrugation structure were also presented

    採用pic方法，通過數值模擬優化設計了超輻射狀態下的8毫米相對論返波振蕩器，分析了引導磁場、二極體電壓、電子束流、電子束半徑、周期慢波結構等對器件的輻射功率及輻射效率的影響。
  7. The modified traveling wave monopole model is employed in simulating the electron beam in crt of computer vdu. meanwhile acceleration fields of the electron beam are studied in details and its expression given for the first time with measured results. a novel analyzing method is proposed to study the spectrum of electromagnetic information leakage based on the viewpoint of field point, which has been verified effective by experiments

    採用經修正的行波單極子模型模擬計算機陰極射線管顯示器電子束，並詳細研究了電子束的加速場，首次給出了其計算公式和實驗測試結果；還提出了一種新的從場點出發的信息電磁泄漏頻譜分析方法，實驗證明了其有效性； 3
  8. In chapter 6 a digital interception system is designed and its operating principle is introduced. plenty of experimental results are provided here. in chapter 7 a mathematic model of electron beams in crt of computer vdu is given and entropy preservation performance of tempest transceiving system is discussed, a soft - tempest measure is suggested accordingly

    其中第六章設計了數字偵收系統，介紹了其工作原理，並提供了豐富的實驗結果；第七章給出了計算機陰極射線管顯示器電子束的數學模型，據此討論了tempest通信系統的保熵性，接著分析了數字偵收系統的抗噪聲性能。
  9. In theoretical analysis, the motion of radially - emitted electron beam in diode region and drift region has been analyzed, and the relation between radial momentum or current of electron beam and the guiding magnetic field has also been studied, then the possibility to optimize the guiding magnetic field has been derived. the motion of radially - emitted beam electrons in smooth bore magnetron and smooth bore milo has also been studied theoretically. at last, the motion of radially - emitted beam electrons in compound axial and azimuthal magnetic field has been studied

    在理論分析中，初步分析了軸向發射條件下電子在二極體區域和漂移區的運動規律，電子徑向動量隨著外加磁場變化的規律，以及電子束電流隨著外加磁場的變化規律，還有二極體區域磁場優化的可能性;分別研究了有軸向磁場時以及有角向磁場時徑向發射的電子在光滑陽極結構中的運動規律，最後分析了在軸向和角向復合磁場中電子的運動規律。
  10. In order to reduce and compensate charge phenomena at the surface of non - conductive oxide materials under the electron irradiation, oxygen environmental scanning electron microscopy ( sem ) is offered in this thesis

    本論文提出氧環境掃描電子顯微分析方法，以減輕和補償非導電氧化物類樣品在電子束輻照作用下的表面充電現象。
  11. This new radial reflex klystron oscillator with virtual cathode is designed and simulated by 2. 5 - d pic code

    分析了電子束在徑向反射腔中形成虛陰極的過程和虛陰極對電子束的調製作用。
  12. According to the principle of a new scanning electron microscope and the mechanism of the interaction between electron beam and solid target, the trajectories of an incident electron in a sample are simulated, a simulation program is compiled using the monte carlo method, and the backscattering coefficients corresponding to different parameters of the sem are obtained

    摘要根據新型分析掃描電子顯微鏡的工作原理及載能電子束和固體相互作用原理，利用蒙特卡羅方法模擬入射電子和靶物質的相互作用過程，編制了蒙特卡羅模擬計算程序，獲得了對應不同電鏡工作參數的入射電子背散射率。
  13. A x - band five - cavity tro is designed. with the voltage 760kv, the current 6ka and the magnetic field 2. 6t in the simulation, it ' s output power is about 1. 2gw

    小信號理論分析得出只有3 / 6模與電子束與電子束有負能量交換，其它四個模式電子束有正能量交換。
  14. The basic principle, main properties, typical parameters, technical characteristics and general situation of klystron are introduced. the electron beam prebunching in the modulated cavity and shift tube of relativistic klystron amplifer ( rka ) is studied analytically, a self - consistent equation of radiation generated by the prebunched electron beam in the radiation cavity is derived using the field method of particle ? wave interaction instead of the electrical circuit method, and in terms of it, the gain in the linear regime calculated, a field analysis method is proposed. the theory analysis shows that the characteristic parameters, such as resonance frequency, real part of gap - impedance, external quality fadtor in all kinds of klystron output circuits including single - beam, multi - beam, single - gap, multi - gap, single - beammulti - gap, multi - beam multi - gap klystron output circuit, can be calculated by the field analysis method

    本文系統的介紹了速調管的工作原理、主要特點、發展概況、主要性能指標和技術特點，解析的研究了電子束在相對論速調管放大器的調制腔和漂移管中的預群聚;用粒子波互作用的場方法導出了在輻射腔中預群聚電子束產生輻射的自洽方程，同時對線性區的增益進行了計算。理論分析表明，場分析法可用於計算單注單間隙、多注多間隙、單注多間隙和多注多間隙速調管輸出迴路的諧振頻率、間隙阻抗實部和外觀品質因數等特性參數。
  15. The microfissuring behaviors in the heat - affected zone ( haz ) of electron beam ( eb ) welded nickel - based superalloy gh 4133 have been studied by using analytical scanning electron microscopy ( sem )

    摘要利用金相分析和掃描電鏡對鎳基高溫合金電子束焊接熱影響區微裂紋行為進行了分析。
  16. Therefore, in this paper, two directional solidification methods, czochralski method and electron - beam floating zone melting method, were used to obtain such material. the directional solidifition microstructures of si - tasi2 system was performed using neophot - 1, amray - 100b sem and jem - 2000cx tem analysis technique

    本文採用切克拉斯基法（ cz法）和電子束區熔法（ ebfzm ）兩種定向凝固方法制備該共晶自生復合材料；藉助金相技術、電鏡技術、圖象處理技術等多種分析測試手段，考察了si - tasi _ 2共晶定向凝固組織和及其相應的工藝規范。
  17. Eds microbeam analysis - quantitative analysis using energy - dispersive spectrometry

    微電子束分析.用能量散射光譜儀
  18. Microbeam analysis - scanning electron microscopy - guidelines for calibrating image magnification

    微電子束分析.掃描電子顯微鏡.圖像放大校準指南
  19. Microbeam analysis - electron probe microanalysis - guidelines for qualitative point analysis by wavelength dispersive x - ray spectrometry

    微電子束分析.電子探測微觀分析.用波長色散x射線光譜測定法定性點分析指南
  20. Microbeam analysis - electron probe microanalysis - guidelines for the determination of experimental parameters for wavelength dispersive spectroscopy

    微電子束分析.電子探測微觀分析.波長色散光譜學用實驗參數的測定指南
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